Diamond/graphene composite heat conduction film, preparation method thereof and heat dissipation system
A graphene composite, diamond thin film technology, applied in chemical instruments and methods, heat exchange materials, metal material coating processes, etc., can solve the problems of low binding force between graphene and diamond, complex preparation process, and high interface thermal resistance. , to achieve the effect of easy industrial production and use, excellent thermal conductivity structure, and excellent heat dissipation performance
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[0041] The second aspect of the embodiments of the present invention provides a method for preparing a diamond / graphene composite thermally conductive film, including:
[0042] S01, providing a substrate, and depositing a microcrystalline diamond film on the surface of the substrate;
[0043] S02, removing the substrate by etching to obtain a self-supporting microcrystalline diamond film; wherein the self-supporting microcrystalline diamond film includes a surface to be nucleated, and the surface to be nucleated is the microcrystalline diamond film before corrosion Contact surface with the substrate;
[0044] S03, deposit a transition metal layer on the surface to be nucleated, and place the self-supporting microcrystalline diamond film deposited with the transition metal layer in the cavity of the hot-wire vapor deposition chamber for rapid annealing treatment, in the transition metal layer The transition metal catalyzes part of the carbon elements in the microcrystalline diamond f...
Example Embodiment
[0078] Example 1:
[0079] A diamond / graphene composite thermal conductive film and a preparation method thereof, which include the following steps:
[0080] (1) Depositing high thermal conductivity microcrystalline diamond film on the surface of silicon substrate:
[0081] Micron crystal diamond film preparation method 1: hot wire chemical vapor deposition (HFCVD) method is used to prepare a 1mm thick diamond film layer on a single crystal (100) silicon wafer with a size of Φ200mm. Place the silicon wafer in NH before growth 4 OH / H 2 O 2 / Deionized water (1:1:5) mixed solution, heated to 70℃ for 1 hour, rinse the silicon wafers, then put the silicon wafers in acetone solution for ultrasonic cleaning for 10 minutes, and deionized water for ultrasonic cleaning for 10 minutes , Ultrasonic cleaning in alcohol solution for 10 minutes. Subsequently, the cleaned silicon wafer was placed in the nano-diamond powder suspension for ultrasonic treatment for 1 hour. The average particle size ...
Example Embodiment
[0086] Example 2:
[0087] A diamond / graphene composite thermal conductive film and a preparation method thereof, which include the following steps:
[0088] Step (1) is the same as in Example 1;
[0089] (2) Preparation of graphene layer on the surface of microcrystalline diamond film:
[0090] (a) Put the diamond / silicon sample into a mixed solution of hydrofluoric acid / sulfuric acid / glacial acetic acid with a ratio of 1:1:2 to corrode the silicon substrate (or put it in a 30% (w / v) KOH solution and heat Silicon etching to 85°C), the etching time is 5-24 hours. Then the obtained self-supporting diamond film is washed and dried. The smooth diamond surface obtained after etching the silicon substrate is called the diamond film nucleation surface. Using the bottom surface of diamond as the deposition surface of high-purity nickel metal, place the self-supporting diamond film into the electron beam deposition equipment, and turn on the equipment until the background vacuum reaches 10...
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