Novel electroluminescent device and preparation method thereof
An electroluminescent device, a new type of technology, applied in the direction of electrical components, semiconductor devices, circuits, etc., can solve the problems of Joule heat dissipation, inability to effectively inject carriers, and limited tuning range, so as to improve the conductivity and achieve low Effects of Threshold Luminescence, Strong Locality and Field Enhancement Properties
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Embodiment 1
[0027] Such as figure 1 As shown, a new type of electroluminescent device includes quartz plates, ZnO:Ga micrometer wires, metal nanostructures, and indium electrodes arranged sequentially from bottom to top.
[0028] In the above structure, the size of the quartz plate is 3cm×2cm, the diameter of the ZnO:Ga microwire is 5-30μm and the length is 2cm, and the metal nanostructure is a metal nanostructure formed by annealing a gold / silver quasiparticle film. Particles.
[0029] The method for preparing the electroluminescent device described above includes the following steps:
[0030] (1) Substrate cleaning: Cut the quartz substrate into 3cm×2cm rectangular blocks, and cut the monocrystalline silicon into 3cm×1cm rectangular blocks, and use acetone, ethanol, and deionized water in an ultrasonic machine to clean them in order for 15 minutes. , Blow dry with nitrogen;
[0031] (2) ZnO:Ga micro-wires are prepared in a high-temperature tube furnace by chemical vapor deposition method, and...
Embodiment 2
[0035] Such as figure 1 As shown, a new type of electroluminescent device includes quartz plates, ZnO:Ga micrometer wires, metal nanostructures, and indium electrodes arranged sequentially from bottom to top.
[0036] In the above structure, the size of the quartz plate is 3cm×2cm, the diameter of the ZnO:Ga microwire is 5-30μm and the length is 2cm, and the metal nanostructure is a metal nanostructure formed by annealing a gold / silver quasiparticle film. Particles.
[0037] The method for preparing the electroluminescent device described above includes the following steps:
[0038] (1) Substrate cleaning: The quartz substrate is cut into 3cm×2cm rectangular blocks, and the single crystal silicon is cut into 3cm×1cm rectangular blocks, and the ultrasonic machine is washed with acetone, ethanol, and deionized water in order for 15 minutes. , Blow dry with nitrogen;
[0039] (2) ZnO:Ga micro-wires are prepared in a high-temperature tube furnace by chemical vapor deposition method, and...
Embodiment 3
[0045] Such as figure 1 As shown, a new type of electroluminescent device includes quartz plates, ZnO:Ga micrometer wires, metal nanostructures, and indium electrodes arranged sequentially from bottom to top.
[0046] In the above-mentioned structure, the size of the quartz plate is 3cm×2cm, the diameter of the ZnO:Ga micron wire is 5-30μm, and the length is 2cm. The metal nanostructure is composed of different plasmon resonance peaks synthesized by the seed method. Gold / silver nanospheres, nanorods or nano-biconical structures.
[0047] The method for preparing the electroluminescent device described above includes the following steps:
[0048] (1) Substrate cleaning: Cut the quartz substrate into 3cm×2cm rectangular blocks, and cut the monocrystalline silicon into 3cm×1cm rectangular blocks, and use acetone, ethanol, and deionized water in an ultrasonic machine to clean them in order for 15 minutes. , Blow dry with nitrogen;
[0049] (2) ZnO:Ga micro-wires are prepared in a high-t...
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