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A kind of preparation method of the hard diamond-like carbon film of low residual stress

A diamond film, low residual technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems that restrict the large-scale application of diamond-like carbon film's superior performance, low bonding strength between DLC film and substrate, and limitations. Diamond-like carbon film thickness and other issues, to achieve the effect of enhancing thermal conductivity, increasing hardness, and reducing the elastic performance of the system

Active Publication Date: 2021-04-27
康硕(山西)低应力制造系统技术研究院有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the large internal stress in the process of preparing a single-layer DLC film, not only the bonding strength between the film and the substrate is low, easy to peel off, but also the thickness of the diamond-like carbon film is limited.
When the thickness of the film increases, the residual stress will increase accordingly, resulting in rupture due to excessive residual stress during use, and premature failure of the film due to the low bonding strength between the DLC film and the substrate
These shortcomings have seriously restricted the superior performance of diamond-like carbon films and their large-scale application in the industrial field.

Method used

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  • A kind of preparation method of the hard diamond-like carbon film of low residual stress
  • A kind of preparation method of the hard diamond-like carbon film of low residual stress
  • A kind of preparation method of the hard diamond-like carbon film of low residual stress

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Effect test

Embodiment 1

[0044] A kind of preparation method of the hard diamond-like carbon thin film of low residual stress, carry out as follows:

[0045] (1): cleaning

[0046] Clean the Ni-Ti alloy substrate ultrasonically with acetone and absolute ethanol for 15 minutes, then rinse it in deionized water for 2 minutes, and dry it with nitrogen;

[0047] (2): Preprocessing

[0048] a. Mix potassium dichromate, 98wt% concentrated sulfuric acid and distilled water in a mass ratio of 13:7:10, polish the surface of the Ni-Ti alloy base material with fine sandpaper, then immerse it in the mixed acid solution, take it out after 10min, Put on the sample stage of vacuum chamber after repeating step (1);

[0049] b. Close the vacuum chamber and evacuate to 3.0×10 -3 After pa, pass in argon gas to make the air pressure in the vacuum chamber reach 3Pa, turn on the bias power supply, apply a bias voltage of -100V on the Ni-Ti alloy substrate material, argon plasma is formed by glow discharge, and argon pla...

Embodiment 2

[0062] A kind of preparation method of the hard diamond-like carbon thin film of low residual stress, carry out as follows:

[0063] (1): cleaning

[0064] Clean the Ni-Ti alloy substrate ultrasonically with acetone and absolute ethanol for 15 minutes, then rinse it in deionized water for 2 minutes, and dry it with nitrogen;

[0065] (2): Preprocessing

[0066] a. Mix potassium dichromate, 98wt% concentrated sulfuric acid and distilled water in a mass ratio of 13:7:10, polish the surface of the Ni-Ti alloy base material with fine sandpaper, then immerse it in the mixed acid solution, take it out after 10min, Put on the sample stage of vacuum chamber after repeating step (1);

[0067] b. Close the vacuum chamber and evacuate to 3.0×10 -3 After pa, pass argon gas to make the air pressure in the vacuum chamber reach 2Pa, turn on the bias power supply, apply a bias voltage of -100V on the Ni-Ti alloy substrate material, argon plasma is formed by glow discharge, and argon plasma...

Embodiment 3

[0080] A kind of preparation method of the hard diamond-like carbon thin film of low residual stress, carry out as follows:

[0081] (1): cleaning

[0082] Clean the Ni-Ti alloy substrate ultrasonically with acetone and absolute ethanol for 15 minutes, then rinse it in deionized water for 2 minutes, and dry it with nitrogen;

[0083] (2): Preprocessing

[0084] a. Mix potassium dichromate, 98wt% concentrated sulfuric acid and distilled water in a mass ratio of 13:7:10, polish the surface of the Ni-Ti alloy base material with fine sandpaper, then immerse it in the mixed acid solution, take it out after 10min, Put on the sample stage of vacuum chamber after repeating step (1);

[0085] b. Close the vacuum chamber and evacuate to 3.0×10 -3 After pa, pass argon gas to make the air pressure in the vacuum chamber reach 2.5Pa, turn on the bias power supply, apply a bias voltage of -100V on the Ni-Ti alloy substrate material, and glow discharge to form argon plasma, and the substra...

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Abstract

A method for preparing a hard diamond-like carbon film with low residual stress, comprising cleaning, pretreatment, depositing a pure Ti layer, depositing a TiC layer, depositing a DLC composite layer and post-processing steps in sequence, characterized in that: the deposited DLC composite layer , is to sequentially deposit the first layer of DLC layer, TiC layer and the second layer of DLC layer. The internal stress of the film is released through the transitional buffering of the Ti layer and the TiC layer, which enhances the bonding force between the Ni-Ti alloy substrate and the film, as well as the bonding force between the film layers, and the prepared diamond-like film has good uniformity , The surface is smooth, and the co-doping of Si, Cu non-metal and metal is used to reduce the elastic energy of the system, thereby reducing the internal stress of the film, and at the same time enhancing the thermal conductivity of the film. The graphitization temperature of the film is above 600 ° C, ensuring Improve its mechanical properties, enhance its stability, increase the proportion of sp3 bonds in the film during the whole preparation process, and also improve the hardness and elastic modulus of the film.

Description

technical field [0001] The invention relates to a method for preparing a hard diamond-like carbon film, in particular to a method for preparing a hard diamond-like carbon film with low residual stress. Background technique [0002] Diamond-like Carbon (DLC) film is a kind of metastable amorphous material mainly composed of sp3 hybridized carbon atoms of diamond structure and sp2 hybridized carbon atoms of graphite structure. Due to the performance similar to diamond film, diamond-like film has many excellent properties close to diamond film, such as high hardness, low friction coefficient, high resistivity, high thermal conductivity, good chemical stability, high temperature resistance and corrosion resistance. In addition, compared with diamond films, DLC films have lower deposition temperature, larger deposition area, and smoother and smoother films. They are widely favored in many fields, especially in the fields of mechanical electronics and medicine. Residual stress re...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/06C23C14/16C23C14/02
CPCC23C14/021C23C14/025C23C14/0605C23C14/0635C23C14/165C23C14/3464
Inventor 徐照英刘垚张腾飞苏永要王锦标
Owner 康硕(山西)低应力制造系统技术研究院有限公司