Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of preparation method of lead ion imprinted composite hollow microsphere

A lead ion, hollow technology, applied in chemical instruments and methods, alkali metal compounds, other chemical processes, etc., can solve the problems of unfavorable adsorption capacity, small specific surface area, lack of adsorption, etc., to achieve improved stability, large specific surface area, The effect of high porosity

Active Publication Date: 2022-02-15
晋江瑞碧科技有限公司 +1
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Currently supported carrier SiO 2 It is mainly a solid structure with small specific surface area and low porosity, which is not conducive to the improvement of adsorption capacity, and chitosan lacks selectivity for the adsorption of heavy metal ions

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of preparation method of lead ion imprinted composite hollow microsphere
  • A kind of preparation method of lead ion imprinted composite hollow microsphere
  • A kind of preparation method of lead ion imprinted composite hollow microsphere

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] 1) Add 1.5g polyurethane to a mixed solvent of 2g N,N-dimethylformamide and 14g tetrahydrofuran, stir and dissolve at 50°C, then add 0.001g nano-hydroxyapatite, and mix to obtain a mixed solution; mix the mixed solution Freeze in a -40°C low-temperature refrigerator for 2 hours. After freezing, put the mixed solution into 200 mL of ice-water mixed solution, remove the mixed solvent, and dry to obtain polyurethane microspheres;

[0046] 2) Soak the polyurethane microspheres in a mixed solution of 4g benzophenone and 96g ethanol, and set aside after activation; dissolve 1g acrylic acid, 0.01g N,N'-methylenebisacrylamide and 0.01g ammonium persulfate in 100mL distilled water 0.6 g of polyurethane microspheres activated by benzophenone were added, and graft polymerization was carried out by ultraviolet light irradiation under a nitrogen atmosphere. The intensity of ultraviolet light was 500 W, and the irradiation time was 20 minutes to obtain polyacrylic acid grafted with po...

Embodiment 2

[0054] 1) Add 1.8g of polyurethane to a mixed solvent of 1g N,N-dimethylformamide and 15g of tetrahydrofuran, and dissolve with magnetic stirring at 50°C, then add 0.002g of nano-hydroxyapatite, and mix well to obtain a mixed solution; the mixed solution Freeze in a low-temperature refrigerator at -30°C for 3 hours. After freezing, put the mixture into 200 mL of ice-water mixture, remove the mixed solvent, and dry to obtain polyurethane microspheres;

[0055] 2) Soak the polyurethane microspheres in a mixed solution of 4g benzophenone and 96g ethanol, and set aside after activation; Add 0.8 g of benzophenone-activated polyurethane microspheres to distilled water, and carry out graft polymerization by ultraviolet light irradiation under a nitrogen atmosphere. The ultraviolet light intensity is 500 W, and the irradiation time is 20 minutes to obtain polyacrylic acid grafted with polyurethane microspheres.

[0056] 3) Add 0.6 g of polyurethane microspheres grafted with polyacryli...

Embodiment 3

[0063] 1) Add 1.5g of polyurethane to a mixed solvent of 1g N,N-dimethylformamide and 12g of tetrahydrofuran, stir and dissolve at 50°C, then add 0.015g of nano-hydroxyapatite, and mix well to obtain a mixed solution; Freeze in a low-temperature refrigerator at -25°C for 3 hours. After freezing, put the mixed solution into 200 mL of ice-water mixed solution, remove the mixed solvent, and dry to obtain polyurethane microspheres;

[0064] 2) Soak the polyurethane microspheres in a mixed solution of 4g benzophenone and 96g ethanol, and set aside after activation; Add 0.8 g of benzophenone-activated polyurethane microspheres to distilled water, and carry out graft polymerization by ultraviolet light irradiation under a nitrogen atmosphere. The ultraviolet light intensity is 500 W, and the irradiation time is 20 minutes to obtain polyacrylic acid grafted with polyurethane microspheres.

[0065] 3) Add 0.5 g of polyurethane microspheres grafted with polyacrylic acid, 0.002 g of cety...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
specific surface areaaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention provides a preparation method of lead ion imprinted composite hollow microspheres, which comprises the following steps: preparing polyurethane microspheres grafted with polyacrylic acid using polyurethane and acrylic acid; preparing silica hollow microspheres; preparing chitosan grafted polyacrylic acid Acrylic acid; adding the chitosan grafted polyacrylic acid into distilled water, after dissolving, adding modified silicon dioxide hollow microspheres, after dispersing evenly, adjusting the pH value to 13 to obtain SiO 2 / chitosan grafted polyacrylic acid composite hollow microspheres; using the SiO 2 / Chitosan grafted polyacrylic acid composite hollow microspheres to prepare lead ion imprinted composite hollow microspheres. The advantages of the present invention are: 1. Using polyurethane microspheres as a template, tetraethyl orthosilicate is used to hydrolyze its surface, and SiO is obtained after removing the polymer template. 2 Hollow microspheres; 2. Chitosan-grafted acrylic acid supported on SiO 2 On hollow microspheres, using SiO 2 Excellent chemical stability and large specific surface area greatly improve the stability and specific surface area of ​​the material in solution, and improve its recycling efficiency.

Description

technical field [0001] The present invention relates to a SiO 2 The invention discloses a preparation method of chitosan grafted polyacrylic acid lead ion imprinted composite hollow microspheres, belonging to the technical field of adsorption materials. Background technique [0002] Water pollution caused by heavy metal ions is a serious environmental pollution problem and has been widely concerned by researchers from all over the world. In recent years, the selective separation of heavy metal ions in sewage has been widely studied. [0003] Chitosan, as the deacetylation product of chitin, is the second largest biopolymer in nature after cellulose. Chitosan is widely used in many fields due to its abundant raw material sources, good biodegradability, biocompatibility and adsorption properties. The amino groups and hydroxyl groups on the molecular chain of chitosan can coordinate with heavy metal ions to form chelates, which can effectively adsorb and trap metal ions. go...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01J20/26B01J20/28C02F1/28B01J20/30C02F101/20
CPCB01J20/268B01J20/24B01J20/103B01J20/28021C02F1/285C02F1/281C02F2101/20
Inventor 刘瑞来刘丽敏齐小宝赵升云胡家朋林皓付兴平赵瑨云
Owner 晋江瑞碧科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com