Photocuring 3D printing silicon nitride ceramic precursor and preparation and forming method thereof

A technology of silicon nitride ceramics and ceramic precursors, which is applied in the field of additive manufacturing in mechanical manufacturing, can solve the problems of poor curing performance of precursors and affect development, and achieve good morphology and structure, good curing performance, and simple preparation methods Effect

Inactive Publication Date: 2020-01-10
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The pyrolysis method of the precursor solves the scattering effect of the incident ultraviolet light, so that the photocuring 3D printing technology can form complex structures of high refractive index ceramics, such as SiC ceramics, Si 3 N 4 Ceramics, however, the poor curing performance of existing ceramic precursors seriously affects the development of the industry

Method used

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  • Photocuring 3D printing silicon nitride ceramic precursor and preparation and forming method thereof
  • Photocuring 3D printing silicon nitride ceramic precursor and preparation and forming method thereof
  • Photocuring 3D printing silicon nitride ceramic precursor and preparation and forming method thereof

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preparation example Construction

[0039] The preparation method of photocuring 3D printing silicon nitride ceramic precursor of the present invention comprises the following steps:

[0040] 1) Weighing the monomer and the photoinitiator, then placing the photoinitiator in the monomer, and ball milling for 30 minutes to obtain a mixed solution, wherein the speed of ball milling was 160r / min;

[0041] 2) Add a ceramic precursor prepolymer and a light absorber to the mixed solution obtained in step 1), ultrasonically oscillate for 30 minutes, and then vacuumize for 1 minute to obtain a photocurable 3D printing silicon nitride ceramic precursor.

[0042] The forming method of photocuring 3D printing silicon nitride ceramic precursor of the present invention comprises the following steps:

[0043] 1) Pour the light-curing 3D printing silicon nitride ceramic precursor into the slurry tank of the ceramic light-curing forming system, and use a coating scraper to scrape it;

[0044] 2) Move the workbench to the bottom...

Embodiment 1

[0050] The light-curing 3D printing silicon nitride ceramic precursor of the present invention is prepared from a monomer, a photoinitiator, a ceramic precursor prepolymer and a light absorber;

[0051] The monomer is 1,6 hexanediol diacrylate;

[0052] The ceramic precursor prepolymer is a polysilazane resin containing a methyl group;

[0053] The photoinitiator is 2,4,6-trimethylbenzoyl-diphenylphosphine oxide;

[0054] The light absorber is 2-(2-hydroxy-3.5-dibutyl-tert-phenyl)-5-chlorobenzotriazole;

[0055] The mass parts of monomer, photoinitiator, ceramic precursor prepolymer and light absorber are 40 parts, 0.1 parts, 60 parts and 0.2 parts respectively.

[0056] The preparation method of photocuring 3D printing silicon nitride ceramic precursor of the present invention comprises the following steps:

[0057] 1) Weighing the monomer and the photoinitiator, then placing the photoinitiator in the monomer, and ball milling for 30 minutes to obtain a mixed solution, whe...

Embodiment 2

[0067] The light-curing 3D printing silicon nitride ceramic precursor of the present invention is prepared from a monomer, a photoinitiator, a ceramic precursor prepolymer and a light absorber;

[0068] The monomer is isocyanoethyl methacrylate;

[0069] The ceramic precursor prepolymer is a polysilazane resin containing a vinyl group;

[0070] The photoinitiator is IRGACURE 819;

[0071] The light absorber is 2-(2-hydroxy-3.5-dibutyl-tert-phenyl)-5-chlorobenzotriazole;

[0072] The mass parts of monomer, photoinitiator, ceramic precursor prepolymer and light absorber are respectively 20 parts, 0.1 parts, 80 parts and 0.2 parts.

[0073] The preparation method of photocuring 3D printing silicon nitride ceramic precursor of the present invention comprises the following steps:

[0074] 1) Weighing the monomer and the photoinitiator, then placing the photoinitiator in the monomer, and ball milling for 30 minutes to obtain a mixed solution, wherein the speed of ball milling was...

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Abstract

The invention discloses a photocuring 3D printing silicon nitride ceramic precursor and a preparation and forming method thereof. The photocuring 3D printing silicon nitride ceramic precursor is prepared from a monomer, a photoinitiator, a ceramic precursor prepolymer and a light absorber, wherein the monomer is one or more from 1, 6 hexanediol diacrylate, isocyano ethyl methacrylate and ethylene1, 2-dithiocyanate; the ceramic precursor prepolymer is a polysilazane resin containing methyl, vinyl or sulfydryl groups; the photoinitiator is 2, 4, 6-trimethylbenzoyl-diphenyl phosphine oxide, IRGACURE 819 or benzoin dimethyl ether, the curing performance of the ceramic precursor is good, and the ceramic precursor is relatively simple to prepare and form.

Description

technical field [0001] The invention belongs to the field of additive manufacturing in mechanical manufacturing, and relates to a light-cured 3D printing silicon nitride ceramic precursor, its preparation and forming method. Background technique [0002] Silicon nitride ceramics have high mechanical strength, good thermal stability, small thermal expansion coefficient, good thermal conductivity, oxidation resistance, wear resistance and corrosion resistance, so they are widely used in machinery industry, metallurgical industry, electronics, aerospace and In the military, such as high-temperature engineering components, such as aircraft engines, new ceramic cutters, ball valves, pump bodies, etc. However, due to its high hardness and high brittleness, defects are prone to occur during the production process, and there are many factors affecting the forming accuracy, making the complex structure more difficult to form and process. Traditional processing methods such as isosta...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/584B33Y70/00B33Y10/00C08F283/12C08F222/14C08F220/34
CPCB33Y10/00B33Y70/00C04B35/584C04B2235/483C04B2235/6562C04B2235/6565C08F283/12C08F283/124C08F220/34
Inventor 连芩刘小栋李涤尘何晓宁陈锐光孟佳丽武向权
Owner XI AN JIAOTONG UNIV
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