Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ultra-thin low-resistance chlor-alkali perfluorinated ion exchange membrane and preparation method thereof

A perfluorinated ion and exchange membrane technology, applied in the field of ion exchange membrane, can solve the problems of high resistance and expensive manufacturing cost, and achieve the effects of scientific and reasonable design, reducing adhesion and reducing energy consumption

Active Publication Date: 2021-07-09
SHANDONG DONGYUE POLYMER MATERIAL
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Polymer materials have good toughness, and breaking them into nano-scale sizes requires the use of low-temperature crushing technology. The manufacturing cost is very expensive, and it is difficult to mass-produce perfluorosulfonic acid particles. Compared with electrolytes, perfluorosulfonic acid particles still have higher resistance.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] (1) Dissolve the perfluorosulfonic acid resin of IEC=0.7mmol / g in the solvent of ethanol and isopropanol in a weight ratio of 1:1 to form a perfluorosulfonic acid resin solution; The polytetrafluoroethylene porous non-woven membrane with a rate of 85% was treated in an ultrasonically treated trifluorotrichloroethane solvent for 1.5 hours, and after being taken out and dried, the perfluorosulfonic acid resin solution was coated on the polytetrafluoroethylene porous non-woven membrane. The upper and lower surfaces of the spun membrane are coated with a total thickness of 10 μm and dried; after drying, the perfluorocarboxylic acid resin with IEC=0.8mmol / g and a thickness of 7 μm is laminated to form a perfluorinated ion exchange resin base film. Thereby forming a perfluorinated ion exchange membrane precursor.

[0042] (2) under the temperature of 180 ℃, under the pressure of 120 tons, the perfluorinated ion-exchange membrane precursor that makes in the step (1) uses superpr...

Embodiment 2

[0057] (1) Dissolve the perfluorosulfonic acid resin of IEC=1.2mmol / g in the solvent of ethanol and isopropanol in a weight ratio of 1:1 to form a perfluorosulfonic acid resin solution; The polyetheretherketone porous non-woven membrane with a rate of 80% was treated in the ultrasonically treated trifluorotrichloroethane solvent for 1.5h, and after it was taken out and dried, the perfluorosulfonic acid resin solution was coated on the polytetrafluoroethylene porous non-woven membrane. The upper and lower surfaces of the spun film are coated with a total thickness of 70 μm and dried; after drying, the perfluorocarboxylic acid resin with IEC=1.0 mmol / g and a thickness of 9 microns is laminated to form a perfluorinated ion exchange resin base film, thereby Formation of perfluorinated ion exchange membrane precursors.

[0058] (2) under the temperature of 180 ℃, under the pressure of 120 tons, the perfluorinated ion-exchange membrane precursor that makes in the step (1) uses super...

Embodiment 3

[0074] (1) Dissolve the perfluorosulfonic acid resin of IEC=1.3mmol / g in the solvent prepared by ethanol and isopropanol in a weight ratio of 1:1 to form a perfluorosulfonic acid resin solution; The polyimide porous non-woven membrane with a rate of 85% was treated in an ultrasonically treated trifluorotrichloroethane solvent for 1.5h, and after being taken out and dried, the perfluorosulfonic acid resin solution was coated on the polytetrafluoroethylene porous non-woven membrane. The upper and lower surfaces of the spun membrane are coated with a total thickness of 50 μm and dried; after drying, the perfluorocarboxylic acid resin with IEC=1.22mmol / g and a thickness of 40 μm is laminated to form a perfluorinated ion exchange resin base film by pressing. Thereby forming a perfluorinated ion exchange membrane precursor.

[0075] (2) under the temperature of 200 ℃, under the pressure of 100 tons, with the perfluorinated ion exchange membrane precursor that makes in the step (1), ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
surface roughnessaaaaaaaaaa
Login to View More

Abstract

The invention relates to an ultra-thin low-resistance chlor-alkali perfluorinated ion-exchange membrane and a preparation method thereof, belonging to the technical field of ion-exchange membranes. The ion-exchange membrane of the present invention comprises a base membrane, the two sides of the base membrane are provided with functional surface coatings, the base membrane is composed of a perfluorosulfonic acid polymer layer and a perfluorocarboxylic acid polymer layer, and the perfluorosulfonic acid polymer The layer is provided with a porous non-woven polymer layer; the functional surface coating is a porous rough structure composed of a mixture of perfluorinated ion polymer and metal oxide. The ion-exchange membrane of the present invention not only improves the mechanical strength of the exchange membrane, but also reduces the resistance of the membrane body, and reduces the adhesion of the membrane surface to air bubbles, improves the effective electrolysis area of ​​the membrane surface, and reduces the local The polarization phenomenon is suitable for operation in a zero-pole-distance electrolytic cell under new high current density conditions, and can significantly reduce cell voltage and energy consumption; the invention also provides a simple and easy preparation method.

Description

technical field [0001] The invention relates to an ultra-thin low-resistance chlor-alkali perfluorinated ion-exchange membrane and a preparation method thereof, belonging to the technical field of ion-exchange membranes. Background technique [0002] In the ion membrane chlor-alkali production, in order to achieve electrolysis under the conditions of high current density, low cell voltage, and high alkali concentration, in order to achieve the purpose of improving productivity and reducing power consumption, the key is to shorten the distance between the ion membrane and the electrode. In order to reduce the cell voltage, the narrow pole distance ion membrane electrolysis process can be practical. [0003] With the continuous advancement of technology, the zero-electrode distance electrolyzer has been widely used, but when the distance between the electrodes is reduced to less than 2mm, the hydrogen bubbles attached to the membrane surface are difficult to release due to the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C25B13/08C25B13/02C25B1/46C08J5/22
CPCC08J5/2293C08J2300/102C08J2400/102C25B1/46C25B13/02C25B13/08
Inventor 张永明雷建龙刘烽张振王丽杨淼坤张恒屈凌波戴琼
Owner SHANDONG DONGYUE POLYMER MATERIAL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com