Titanium silicon alloy target material and a manufacturing method thereof
A titanium-silicon alloy and target material technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of uneven distribution of hot-pressed target material density, difficulty in achieving large size, and easy production of ingots Cracking and other problems, to achieve the effect of improving coating hardness and oxidation resistance, improving quality, and wide size specifications
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Embodiment 1
[0036] The titanium-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 85% titanium and 15% silicon.
[0037] The preparation method of the titanium-silicon target in this example comprises the following steps:
[0038] Step 1, according to the design requirements of the above target material components, weigh 82.64 parts by weight of titanium powder with an average particle size of 80 μm and a purity of 99.7%, TiSi 2 17.36 parts by weight of powder, mixed for 3h in a three-dimensional mixer, vacuumed for protection during the mixing process, and the vacuum degree was controlled at 10 -2 About Pa;
[0039] Step 2, put the mixed alloy powder into a cold isostatic pressing mold, and perform cold isostatic pressing treatment under a pressure of 50 MPa, and the holding time is 30 minutes;
[0040] Step 3: Put the blank after cold isostatic pressing into a metal sheath of appropriate size, and place the sheath in a degassing device f...
Embodiment 2
[0046] The titanium-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 80% titanium and 20% silicon.
[0047] The preparation method of the titanium-silicon target in this example comprises the following steps:
[0048] Step 1, according to the design requirements of the above target material components, weigh 76.33 parts by weight of titanium powder with an average particle size of 80 μm and a purity of 99.7%, TiSi 2 23.67 parts by weight of powder, mixed in a three-dimensional mixer for 3 hours, vacuumed during the mixing process, and the vacuum degree was controlled at 10 -2 About Pa;
[0049] Step 2, put the mixed alloy powder into a cold isostatic pressing mold, and perform cold isostatic pressing treatment under a pressure of 50 MPa, and the holding time is 30 minutes;
[0050] Step 3: Put the blank after cold isostatic pressing into a metal sheath of appropriate size, and place the sheath in a degassing device for degassi...
Embodiment 3
[0056] The titanium-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 75% titanium and 25% silicon.
[0057] The preparation method of the titanium-silicon target in this example comprises the following steps:
[0058] Step 1, according to the design requirements of the above target material components, weigh 69.74 parts by weight of titanium powder with an average particle size of 80 μm and a purity of 99.7%, TiSi 2 30.26 parts by weight of powder, mixed for 3h in a three-dimensional mixer, vacuumed during the mixing process, and the vacuum degree was controlled at 10 -2 About Pa;
[0059] Step 2, put the mixed alloy powder into a cold isostatic pressing mold, and perform cold isostatic pressing treatment under a pressure of 50 MPa, and the holding time is 30 minutes;
[0060] Step 3: Put the blank after cold isostatic pressing into a metal sheath of appropriate size, and place the sheath in a degassing device for degassing tr...
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Abstract
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