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A kind of polyetheretherketone photosensitive material and its preparation method and application

A polyetheretherketone and photosensitive material technology, which is applied in the field of 3D printing high-performance photosensitive materials, can solve the problems of limited promotion and application, high cost, and expensive printing raw materials, and achieves great commercial value and broad application prospects.

Active Publication Date: 2020-12-08
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Laser sintering manufacturing is mainly to sinter and solidify the improved low-melting point powder, but the requirements for its printer and powder materials are extremely high, and the cost is expensive
Fused deposition modeling is mainly to melt the extruded PEEK filament at high temperature, and stack it layer by layer according to the specified path. Although the molding quality is low, the printer nozzle needs to reach 400-500°C, which requires higher requirements for the printer. The original wire is expensive, which limits its further promotion and application
The realization of photocurable 3D printing of polyetheretherketone will greatly overcome the defects of fused deposition modeling and laser sintering manufacturing, but two bottlenecks restrict photocurable polyetheretherketone. Introducing a sufficient number of active double bond groups, the second is how to maintain the solubility of photocurable polyether ether ketone

Method used

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  • A kind of polyetheretherketone photosensitive material and its preparation method and application
  • A kind of polyetheretherketone photosensitive material and its preparation method and application
  • A kind of polyetheretherketone photosensitive material and its preparation method and application

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preparation example Construction

[0035] In the present invention, the preparation method of the photocurable polyether ether ketone oligomer preferably includes the following steps:

[0036] (1) Under a protective atmosphere and anhydrous conditions, compound 1, 4,4'-difluorobenzophenone and 4-fluorophenylacetylene were subjected to end-capping polycondensation under the catalysis of potassium carbonate to obtain phenylethynyl Polyetheretherketone oligomers with end-capping and side chains containing amino-modifiable groups; the temperature of the end-capping polycondensation reaction is 150-200°C; the compound 1 is 2,2-bis[4-(4- Aminophenoxy)phenyl]hexafluoropropane or 4,4-methylenebis(2-aminophenol);

[0037](2) The polyetheretherketone oligomer whose phenylethynyl group is terminated and the side chain contains an amino-modifiable group and the compound 2 are subjected to a graft reaction at 50-100°C to obtain the photocurable polymer Ether ether ketone oligomer; the compound 2 is methacrylic acid isocyan...

Embodiment 1

[0055] Preparation of photocurable polyetheretherketone oligomers:

[0056] At room temperature, in the pass with N 2 In a three-necked flask, 0.45mol 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane (6FOHA) was dissolved in anhydrous N-methyl-2-pyrrolidone (NMP), Stir evenly, then add 300mL anhydrous toluene with water agent and 0.95mol anhydrous potassium carbonate, pump out air bubbles, heat up to 120°C, reflux for 4h, wait for the reaction water to be completely removed; cool down to room temperature, add 0.4mol4,4' -Difluorobenzophenone and 0.1mol 4-fluorophenylacetylene, heated to 200°C and stirred for 8 hours, cooled to room temperature; added 1.1mol methacrylic acid isocyanate dropwise at 70°C, stirred for 6 hours; Precipitate in ethanol as a precipitant, wash, and vacuum-dry at 40° C. to obtain a light yellow product, a light-curable polyetheretherketone oligomer, with a molecular weight of 4500 g / mol and a yield of 90%.

[0057] Preparation of polyether ether ket...

Embodiment 2

[0063]50g of photocurable polyetheretherketone oligomer (the preparation method is the same as in Example 1), 20g of cyclotrimethylolpropane formal acrylate (CTFA), 5g of lauryl methacrylate, polyethylene glycol diacrylate 5 g of ester (n=9, PEG400DA), 20 g of 8602 acrylic resin, 3 g of free radical photoinitiator 2,4,6-trimethylbenzoyldiphenylphosphine oxide (TPO). Ultrasonic stirring at room temperature is uniform, until it is completely dissolved and no particles can be seen under the microscope, and the polyether ether ketone photosensitive material is prepared.

[0064] The photosensitive material was modeled by a 3D printer to print out the device, and the heat resistance, dimensional accuracy and related mechanical properties of the device were tested. The test results are shown in Table 2:

[0065] Table 2 Example 2 PEEK photosensitive material and the test performance of the printed device

[0066]

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Abstract

The invention provides a polyetheretherketone photosensitive material as well as a preparation method and application thereof, and relates to the technical field of 3D printing high-performance photosensitive materials. The polyetheretherketone photosensitive material provided by the invention comprises the following components in parts by mass: 40-70 parts of a photocurable polyetheretherketone oligomer, 15-30 parts of an active diluent, 20-40 parts of other functional monomers, and 1-3 parts of a free radical photoinitiator. The formula ratio of the polyetheretherketone oligomer with good solubility, the active diluent, the functional monomer and the free radical photoinitiator is optimized and regulated, so the polyetheretherketone photocuring material provided by the invention can be used as printing ink to be applied to 3D printing, the curing speed is high, the stability is high, the flowability is good, and an obtained 3D printing device is high in thermal stability, good in precision and excellent in mechanical property. The invention also provides the preparation method of the polyetheretherketone photosensitive material, the process is simple, the operation is convenient,and large-scale production is easy to realize.

Description

technical field [0001] The invention relates to the technical field of 3D printing high-performance photosensitive materials, in particular to a polyetheretherketone photosensitive material and its preparation method and application. Background technique [0002] 3D printing technology is an emerging rapid prototyping technology, also known as additive manufacturing technology, which is currently becoming the main way of manufacturing and molding modern cutting-edge materials. 3D printing technology is based on digital model files, using curable materials such as powdered metal or plastic and liquid ink, to construct objects by layer-by-layer printing, usually using digital technology material printers. 3D printing technology has applications in jewelry, footwear, industrial design, architecture, engineering and construction (AEC), automotive, aerospace, dental and medical industries, education, geographic information systems, civil engineering, and other fields. [0003] T...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F290/14C08F226/10C08F222/14C08F220/32C08F220/18C08F220/28C08F226/06C08F2/48B33Y70/00
CPCB33Y70/00C08F2/48C08F290/14C08F226/10C08F220/32C08F226/06
Inventor 王晓龙郭玉雄蒋盼吴涛周峰
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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