Nitrogen dioxide sensor based on organic thin film transistor and preparation method thereof
A technology of nitrogen dioxide and organic thin film, which is applied in the field of nitrogen dioxide sensor and its preparation, can solve the problems of low carrier mobility and poor crystallinity of film formation, realize hole transport, improve surface roughness, expand The effect of working range
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Embodiment 1
[0043] Such as Figure 1-2 As shown, a nitrogen dioxide sensor based on an organic thin film transistor, the nitrogen dioxide sensor includes a substrate 1, a gate electrode 2, a dielectric layer 3, an organic semiconductor layer 4, a source electrode 5 and a drain electrode in order from bottom to top 6. The organic semiconductor layer 4 is a mixed material of gold nanorods and organic semiconductor materials; wherein, the gate electrode 2, the source electrode 5 and the drain electrode 6 are all silver nanowires, and the dielectric layer 3 is made of polystyrene (PS) , the thickness is 500nm, the semiconductor layer 4 is formed by mixing P3HT and gold nanorod solution (concentration is 0.1mg / ml), and the thickness is 50nm. An organic thin film transistor nitrogen dioxide sensor with high sensitivity and high stability can be realized by using the structure. An organic thin film transistor nitrogen dioxide sensor with high sensitivity and high stability can be realized by us...
Embodiment 2
[0052] Such as figure 1 As shown, a nitrogen dioxide sensor based on an organic thin film transistor, the nitrogen dioxide sensor includes a substrate 1, a gate electrode 2, a dielectric layer 3, an organic semiconductor layer 4, a source electrode 5 and a drain electrode in order from bottom to top 6. The organic semiconductor layer 4 is a mixed material of gold nanorods and organic semiconductor materials; wherein, the gate electrode 2, the source electrode 5 and the drain electrode 6 are all gold nanowires, and the dielectric layer 3 is made of polymethyl methacrylate (PMMA), with a thickness of 300nm, and the semiconductor layer 4 is formed by mixing P3HT and gold nanorod solution (concentration: 0.3mg / ml), with a thickness of 70nm. An organic thin film transistor nitrogen dioxide sensor with high sensitivity and high stability can be realized by using the structure.
[0053] A method for preparing a nitrogen dioxide sensor based on an organic thin film transistor, compri...
Embodiment 3
[0060] Such as figure 1 As shown, a nitrogen dioxide sensor based on an organic thin film transistor, the nitrogen dioxide sensor includes a substrate 1, a gate electrode 2, a dielectric layer 3, an organic semiconductor layer 4, a source electrode 5 and a drain electrode in order from bottom to top 6. The organic semiconductor layer 4 is a mixed material of gold nanorods and organic semiconductor materials; wherein, the gate electrode 2, the source electrode 5 and the drain electrode 6 are all indium nanowires, and the dielectric layer 3 is made of polyvinyl alcohol (PVA) , with a thickness of 300nm, the semiconductor layer 4 is formed by mixing P3HT and gold nanorod solution (concentration: 0.5mg / m1), and the thickness is 60nm. An organic thin film transistor nitrogen dioxide sensor with high sensitivity and high stability can be realized by using the structure.
[0061] A method for preparing a nitrogen dioxide sensor based on an organic thin film transistor, comprising th...
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