Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of nano SiO2 hybrid self-cleaning organic silicon resin

A self-cleaning, silicone technology, applied in the direction of coating, etc., can solve the problems of expensive fluorine-containing raw materials, low practical application value, and difficulty in engineering, and achieve excellent self-cleaning performance, low price, and easy film formation Effect

Active Publication Date: 2020-08-18
NANJING UNIV OF TECH
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The patent number is CN201010261313.4, which synthesizes a hydrophobic resin, but the fluorine-containing raw materials used in it are expensive and damage the environment
Patent No. CN201611063983.9, the water contact angle of the resin coating is 121°, but the preparation process is complicated, the procedure is cumbersome, it is difficult to realize engineering, and the practical application value is low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of nano SiO2 hybrid self-cleaning organic silicon resin
  • Preparation method of nano SiO2 hybrid self-cleaning organic silicon resin
  • Preparation method of nano SiO2 hybrid self-cleaning organic silicon resin

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0026] At 70°C, add 0.4mol methyltriethoxysilane, 0.8mol butanol, 8mmol acetone, 0.9mol silica sol and 0.1mol ethyl acetate into a three-necked flask, mix well and stir for 25 minutes. The pH of the deionized water was adjusted to 2.7 with glacial acetic acid, and 1.2 mol of acetic acid aqueous solution was weighed and added dropwise into the mixed solution. The above mixed solution was stirred at 70° C. for 4 hours, and a mixed hydrolyzate was obtained through a hydrolysis-condensation reaction. The above mixed hydrolyzate was raised to 130°C at a gradient rate of 3°C / min, and distilled under normal pressure to obtain nano-SiO with a high degree of crosslinking. 2 Hybrid self-cleaning silicone resin. nano-SiO 2 The hybrid self-cleaning silicone resin is diluted with butanol and evenly coated on the glass sheet. Its visible light transmittance is 98%, water contact angle is 125°, GB / T6739-2006 pencil hardness is 5H grade, ISO-2409 attached The strength is grade 1, and the m...

example 2

[0031] At 60°C, 0.2mol methyltrimethoxysilane, 0.2mol methyltriethoxysilane, 0.1mol dimethyldimethoxysilane, 1mol methanol, 0.7mmol cyclohexanone, 1.25mol silica sol and 0.1 mol ethyl propionate was added into the three-necked flask, mixed evenly and then stirred for 30 minutes. The pH of the deionized water was adjusted to 1.7 with dilute hydrochloric acid, and 0.3 mol aqueous hydrochloric acid solution was weighed and added dropwise into the mixed solution. The above mixed solution was stirred at 60° C. for 5 hours, and a mixed hydrolyzate was obtained through hydrolysis-condensation reaction. The above mixed hydrolyzate was raised to 180°C at a gradient rate of 10°C / min, and distilled under normal pressure to obtain nano-SiO with a high degree of crosslinking. 2 Hybrid self-cleaning silicone resin. nano-SiO 2 The hybrid self-cleaning silicone resin is diluted with butanol and evenly coated on the glass sheet. Its visible light transmittance is 94%, water contact angle is...

example 3

[0033] At 40°C, add 0.1mol trimethylmethoxysilane, 0.3mol methyltriethoxysilane, 1.0mol ethanol, 0.4mmol methyl butanone, 1.0mol silica sol and 0.2mol ethyl acetate into a three-necked flask , and stir for 45 minutes after mixing well. Ascorbic acid was used to adjust the pH of the deionized water to 3.3, and 1.0 mol of ascorbic acid aqueous solution was weighed and added dropwise to the mixed solution. The above mixed solution was stirred at 40° C. for 7 hours, and a mixed hydrolyzate was obtained through a hydrolysis-condensation reaction. The above mixed hydrolyzate was raised to 120°C at a gradient rate of 5°C / min, and distilled under normal pressure to obtain nano-SiO with a high degree of crosslinking. 2 Hybrid self-cleaning silicone resin. nano-SiO 2The hybrid self-cleaning silicone resin is diluted with butanol and evenly coated on the glass sheet. Its visible light transmittance is 98%, water contact angle is 121°, GB / T6739-2006 pencil hardness is 3H, ISO-2409 atta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Water contact angleaaaaaaaaaa
Maximum temperatureaaaaaaaaaa
Water contact angleaaaaaaaaaa
Login to View More

Abstract

The invention relates to a preparation method of nano SiO2 hybrid self-cleaning organic silicon resin. The preparation method comprises the following steps: taking silica sol as inorganic particles and silsesquioxane as an organic precursor, carrying out a sol-gel reaction under the combined action of deionized water, an organic solvent and a catalyst to obtain a mixed hydrolysate, and carrying out high-temperature distillation to obtain the nano SiO2 hybrid self-cleaning organic silicon resin with a high crosslinking degree. The adopted preparation process is simple, the cost is low, and thelarge-scale industrial production is promoted. The prepared nano SiO2 hybrid self-cleaning organic silicon resin is diluted and coated on a glass sheet; the visible light transmittance is 94 to 99%; the water contact angle is 112-138 degrees; the pencil hardness grade of GB / T 6739-2006 is 3-6H, the ISO-2409 adhesive force grade is 0-2, the highest tolerable temperature after curing by an iodine-tungsten lamp is 150-240 DEG C, the weather resistance and the water resistance are excellent, and the organic silicon resin can be applied to the fields of automobile glass, building curtain walls, special coatings and the like.

Description

technical field [0001] The invention belongs to the field of preparation of new materials and relates to a nano-SiO 2 Preparation method of hybrid self-cleaning silicone resin. Background technique [0002] The surface of silicate glass exhibits hydrophilicity with high surface energy, which inevitably brings problems such as poor stain resistance, low self-cleaning ability, and easy fogging, which brings a lot of inconvenience to life and production. Therefore, the study of self-cleaning glass coatings has received extensive attention. Silica sol is SiO 2 Dispersion solutions, which are widely used and inexpensive. SiO 2 The coating has the advantages of heat resistance, weather resistance, low refraction, low dielectric and transparency, but there is a large amount of Si-OH on its surface, and its hydrophobicity is poor. The basic structural unit of organosilicon compound is Si-O-Si chain, and the organic group is directly connected to the Si atom through the side cha...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09D183/04C09D7/61C03C17/00C03C17/30C08G77/06
CPCC09D183/04C09D7/61C03C17/009C03C17/30C08G77/06C08K2201/011C08K3/36
Inventor 李梦媛方显力孙攀
Owner NANJING UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products