MoS2/YSZ (molybdenum disulfide/yttria stabilized zirconia) composite film with high wear resistance and radiation resistance and preparation method of MoS2/YSZ composite film

A technology of yttrium-stabilized zirconia and composite thin films, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of rapid lubricating failure, lowering the dislocation threshold, increasing the unsaturated vacancies of MoS2 crystals, etc. , to achieve the effect of good crystallization performance

Active Publication Date: 2020-09-15
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI +1
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Problems solved by technology

But most elements are doped at the expense of MoS 2 Degree of order, increasing MoS 2 At the expense of crystal unsaturation and the introduction of defects such as vacancies
The existence of these defects will greatly reduce the dislocation threshold of

Method used

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  • MoS2/YSZ (molybdenum disulfide/yttria stabilized zirconia) composite film with high wear resistance and radiation resistance and preparation method of MoS2/YSZ composite film
  • MoS2/YSZ (molybdenum disulfide/yttria stabilized zirconia) composite film with high wear resistance and radiation resistance and preparation method of MoS2/YSZ composite film
  • MoS2/YSZ (molybdenum disulfide/yttria stabilized zirconia) composite film with high wear resistance and radiation resistance and preparation method of MoS2/YSZ composite film

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Embodiment Construction

[0026] The following specific examples of MoS of the present invention 2 / YSZ film preparation and properties for further explanation.

[0027] Equipment used: RF magnetron sputtering system manufactured by Shen Keyi Co., Ltd., Chinese Academy of Sciences, model JS-600. The system is mainly composed of a deposition chamber, a substrate plate, a DC power supply, two RF power supplies, a bias power supply and a set of vacuum pumping devices. The sputtering power supply is connected to the target, and the bias voltage is connected to the substrate. The annealing equipment was manufactured by Hefei Kejing Material Technology Co., Ltd., and the model is OTF-1200X.

[0028] Clean the silicon substrate: put the monocrystalline silicon (001) in anhydrous acetone and ultrasonically clean it for 10 minutes, then place it in anhydrous ethanol for 10 minutes, dry it with an air gun and place it in a deposition chamber.

[0029] Vacuuming: First use a mechanical pump to pump the air pres...

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Abstract

The invention discloses a preparation method of a MoS2/YSZ (molybdenum disulfide/yttria stabilized zirconia) composite film with high wear resistance and radiation resistance. The preparation method comprises the following steps: firstly, preparing the MoS2/YSZ composite film by adopting a radio frequency magnetron sputtering physical vapor deposition technology, and then performing thermal annealing treatment on the film to eliminate intrinsic defects of MoS2 crystals in the magnetron sputtering growth process. The obtained film MoS2 shows (002) preferred orientation, good crystallization performance, presents low friction, high wear resistance (average friction coefficient (0.05, wear life) 2*105 turns) and high wear resistance and radiation resistance, and achieves integration of low friction and radiation-resistant self-adaptation of the MoS2/YSZ based composite film. Therefore, the composite film can be used for lubrication of mechanical moving parts in the irradiation environments of reactors and fusion reactors.

Description

technical field [0001] The invention relates to a molybdenum disulfide / yttrium stabilized zirconia composite film (MoS 2 / YSZ) and its preparation method are mainly used for the lubrication of mechanical moving parts in the irradiation environment of reactors and fusion reactors. Background technique [0002] Energy is the basis for the development of human society, and nuclear energy has become a clean, safe and efficient important resource that can be developed and used on a large scale. China's nuclear power development is divided into three steps: advanced pressurized water reactors, fast reactors / breeder reactors, and fusion reactors. At present, most of the work is mainly focused on the research on the mechanism of radiation damage resistance of reactor nuclear structural materials. So far, the anti-radiation damage dose of the designed reactor nuclear structural materials is close to 200dpa. The engineering design of the fourth-generation reactor and fusion reactor...

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Application Information

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IPC IPC(8): C23C14/35C23C14/06C23C14/08C23C14/58C23C14/02
CPCC23C14/022C23C14/025C23C14/0623C23C14/083C23C14/352C23C14/5806
Inventor 王鹏程勇段泽文赵晓宇
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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