A kind of preparation method of silicon-based catalyst for photoelectrochemical reduction of nitrogen
A photoelectrochemical and catalyst technology, used in electrodes, electrolysis components, electrolysis processes, etc., can solve the problems of lack of efficient catalysts, catalysts that cannot effectively suppress the hydrogen evolution reaction, etc., and achieve the effects of abundant reserves, high nitrogen reduction catalytic activity and low price.
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Embodiment 1
[0040] A method for preparing a silicon-based catalyst for nitrogen photoelectrochemical reduction, comprising the steps of:
[0041] (1) Cut the silicon wafer into 2cm*2.5cm size, wash it with acetone, ethanol, and water in sequence, and put the cleaned silicon wafer into the piranha solution prepared with 14mL concentrated sulfuric acid and 6mL 30% hydrogen peroxide to react for 2min After taking it out, put it into a hydrofluoric acid solution with a mass fraction of 5% to react for 1 min;
[0042] (2) Put the reacted silicon chip into a mixed solution of 4.8mol / L hydrofluoric acid and 0.005mol / L silver nitrate and let it stand for 1min. After the reaction, take it out and wash it with deionized water for 5 times; Put the tablet into a mixed solution of 4.8mol / L hydrofluoric acid and 0.4mol / L hydrogen peroxide for 30min;
[0043](3) Put the reacted silicon chip into nitric acid with a mass fraction of 50% for 2 minutes, and then put it into a hydrofluoric acid solution wit...
Embodiment 2
[0047] A method for preparing a silicon-based catalyst for nitrogen photoelectrochemical reduction, comprising the steps of:
[0048] (1) Cut the silicon wafer into 2cm*2.5cm size, wash it with acetone, ethanol, and water in sequence, put the cleaned silicon wafer into the piranha solution prepared with 14mL concentrated sulfuric acid and 6mL 30% hydrogen peroxide to react for 2.5 min, take it out and then put it into a hydrofluoric acid solution with a mass fraction of 4% to react for 2 min;
[0049] (2) Put the reacted silicon chip into a mixed solution of 4.5mol / L hydrofluoric acid and 0.006mol / L silver nitrate and let it stand for 1.5min. After the reaction, take it out and wash it with deionized water for 5 times; Place the silicon wafer in a mixed solution of 4.5mol / L hydrofluoric acid and 0.6mol / L hydrogen peroxide for 15 minutes;
[0050] (3) Continue to put the reacted silicon wafer into nitric acid with a mass fraction of 45% for 3 minutes, and then put it into a hy...
Embodiment 3
[0054] A method for preparing a silicon-based catalyst for nitrogen photoelectrochemical reduction, comprising the steps of:
[0055] (1) Cut the silicon wafer into 2cm*2.5cm size, wash it with acetone, ethanol, and water in sequence, and put the cleaned silicon wafer into a piranha solution prepared with 14mL concentrated sulfuric acid and 6mL 30% hydrogen peroxide for 3 minutes. After taking it out, put it into a hydrofluoric acid solution with a mass fraction of 6% to react for 1 min;
[0056] (2) Put the reacted silicon chip into a mixed solution of 5mol / L hydrofluoric acid and 0.004mol / L silver nitrate and let it stand for 2 minutes. After the reaction, take it out and wash it with deionized water for 5 times; Put it into a mixed solution of 5mol / L hydrofluoric acid and 0.3mol / L hydrogen peroxide for 20 minutes;
[0057] (3) Continue to put the reacted silicon wafer into nitric acid with a mass fraction of 55% for 2.5 minutes, and then put it into a hydrofluoric acid sol...
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