DLC composite film with running-in layer of porous structure and preparation technology thereof
A technology of composite thin film and porous structure, which is applied in metal material coating process, superimposed layer plating, coating and other directions, which can solve the problems of not being able to achieve the desired effect, the influence of coating film forming process characteristics, and large frictional resistance
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Embodiment 1
[0049] Ultrasonic cleaning of the base material 1 of the part to be coated is carried out in the furnace, heated to 200°C in the coating chamber and vacuumed to within 4mPa; the base material 1 of the part is etched with argon ion, and a 0.2 μm Cr bonding layer 2, 0.2 μm Cr / WC transition layer 3 and 0.2 μm WC-C:H transition layer 4;
[0050] Feed acetylene to adjust the reaction pressure to 0.3Pa, turn on the electromagnetic coil until the magnetic field strength is ≥ 5mT, the bias power supply adopts the constant current pulse output mode: current 5A, pulse frequency 50KHz, duty cycle 80%, deposit 1.5μm hydrogen-containing DLC layer 5 ;Keep the electromagnetic coil open, feed the mixed gas of acetylene and argon, the ratio of acetylene and argon is 10:1; adjust the reaction pressure to 3Pa, set the bias power supply to constant voltage pulse output mode, bias voltage 600V, pulse frequency 50KHz, The void ratio is 80%, and a porous carbon-based running-in layer 6 of 1.5 μm i...
Embodiment 2
[0052] Ultrasonic cleaning of the base material 1 of the part to be coated is carried out in the furnace, heated to 150°C in the coating chamber and vacuumed to within 4mPa; the base material 1 of the part is etched with argon ion, and a 0.2 μm Cr bonding layer 2, 0.2 μm Cr / WC transition layer 3 and 0.2 μm WC-C:H transition layer 4;
[0053] Feed acetylene to adjust the reaction pressure to 0.3Pa, turn on the electromagnetic coil until the magnetic field strength is ≥ 5mT, the bias power supply adopts the constant current pulse output mode: current 5A, pulse frequency 50KHz, duty cycle 80%, deposit 1.5μm hydrogen-containing DLC layer 5 ;Keep the electromagnetic coil open, feed the mixed gas of acetylene and argon, the ratio of acetylene and argon is 10:3; the reaction pressure is adjusted to 5Pa, the bias power supply is set to constant voltage pulse output mode, the bias voltage is 1100V, the pulse frequency is 40KHz, The void ratio is 80%, and a porous carbon-based running...
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