Preparation process of Zr-B-N/ZrO2 nano multilayer composite coating with high hardness and high-temperature oxidation resistance
A high-temperature oxidation resistance, nano-multi-layer technology, applied in metal material coating process, coating, ion implantation plating and other directions, can solve the problem of maximum hardness reduction, achieve obvious high temperature resistance, wide application prospects, chemical properties stable effect
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Embodiment 1
[0038] This example is to prepare Zr-B-N / ZrO with a modulation period of 80nm and different modulation ratios. 2 Nano multilayer composite coating.
[0039] In this embodiment, Zr-B-N / ZrO is deposited on a single crystal Si sheet (40mm×40mm×0.67mm), a cemented carbide sheet (25mm×25mm×3.0mm) and a stainless steel sheet (35mm×35mm×1.0mm). 2 Nano multi-layer composite coating is coated by pulse direct current and high-power pulse composite magnetron sputtering technology. The specific operation steps are as follows:
[0040] (1) After the cemented carbide substrate is polished, place the pre-prepared single crystal silicon wafer and 304 stainless steel sheet in an ultrasonic cleaning machine, and then ultrasonically clean them in acetone and alcohol solutions for 20 minutes, and then use high-purity N 2 (99.999%) blow dry, press at the specified position of the fixture, after the vacuum chamber is vented, open the vacuum chamber furnace door, fix the substrate on the turret in...
Embodiment 2
[0056] This embodiment is to prepare modulation ratio (Zr-B-N layer and ZrO 2 Zr-B-N / ZrO with a layer thickness ratio) of 5:1 and different modulation periods (40, 60, 80, 100, 120nm) 2 Nano multilayer composite coating.
[0057] This embodiment is to deposit Zr-B-N / ZrO under different modulation periods on the mirror-polished single crystal Si sheet ((100) crystal plane) and cemented carbide. 2 Nano multi-layer composite coating, the substrate size is 50mm×10mm×0.7mm. Before coating, the substrate was ultrasonically cleaned in alcohol solution for 20 minutes, then dried with high-purity nitrogen, and placed on the sample holder in the vacuum chamber facing the target. The coating process is carried out on the V-TECH AS610 high-power pulse and pulse DC composite magnetron sputtering coating machine. The coating machine is also equipped with an arc ion plating cathode. The target materials are metal Zr target and compound ZrB 2 Target (purity is wt.99.9%), high-purity Ar (pu...
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