Nano multilayer structure metal hydrogen absorption film and preparation method and application thereof

A nano-multi-layer and metal technology, applied in the field of hydrogen absorbing materials, can solve the problems such as the hydrogen absorbing ability needs to be improved

Pending Publication Date: 2022-03-15
MATERIAL INST OF CHINA ACADEMY OF ENG PHYSICS +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This type of getter has the advantages of low hydrogen absorption equilibrium pressure, selective gas absorption, large gas absorption rate and capacity, low temperature activation, and normal temperature use. It has been widely used in the fields of electric vacuum devices, ultra-high vacuum acquisition, atomic energy industry, and hydrogen isotope recovery It has been widely used, but its hydrogen absorption capacity still needs to be improved

Method used

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  • Nano multilayer structure metal hydrogen absorption film and preparation method and application thereof
  • Nano multilayer structure metal hydrogen absorption film and preparation method and application thereof
  • Nano multilayer structure metal hydrogen absorption film and preparation method and application thereof

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preparation example Construction

[0036] The present invention also provides a method for preparing a nano-multilayer structure metal hydrogen-absorbing film described in the above technical solution, comprising the following steps:

[0037] Depositing a nanometer multilayer structure metal layer on the surface of the substrate to obtain a substrate / hydrogen-absorbing metal layer composite film;

[0038] The substrate / hydrogen-absorbing metal layer composite film is subjected to in-situ degassing treatment, and then a metal catalyst layer is deposited on the surface of the nano-multilayer structure metal layer to obtain a nano-multilayer structure metal hydrogen-absorbing film.

[0039] The invention deposits a nanometer multilayer structure metal layer on the substrate surface to obtain a substrate / hydrogen-absorbing metal layer composite film. In the present invention, the substrate preferably includes a silicon substrate. In the present invention, the deposition method is preferably a magnetron sputtering ...

Embodiment 1

[0059] Nanostructured zirconium-titanium hydrogen-absorbing layer / palladium catalytic layer composite film, wherein the zirconium-titanium hydrogen-absorbing layer is 25 cycles of 20nmZr-12nmTi alternating layers; the thickness of the palladium catalytic layer is 100nm.

[0060] Put the silicon substrate into the ultra-high vacuum chamber of the magnetron sputtering system, and evacuate until the background vacuum of the chamber is less than 5×10 -6 Pa; then feed high-purity argon (Ar, 99.999%), when the argon flow rate is 5sccm, the target sputtering power is 100W, and the target base distance is 8cm, a single target is used to alternately deposit zirconium and titanium hydrogen-absorbing metal films, Alternately deposit 25 cycles to prepare a hydrogen-absorbing metal film with a total thickness of 800nm, a zirconium single-layer thickness of 20nm, and a titanium single-layer thickness of 12nm. Palladium deposits palladium catalytic layer, and deposition time is 15min, obtain...

Embodiment 2

[0064] Nanostructured zirconium-titanium hydrogen-absorbing layer / palladium catalytic layer composite film, wherein the zirconium-titanium hydrogen-absorbing layer is 66 cycles of 7.5nmZr-4.3nmTi alternating layers; the thickness of the palladium catalytic layer is 100nm.

[0065] Put the silicon substrate into the ultra-high vacuum chamber of the magnetron sputtering system, and evacuate until the background vacuum of the chamber is less than 5×10 -4 Pa; then feed high-purity argon gas (Ar, 99.999%), when the argon gas flow rate is 5 sccm, the target sputtering power is 100W, and the target base distance is 8cm, a single target is used to alternately deposit zirconium or titanium hydrogen-absorbing metal films, Alternately deposit 66 cycles to prepare a hydrogen-absorbing metal film with a total thickness of 765.6nm, a single layer of zirconium with a thickness of 7.3nm, and a single layer of titanium with a thickness of 4.3nm. The palladium catalyst layer was deposited by si...

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Abstract

The invention provides a nano multilayer structure metal hydrogen absorption film as well as a preparation method and application thereof, and relates to the technical field of hydrogen absorption materials. The invention provides a nano multilayer structure metal hydrogen absorption film. The nano multilayer structure metal hydrogen absorption film comprises a nano multilayer structure metal layer and a metal catalyst layer which are sequentially arranged in a laminated mode. The nano multilayer structure metal layer comprises a plurality of hydrogen absorption metal layers which are alternately laminated; the hydrogen absorption metal layer comprises a zirconium layer and a titanium layer; the component of the metal catalyst layer comprises palladium. According to the invention, the nanometer multilayer structure metal layer has a good combination effect on hydrogen, the metal catalytic layer has catalytic activity on hydrogen, and the nanometer multilayer structure metal layer and the metal catalytic layer are arranged in a laminated manner, so that hydrogen in a closed space can be effectively absorbed.

Description

technical field [0001] The invention relates to the technical field of hydrogen-absorbing materials, in particular to a nanometer multilayer structure metal hydrogen-absorbing film and its preparation method and application. Background technique [0002] Hydrogen (H 2 ) generation and accumulation is inevitable. Hydrogen can cause hydrogen corrosion of metal materials and form metal hydrides, resulting in plastic loss and hysteresis cracking of materials; for some electronic components, the infiltration of hydrogen will lead to deterioration of component performance; for some chambers with high vacuum requirements, hydrogen The generation will reduce the vacuum required for the normal operation of the vacuum device. Therefore, there is a need to reduce the concentration of hydrogen or its isotopes in a closed environment. In addition to controlling the generation of hydrogen in the environment as much as possible, it is also a feasible and commonly used method to absorb a...

Claims

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Application Information

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IPC IPC(8): C23C14/16C23C14/35C23C14/58B01D67/00B01D69/02B01D69/12B01J20/02B01J20/28B82Y30/00B82Y40/00B01J23/44B01J37/02
CPCC23C14/35C23C14/352C23C14/165C23C14/5806B82Y30/00B82Y40/00B01J20/0211B01J20/28035B01D69/12B01D69/02B01D67/0072B01J23/44B01J37/0225B01D2325/10B01D2325/12
Inventor 郭亚昆任峰陈长安钟芬赵星滔叶小球邹东利李赣
Owner MATERIAL INST OF CHINA ACADEMY OF ENG PHYSICS
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