Unlock instant, AI-driven research and patent intelligence for your innovation.

BAW filter structure and preparation method thereof

A filter structure and structure technology, applied in the direction of impedance network, electrical components, etc., can solve the problems of piezoelectric film warpage and stress, difficult process, damage, etc., to reduce process difficulty and cost, reduce process Effects of complexity and warpage reduction

Pending Publication Date: 2022-05-13
FUJIAN SUNWISE SEMICON TECH CO LTD
View PDF2 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these methods all perform wafer bonding and substrate peeling of the piezoelectric film, which have the following disadvantages: (1) The thermal expansion coefficient mismatch between the piezoelectric film and the substrate is one of the main reasons for the stress of the film. The variable is determined by the public expression ΔL=α·ΔT·L, where α is the coefficient of thermal expansion, ΔT is the temperature change, and L is the length. It can be seen that the warpage and stress of the film are proportional to its size
The warpage and stress of the piezoelectric film bonded to the whole wafer are relatively large. During the substrate peeling and subsequent device processing, it is very easy to cause the collapse and damage of the resonant structure, resulting in a high failure rate of the device.
(2) Whole wafer bonding has high requirements on the flatness of the support substrate surface, so chemical mechanical polishing has to be used, which has high process complexity and is easy to cause surface mechanical damage.
(3) Cascade construction of filters usually requires interconnecting the bottom and top electrodes of multiple BAW resonators, using the method of whole wafer bonding. Later, it is necessary to etch the piezoelectric film to form interconnection holes. Difficult and easy to cause collapse and damage of the film
[0006] Considering parameters such as stress, length, thickness, temperature, etc. in the laboratory, it is not impossible to produce chips in a refined manner, but there will be great problems in applying laboratory methods to industrialized industries.
None of the above methods can achieve the rapid mass production and high yield required by industrialization

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • BAW filter structure and preparation method thereof
  • BAW filter structure and preparation method thereof
  • BAW filter structure and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] On the epitaxial substrate 110, an epitaxial growth process, such as MOCVD, MBE or PLD, is used to deposit a piezoelectric film 120 with a certain thickness, such as figure 1 shown. The material of the piezoelectric film 120 can be single crystal or polycrystalline. Compared with polycrystalline materials, single crystal materials have superior electrical and acoustic properties. If you use single crystal material, you can choose AlN, AlScN, ZnO or Ga 2 o 3 Wait. The specific thickness of the piezoelectric film 120 is selected according to the application frequency band of the manufactured target device.

[0059] Deposit the bottom electrode unit 131 on the upper surface of the piezoelectric film 120, and pattern the bottom electrode unit 131 according to the design layout of the target device, such as figure 2 shown.

[0060] The piezoelectric film 120 is etched until the epitaxial substrate 110 is exposed. The etched piezoelectric film 120 becomes two or more ...

Embodiment 2

[0071] Compared with the first embodiment, the preparation process of the transfer structure 100 is the same, the difference mainly lies in the difference in the preparation process of the bonding structure 200 , which leads to the difference in the structure of the target device.

[0072] When preparing the bonded structure 200, a cavity extending downward is dug out on the upper surface of the supporting substrate 210 using a known process, and the cavity is filled flat with a sacrificial material to form a Figure 15 The sacrificial unit 221 is shown.

[0073] Over the sacrificial unit 221, the bonding unit 231 is flatly covered, and at the same time, a release hole 232 for post-processing is reserved, so that the following Figure 16 The bonded structure 200 is shown.

[0074] The transfer structure 100 is inverted and bonded to the bonded structure 200 to obtain the following Figure 17 The BAW structure 300 is shown.

[0075] Remove the epitaxial substrate 110, the st...

Embodiment 3

[0080] Compared with Embodiment 1, the preparation process of the transfer structure 100 is the same, and the difference mainly lies in the difference in the preparation process of the bonding structure 200 , which leads to the difference in the structure of the target device.

[0081] When preparing the bonding structure 200, the Bragg reflection unit 222 is prepared on the support substrate 210, and the Bragg reflection unit 222 is located in the resonance region of the design layout, such as Figure 21 shown.

[0082] Covering the bonding unit 231 flatly above the Bragg reflection unit 222 results in the following Figure 22 The bonded structure 200 is shown.

[0083] The transfer structure 100 is inverted and bonded to the bonded structure 200 to obtain the following Figure 23 The BAW structure 300 is shown.

[0084] Remove the epitaxial substrate 110, such as Figure 24 shown.

[0085] A patterned top electrode unit 141 is deposited on the exposed piezoelectric film...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a BAW filter structure and a preparation method, and relates to a radio frequency filtering technology. In order to solve the problem that industrial production cannot be realized due to the stress problem in the prior art, the scheme is provided, and mutually independent piezoelectric film units are generated on the surface of an epitaxial substrate to obtain a transfer structure body; arranging a resonance area on the supporting substrate and covering the bonding unit to obtain a bonding structure body; the upper surface and the lower surface of the transfer structure body are overturned, and the bottom electrode units and the resonance areas are bonded in a one-to-one correspondence mode to obtain a BAW structure body; the epitaxial substrate is removed, and a top electrode unit is generated on the surface, making contact with the epitaxial substrate originally, of the piezoelectric film unit. The single crystal thin film device has the advantages of being simple in structure, simple in process, high in isolation degree and extremely small in stress problem, low in cost, high in efficiency and high in yield during batch production, and suitable for being applied to industrial production and especially suitable for industrial manufacturing of the single crystal thin film device.

Description

technical field [0001] The invention relates to radio frequency filtering technology, in particular to a BAW filter structure and a preparation method. Background technique [0002] RF filter is one of the important devices in the field of wireless communication. With the advent of the era of big data and the Internet of Things, the filters assembled in the RF front-end must develop in the direction of high frequency, low loss, miniaturization, and integration. Bulk Acoustic Wave (BAW) filters based on piezoelectric materials are a preferred solution for RF filters. By cascading multiple BAW resonators according to a certain topology, the center frequency can be as high as several GHz. RF filter specifications. Compared with traditional ceramic filters and surface acoustic wave filters also based on piezoelectric materials, BAW filters have unparalleled volume advantages, as well as advantages such as high operating frequency band and high power capacity. [0003] The bas...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H03H9/17H03H3/02
CPCH03H9/171H03H3/02H03H2003/023H03H2003/025H03H2003/021H03H9/0542H03H9/587H03H9/588H03H9/589H03H9/605
Inventor 王钢涂雨佳卢星陈梓敏
Owner FUJIAN SUNWISE SEMICON TECH CO LTD