BAW filter structure and preparation method thereof
A filter structure and structure technology, applied in the direction of impedance network, electrical components, etc., can solve the problems of piezoelectric film warpage and stress, difficult process, damage, etc., to reduce process difficulty and cost, reduce process Effects of complexity and warpage reduction
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Embodiment 1
[0058] On the epitaxial substrate 110, an epitaxial growth process, such as MOCVD, MBE or PLD, is used to deposit a piezoelectric film 120 with a certain thickness, such as figure 1 shown. The material of the piezoelectric film 120 can be single crystal or polycrystalline. Compared with polycrystalline materials, single crystal materials have superior electrical and acoustic properties. If you use single crystal material, you can choose AlN, AlScN, ZnO or Ga 2 o 3 Wait. The specific thickness of the piezoelectric film 120 is selected according to the application frequency band of the manufactured target device.
[0059] Deposit the bottom electrode unit 131 on the upper surface of the piezoelectric film 120, and pattern the bottom electrode unit 131 according to the design layout of the target device, such as figure 2 shown.
[0060] The piezoelectric film 120 is etched until the epitaxial substrate 110 is exposed. The etched piezoelectric film 120 becomes two or more ...
Embodiment 2
[0071] Compared with the first embodiment, the preparation process of the transfer structure 100 is the same, the difference mainly lies in the difference in the preparation process of the bonding structure 200 , which leads to the difference in the structure of the target device.
[0072] When preparing the bonded structure 200, a cavity extending downward is dug out on the upper surface of the supporting substrate 210 using a known process, and the cavity is filled flat with a sacrificial material to form a Figure 15 The sacrificial unit 221 is shown.
[0073] Over the sacrificial unit 221, the bonding unit 231 is flatly covered, and at the same time, a release hole 232 for post-processing is reserved, so that the following Figure 16 The bonded structure 200 is shown.
[0074] The transfer structure 100 is inverted and bonded to the bonded structure 200 to obtain the following Figure 17 The BAW structure 300 is shown.
[0075] Remove the epitaxial substrate 110, the st...
Embodiment 3
[0080] Compared with Embodiment 1, the preparation process of the transfer structure 100 is the same, and the difference mainly lies in the difference in the preparation process of the bonding structure 200 , which leads to the difference in the structure of the target device.
[0081] When preparing the bonding structure 200, the Bragg reflection unit 222 is prepared on the support substrate 210, and the Bragg reflection unit 222 is located in the resonance region of the design layout, such as Figure 21 shown.
[0082] Covering the bonding unit 231 flatly above the Bragg reflection unit 222 results in the following Figure 22 The bonded structure 200 is shown.
[0083] The transfer structure 100 is inverted and bonded to the bonded structure 200 to obtain the following Figure 23 The BAW structure 300 is shown.
[0084] Remove the epitaxial substrate 110, such as Figure 24 shown.
[0085] A patterned top electrode unit 141 is deposited on the exposed piezoelectric film...
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