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Feedback type two-end fuse storage unit and preparation method thereof

A memory unit and feedback technology, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, semiconductor devices, etc., can solve the problems of slow programming speed and high power consumption, and achieve easy integration, reduced power consumption, and lower programming voltage Effect

Pending Publication Date: 2022-07-05
XIANGTAN UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The physical mechanism of the traditional fuse is based on the electromigration effect. When the device is working, the electrons in the metal wire undergo electron migration under the action of a large current, and the metal ions undergo mass transport along the conductor, causing voids or crystals to form in some parts of the conductor. Whiskers (hills), the metal wire breaks, forming a high-resistance state; traditional fuses at both ends require high current or high voltage to program, and it relies on heat to program, which requires heat accumulation during the programming process, resulting in slow programming speed and low performance. consumes a lot;

Method used

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  • Feedback type two-end fuse storage unit and preparation method thereof
  • Feedback type two-end fuse storage unit and preparation method thereof
  • Feedback type two-end fuse storage unit and preparation method thereof

Examples

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Embodiment 1

[0044] An embodiment of the present invention provides a feedback type two-terminal fuse storage unit, such as image 3 As shown, there is a substrate 1, a graphene channel 2 on the substrate 1, a drain electrode 3 and a source electrode 4 at both ends of the graphene channel 2, and a drain electrode 3 and a source electrode 4 are formed between the drain electrode 3 and the source electrode 4. The gate window has a metal gate 5 in the gate window, the metal gate 5 is perpendicular to the extension direction of the graphene channel 2 and is in electrical contact with the above-mentioned drain, an oxide layer is formed on the outer surface of the metal gate 5, and the above-mentioned metal gate There is a gate oxide layer between 5 and the above-mentioned graphene channel 2 . In this embodiment, the graphene channel 2 is a single-layer graphene material. In another embodiment, the graphene channel 2 is a graphene nanoribbon. A drain electrode 3 and a source electrode 4 are res...

Embodiment 2

[0047] This embodiment proposes a method for preparing a feedback type two-terminal fuse storage unit, which includes the following steps:

[0048]For the subsequent micro-nano processing and pattern overlay of the device, marks are first made on the substrate. Because of the strong adhesion between titanium and the substrate, 5nm titanium and 50nm gold are used to make the marks to prevent the marks from falling off.

[0049] like Figure 4 As shown, a silicon monoxide substrate 101 is provided, and a layer of graphene material is transferred on the silicon oxide substrate 101. Specifically, firstly, the graphene material is obtained by in-situ growth on the copper foil by CVD, and then the graphene material on the copper foil is grown. The graphene material is transferred to the silicon oxide substrate, and the graphene channel 102 is obtained by patterning and etching the graphene material by electron beam exposure (EBL) and oxygen plasma etching (ICP), respectively. In ot...

Embodiment 3

[0053] This embodiment proposes another method for preparing a feedback type two-terminal fuse storage unit, and the specific steps are as follows:

[0054] The graphene channel 202 , the drain electrode 203 and the source electrode 204 are formed on the substrate 201 according to the steps in Embodiment 2. then as Figure 11 As shown, the grid window is patterned by electron beam exposure, and then a metal layer Al is deposited between the drain electrode 203 and the source electrode 204 by electron beam evaporation to form a metal grid 205, and the metal grid Al and the drain electrode 203 are electrically connected. touch.

[0055] further as Figure 12 As shown, the structure formed by the above steps is annealed and oxidized at a temperature of 120°C-150°C for 30-60min, and in this embodiment, it is baked at 150°C for 40min, so that the graphene channel 202 and the metal gate 205 A dense metal oxide film is formed at the interface. Among them, the gate of the fuse mem...

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Abstract

The invention discloses a feedback type two-end fuse storage unit and a preparation method thereof. According to the feedback type two-end fuse storage unit, on the basis of a traditional two-end fuse, the vertical metal gate is additionally arranged, the gate electrode is arranged on one side of the drain electrode and electrically connected with the drain electrode, after a voltage is applied to the drain end, a transverse voltage VDS and a vertical voltage VGS can be generated at the same time, and the two voltages are equal in magnitude, so that the stability of the two-end fuse storage unit is improved. By reasonably designing the thickness of the gate oxide layer, burnout from the gate to the channel in the vertical direction can occur first. Burnout in the vertical direction is achieved through tunneling current from the grid electrode to the channel, programming voltage and programming current can be reduced through the design, and mild low power consumption is achieved. According to the invention, the preparation of the fuse memory unit is realized by using electron beam exposure and lift-off processes, the process is simple, large-area device preparation can be realized, and the process cost is saved.

Description

technical field [0001] The invention relates to a nano-semiconductor device and a preparation method thereof, in particular to a feedback type two-terminal fuse device and a preparation method thereof. Background technique [0002] One-time programmable memory is a kind of non-volatile memory, which is only allowed to be written once during the application process, and the information cannot be changed once written. In general, it has two forms: fuse and anti-fuse. It is precisely because of its one-time programming feature that it has more advantages in reliability and security, and can be integrated into FPGA, PROM (programmable read only memory, one-time programmable read-only memory) and other one-time programmable memories, and are widely used in high-reliability aerospace, military FPGA and other fields. [0003] A traditional electric fuse (e-Fuse) is a two-terminal structure, including an anode, a cathode, and a thin strip-shaped fuse in which the anode and the cath...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/112H01L21/8246H10B20/00
CPCH10B99/00H10B20/20
Inventor 李雪娉邱晨光彭练矛
Owner XIANGTAN UNIV
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