Iodonium salt initiator, treatment-free thermo-sensitive plate precursor containing iodonium salt initiator, treatment-free thermo-sensitive plate and application of iodonium salt initiator
A technology of initiator and iodonium salt, applied in the field of lithography
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[0109] Synthesis of iodonium salt D13:
[0110] Add 23g sodium borate tetrahydrate, 40g acetic acid, 60g acetic anhydride to a 500ml four-necked flask with temperature-controlled heating, mechanical stirring, condensation reflux and nitrogen protection device, stir at 30 ° C for 1.5 hours, then add 58.2g 3,5 -Dimethyl-4-tert-butyl-p-iodobenzene, stirred at 40°C for 1.5 hours, then cooled to 0°C, and then added 43.4g of N-(ethyl acrylate)-2,6-dimethyl-benzoic acid , the temperature is controlled below 5 ℃, the mixture of 30 ml of concentrated sulfuric acid and 30 ml of acetic acid is added dropwise, the temperature is raised to 15 ℃ and stirred for 24 hours, the reaction solution is poured into ice water and stirred for 0.5 hours, extracted 3 times with petroleum ether, 1000ml of ammonium chloride aqueous solution with a mass fraction of 20% was slowly added dropwise, the solid was precipitated, filtered, washed with deionized water, and dried in vacuo. Then the obtained solid ...
Embodiment 1
[0131]Preparation of plate base: A1050 rolled aluminum plate with a purity of 99.5% and a thickness of 0.3 mm was etched in a sodium hydroxide aqueous solution with a mass fraction of 5% at 70 ° C for 20 seconds, rinsed with running water, and immediately used with a mass fraction of 1%. nitric acid aqueous solution. Then in 1% hydrochloric acid aqueous solution, sine wave alternating current at 40°C at 50A / dm 2 The current density was electrolytic roughening for 16 seconds, followed by neutralization with 5% sodium hydroxide aqueous solution by mass fraction for 10 seconds at 40 °C, and washing with water. Finally, at 30 ° C, with a mass fraction of 20% sulfuric acid aqueous solution, at 15A / dm 2 current density, anodized for 20 seconds, and washed with water. At 80°C, the pores were sealed with a 5% sodium silicate aqueous solution for 18 seconds, washed with water, and dried. The plate base thus obtained had an average centerline thickness of 0.5 μm and an oxide film weig...
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