Equipment and process for osmosizing and plating metal carboritride by dual-glow discharge

Abstract

A dual-glow discharge apparatus for osmosizing the metallic carbonide (or nitride) into the surface of metal material features that the metal or alloy to be osmosized is used to make lattice source electrode, the high-density metal particles stream is generated from the lattic source electrode by glow discharge and hollow cathode discharge while nitrogen gas or C-H gas is introduced, under the attraction of negative bias voltage on workpiece the C-H ions and atoms reach to surface of workpiece at high speed, and the temp of workpiece surface is quickly raised to compound the metal particles with C or N irons, so generating a uniform osmosized layer.

Description

technical field [0001] The device and process for permeating metal carbon or nitrogen compounds by double glow discharge of the present invention belong to the technical field of surface modification of metal materials. Background technique [0002] Metallic carbon and nitrogen compounds such as: WN, WC, MON, MOC, TiC, TiN, TaC, TaN, etc. have a series of excellent properties such as high hardness, wear resistance, corrosion resistance, and high temperature oxidation resistance. Steel, low alloy steel or titanium and titanium alloys with low surface strength, copper and copper alloys are permeated with a certain thickness of metal nitrogen and carbon compounds, which can significantly improve the wear resistance, corrosion resistance and high temperature oxidation resistance of these materials. Performance, can be used in aviation, aerospace, machinery, transportation, petrochemical, electric power, medical and other fields. with broadly application foreground. [0003] Be...

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Problems solved by technology

[0003] Before the 1960s, the methods of synthesizing metal carbon and nitrogen compounds were mainly solid, liquid, gas carburizing, nitriding, and nitrocarburizing chemical heat treatment methods. poor disadvantage

currently rarely used

[0004] After the 1960s, many new methods have been developed, such as ion nitriding, ion carbonitriding, chemical vapor deposition (CVD), physical vapor deposition (PVD), laser CVD (LCVD), plasma enhanced CVD (PCVD), radio frequency Plasma CVD (RFCVD), microwave CVD, ion beam enhanced deposition technology (IBED), multi-arc ion plating, etc., all of which have complex equipment, long synthesis time, electron beam, ion beam, microwave, radio frequency, laser, etc. , the equipment is expensive and the cost is high, especially most of the above new methods cannot provide metal particles and carbon and nitrogen ions to the workpiece at the same time, and most of the formed coatings are relatively thin, and their use is subject to certain restrictions

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