Multi-layer film electrode for nickle-hydrogen cell and preparation method thereof
A multi-layer film, nickel-metal hydride battery technology, applied in the direction of alkaline battery electrodes, etc., can solve the problems of single film breakage, poor high-power discharge capacity, etc., achieve flexible control of size and composition, increase charge and discharge rate, overcome composition uneven effect
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Embodiment 1
[0012] The block 44% magnesium, 55% nickel and 1% zirconium (weight percentage, the same below) is smelted into an alloy casting by induction melting method. First, a 10nm Pt layer is evaporated, and then a base film is evaporated, with a thickness of 100nm, and a Pt target is replaced, a 10nm Pt layer is evaporated on the base film, and the above steps are repeated to obtain 10 layers of Mg-Ni-Zr base film A multi-layer film alternately arranged with 11 layers of Pt catalytic protective films.
Embodiment 2
[0014] Melt blocky 45% magnesium, 54% nickel and 1% aluminum into alloy castings by induction melting method, after high temperature annealing, process it into target material by wire cutting method, and sputter on glass sheet by magnetron sputtering, firstly, vapor-deposit 10nm Pd layer, the thickness of each base film is 50nm, replace the Pd target, vapor-deposit a 10nm Pd layer on this film, repeat the above steps, get 10 layers of Mg-Ni-Al base film and 11 layers of Pd catalytic protective film Alternately arranged multi-layer films, followed by evaporation of a base film with a thickness of 100nm, replaced with a Pt target, and a 10nm Pt layer was evaporated on the base film, and the above steps were repeated to obtain 10 layers of Mg-Ni-A1 base film and 10 layers of The Pt catalytic protective film is alternately arranged as a multi-layer film, and the film as a whole is 20 layers of base film and 21 layers of protective catalytic film.
Embodiment 3
[0016] The block 54% magnesium, 44% nickel, 1% vanadium and 1% manganese are smelted into alloy castings by induction melting method. After high temperature annealing, they are processed into target materials by wire cutting method. on nickel sheet. First, vapor-deposit a 20nm Pd layer, then vapor-deposit a substrate film with a thickness of 20nm, replace it with a Pd target, vapor-deposit a 20nm Pd layer on this film, and repeat the above steps to obtain 20 layers of Mg-Ni-V-Mn substrate A multilayer film with alternately arranged thin films and 21 layers of Pd catalytic protective films, followed by evaporation of a base film with a thickness of 20nm, replaced by MmNi 3.5 co 1.2 al 0.2 mn 0.1 target, 50nm MmNi was evaporated on this film 3.5 co 1.2 al 0.2 mn 0.1 Layer, repeat the above steps to get 20 layers of Mg-Ni-V-Mn matrix film and 20 layers of MmNi 3.5 co 1.2 al 0.2 mn 0.1 A multilayer film with alternately arranged catalytic protective films, the total fil...
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