Method for preparing sulfonic silane-rare earth nanometer composite film on glass substrate surface
The technology of sulfonic silane and glass substrate is applied in the field of thin film preparation, which can solve the problems of long heat treatment time and complicated process conditions for self-assembling thin films, and achieve the effects of uniform distribution, dense film formation and simple preparation.
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Embodiment 1
[0016] First, the glass substrate is pretreated by hydroxylation. The treatment method: the glass substrate is immersed in Pirahan solution (H 2 SO 4 :H 2 o 2 =70:30, V / V), treated at 90°C for 1 hour, then ultrasonically cleaned with a large amount of deionized water for 20 minutes, placed in a dust-proof device and dried in an oven, the treated glass substrate was immersed in mercapto After standing in the silane solution for 6 hours, the molar concentration of the components of the mercaptosilane solution is: 0.2 mmol / L of 3-mercaptopropylmethyldimethoxysilane, and the solvent is benzene solution. After taking it out, wash it with chloroform, acetone, and deionized water respectively to remove the organic molecules physically adsorbed on the surface, then dry it with nitrogen, place it in nitric acid with a weight concentration of 30%, and take it out after reacting at 80°C for 1 hour. Rinse with ion water, so that the terminal mercapto groups are oxidized into sulfonic a...
Embodiment 2
[0023] First, the hydroxylation pretreatment of the glass substrate: immerse the glass substrate in Pirahan solution, treat it at 90°C for 1 hour, then ultrasonically clean it with a large amount of deionized water for 20 minutes, put it in a dust-proof device and dry it in an oven , immerse the treated glass substrate in the prepared mercaptosilane solution and let it stand for 7 hours. The molar concentration of the components of the mercaptosilane solution is: 3-mercaptopropylmethyldimethoxysilane 1.0mmol / L, solvent It is a benzene solution; after taking it out, wash it with chloroform, acetone, and deionized water to remove the organic matter physically adsorbed on the surface, blow it dry with nitrogen, place it in nitric acid with a mass concentration of 50%, and react at 65°C for 1 hour. Take it out with a large amount of Rinse with deionized water, so that the terminal mercapto groups are oxidized into sulfonic acid groups in situ, and a glass substrate with a sulfonic ...
Embodiment 3
[0030] First, the hydroxylation pretreatment of the glass substrate: immerse the glass substrate in Pirahan solution, treat it at 90°C for 1 hour, then ultrasonically clean it with a large amount of deionized water for 20 minutes, put it in a dust-proof device and dry it in an oven , immerse the treated glass substrate in the prepared mercaptosilane, let it stand for 8 hours, the molar concentration of the components of the mercaptosilane solution is: 2.0mmol / L of 3-mercaptopropyltrimethoxysilane, and the solvent is benzene solution; After taking it out, wash it with chloroform, acetone, and deionized water respectively, blow it dry with nitrogen, place it in nitric acid with a mass concentration of 60%, and react at 50°C for 1 hour, take it out and wash it with a large amount of deionized water, so that the terminal mercapto The sulfonic acid group is oxidized to obtain a glass substrate with a sulfonic acid silane film on the surface.
[0031] The molar ratio of each compone...
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