An organic EL part and its making method

An electroluminescence device and luminescence technology, applied in the direction of electroluminescence light source, electric light source, electrical components, etc., can solve the problems of slow production rhythm, increased process difficulty and complexity, and achieve the effect of continuous production rhythm

Inactive Publication Date: 2007-11-28
TSINGHUA UNIV +2
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  • Summary
  • Abstract
  • Description
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Problems solved by technology

Its technology is characterized by first using organic materials to form a flat plane on the back of the device, and then forming a dense inorganic film on the plane to achieve the ability to block water and oxygen. Because a single inorganic film layer cannot obtain a good barrier effect , the encapsulation layer needs to be prepared into a multi-layer alternating structure
However, to prepare multiple cycles of organic polymers and inorganic ceramic materials, the process and equipment are very complicated, especially for ceramic materials, which are generally prepared by magnetron sputtering, plasma-e

Method used

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  • An organic EL part and its making method

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preparation example Construction

[0022] (1) Preparation method of organic light-emitting device OLED:

[0023] Prepare the anode, organic functional layer and cathode sequentially on the substrate:

[0024] Substrate transparent substrate, which can be glass or flexible substrate, and the flexible substrate is made of polyester, polyimide compound, metal foil or ultra-thin glass;

[0025] The anode layer can be made of inorganic materials or organic conductive polymers. Inorganic materials are generally metal oxides such as ITO, zinc oxide, and tin zinc oxide, or metals with high work functions such as gold, copper, and silver. The optimal choice is ITO, organic The conductive polymer is preferably a material in polythiophene / sodium polyvinylbenzene sulfonate (hereinafter referred to as PEDOT:PSS), polyaniline (hereinafter referred to as PANI);

[0026] The cathode layer generally adopts metals with lower work functions such as lithium, magnesium, calcium, strontium, aluminum, indium, or their alloys with co...

Embodiment 1

[0043] (1) Prepare anode, organic functional layer and cathode on the substrate:

[0044] (1-1) Cleaning of pre-engraved ITO glass substrates: Use hot detergent ultrasonic and deionized water ultrasonic methods to clean the transparent conductive substrate ITO glass, after cleaning, place it under an infrared lamp to dry, and then The dried ITO substrate is pretreated by ultraviolet ozone cleaning and low-energy oxygen ion beam bombardment. The ITO film on the conductive substrate is used as the anode layer of the device. The square resistance of the ITO film is 50Ω and the film thickness is 150nm;

[0045] (1-2) Preparation of the organic light-emitting layer: the above-mentioned cleaned and dried ITO glass that has been pretreated is placed in a vacuum chamber, and the vacuum is evacuated to 1×10 -3 Pa, and then evaporate a layer of hole transport material NPB on the above-mentioned ITO film, the evaporation rate of the material film is 0.5nm / s, and the film thickness is 50n...

Embodiment 2

[0051] (1) Prepare anode, organic functional layer and cathode on the substrate:

[0052] (1-1) Cleaning of pre-engraved ITO glass substrates: Use hot detergent ultrasonic and deionized water ultrasonic methods to clean the transparent conductive substrate ITO glass, after cleaning, place it under an infrared lamp to dry, and then The dried ITO substrate is pretreated by ultraviolet ozone cleaning and low-energy oxygen ion beam bombardment. The ITO film on the conductive substrate is used as the anode layer of the device. The square resistance of the ITO film is 50Ω and the film thickness is 150nm;

[0053] (1-2) Preparation of the organic light-emitting layer: the above-mentioned cleaned and dried ITO glass that has been pretreated is placed in a vacuum chamber, and the vacuum is evacuated to 1×10 -3 Pa, and then evaporate a layer of hole transport material NPB on the above-mentioned ITO film, the evaporation rate of the material film is 0.5nm / s, and the film thickness is 50n...

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Abstract

This invention relates to a package structure of an organic electroluminescent device and its manufacturing method, in which, the organic electroluminescent device includes a package structure with a flat packaged cover made of glass, polymer, metal or alloy material and its composite film material, and the flat package cover can be prepared by a roller extrusion method. The package structure is especially suitable for large size or soft OLED, since no gas space exists during the packaging process, the device can be made thinner and distortion of the cover can be avoided.

Description

technical field [0001] The invention relates to a packaging structure of an organic electroluminescence device and a preparation method thereof, belonging to the technical field of organic electroluminescence. Background technique [0002] Today, with the development of multimedia technology and the advent of the information society, the requirements for the performance of flat panel displays are getting higher and higher. In recent years, three new display technologies have emerged: plasma display, field emission display and organic electroluminescent display (hereinafter referred to as OLED), all of which have made up for the shortcomings of cathode ray tubes and liquid crystal displays to a certain extent. Among them, organic electroluminescent displays have a series of advantages such as self-illumination, low-voltage DC drive, full curing, wide viewing angle, and rich colors. Low, its response speed can reach 1000 times that of LCD, but its manufacturing cost is lower ...

Claims

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Application Information

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IPC IPC(8): H05B33/12H05B33/02H05B33/10
Inventor 邱勇刘嵩段炼
Owner TSINGHUA UNIV
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