Pyrophosphate copper plating used as grounding electroplate liquid for cyanogen-free copper plating

A technology of pyrophosphate and cyanide-free copper plating, which is applied in the field of copper plating solution, can solve problems such as difficulty in realizing industrialized production, high requirements for operators, and cumbersome preparation of plating solution, so as to improve coverage, increase cathode polarization, The effect of expanding the range of cathode current density

Active Publication Date: 2008-02-13
江门市瑞期精细化学工程有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] In addition to the above-mentioned processes, there are citrate copper plating, tartrate copper plating, triethanolamine copper plating, etc. Although each process has its advantages, it is also caused by its own limitations. For example, the preparation of the plating solution is cumbersome. Or it is difficult to realize industrial production because of the difficulty in maintenance of the plating solution, or the high requirements for the operator, or the high cost of the plating solution.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] First add pure water accounting for 70% of its volume into the reaction tank; add potassium pyrolysis and stir to dissolve; add copper pyrolysis and stir to dissolve; Azobenzene, dextrin, alkylthiourea, and 8-hydroxynaphthylbenzene were stirred and dissolved, and prepared into an electroplating solution containing the following concentration by weight: 25% potassium pyrophosphate, 2% copper pyrophosphate, 2% ammonium citrate, Sorbitol 3%, 2-ethanesulfonate nitrogen benzene 0.8%, 3-methanol base nitrogen benzene 3%, dextrin 1.5%, alkylthiourea 0.1%, 8-hydroxynaphthalene benzene 0.08%, in the electroplating production process When the concentration of the medium electroplating solution is insufficient, add raw materials containing the following percentages by weight: 6% potassium pyrophosphate, 82.5% copper pyrophosphate, 2% ammonium citrate, 3% sorbitol, and 1% benzenesulfonate , 3-methanolyl nitrogen benzene 2%, dextrin 3.3%, alkylthiourea 0.1%, 8-hydroxynaphthylbenzene...

Embodiment 2

[0031] First add pure water accounting for 70% of its volume into the reaction tank; add pyropotassium, stir to dissolve; add pyrocopper, stir to dissolve; add ammonium citrate, sorbitol, naphthalene disulfonic acid, 2,3-azobenzenedicarboxylate Acid, dextrin, alkylthiourea, benzotriazole, stir and dissolve, and prepare the electroplating solution containing the following weight percentage concentration: potassium pyrophosphate 35%, copper pyrophosphate 4%, ammonium citrate 2%, sorbic acid 2% alcohol, 1% naphthalene disulfonic acid, 4% 2,3-nitrobenzenedicarboxylic acid, 1% dextrin, 0.3% alkylthiourea, 0.4% benzotriazepine; then add the following volume percentage Concentration of hydroxyethylidene diphosphate 10-20%, sodium tripolyphosphate 1-5%, EDTA·2Na 1-2%, ethylene glycol 5-8%, methylthioureazone 1-2%, diphenylamine sulfonate acid 0.5-1%; when the concentration of the electroplating solution is insufficient in the electroplating production process, add raw materials contai...

Embodiment 3

[0033] First add pure water accounting for 70% of its volume into the reaction tank; add pyropotassium, stir to dissolve; add pyrocopper, stir to dissolve; add ammonium citrate, sorbitol, glutaric acid sulfonate, butyl nicotinate, paste Essence, alkylthiourea, 8-hydroxynaphthalene benzene, stir and dissolve, and prepare the electroplating solution containing the following weight percentage concentration: potassium pyrophosphate 30%, copper pyrophosphate 3%, ammonium citrate 2%, sorbitol 1.2%, 0.8% of glutaric acid sulfonate, 3% of butyl nicotinate, 1% of dextrin, 0.3% of alkylthiourea, 0.25% of 8-hydroxynaphthalenebenzene; -20%, sodium tripolyphosphate 1-5%, EDTA·2Na1-2%, ethylene glycol 5-8%, methylthioureazone 1-2%, diphenylamine sulfonic acid 0.5-1%; in electroplating In the production process, when the concentration of the electroplating solution is insufficient, add raw materials containing the following weight percentages: potassium pyrophosphate 7%, copper pyrophosphate...

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Abstract

The invention discloses a strike bath solution with pyrophosphate plating copper as the cyanide-free copper, which contains a make-up agent and rehydration salt; the make-up agent contains the following raw materials: potassium pyrophosphate, copper pyrophosphate, ammonium citrate, sorbol, sulfosalt, phenyl carboxylate, dextrin, alkyl thiourea and nitrogen heterocyclic; the rehydration salt is as supplementation of all raw materials in the make-up agent during the plating process; the invention does not contain harmful substances, such as cyanidum, heavey metal, etc and is in compliance with EU RoHS Directive (2002 / 95 / EC) with stable bath solution and wide cathode current density range, and the plating layer prepared by the invention is fine, even and in a semi-bright state; and the make-up is conducted with original solution, supplementation is conducted with single rehydration salt, which is convenient in operation and simple in management; the plating layer is well adhesive to the matrix, with good straggling capability and covering capability. The invention is applicable in pre-plating of iron materials, zinc alloys, aluminum alloys and copper alloys, as well as barrel plating and suspension plating, with the waste water easy to dispose, which will not bring the secondary pollution.

Description

technical field [0001] The invention relates to a copper plating solution, in particular to a pyrophosphate copper plating solution used as a primer electroplating solution for cyanide-free copper plating. Background technique [0002] In the cyanide copper plating solution, because NaCN has a strong complexing force for copper ions, the dispersing ability and covering ability are good, the plating layer is crystallized finely, the plating solution is alkaline, and has the ability to remove oil, so it can guarantee to obtain a good bonding force. The coating is widely used as the base coating on steel substrates, aluminum alloys, zinc alloy die castings and copper alloy electroplating Cu / Ni / Cr, and has unparalleled advantages. However, the current efficiency of cyanide copper plating is low (only about 63%), and it contains a large amount of CN - , is highly toxic, and will cause great damage to the health of on-site operators; at the same time, the exhaust gas and sewage d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/38
Inventor 洪条民谢日生
Owner 江门市瑞期精细化学工程有限公司
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