Micro- machining gas sensor and method for making same
A gas-sensing element and micro-machining technology, applied in the field of gas-sensing sensors, can solve the problem that the components cannot be miniaturized, and achieve the effect of reducing the area of the components, reducing the manufacturing cost, and simplifying the packaging process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0017] The method for preparing the above-mentioned micro-machined gas sensor includes the following steps:
[0018] First, the microelectrodes are fabricated on the substrate after processing by micromachining technology. The micro-processing technology can use the existing technology, including: optical lithography, electron beam lithography, X-ray lithography, laser lithography, electrochemical etching, microparticle spraying, screen printing or film printing, etc. The technology of making the microelectrode conductive material can adopt the existing technology, including: ion sputtering, electron beam evaporation, thermal evaporation, vacuum arc plasma coating, thermal spraying or electrostatic spraying and so on.
[0019] Then, the above-mentioned substrate and microelectrodes are covered with a gas-sensitive material layer to prepare a substrate component. The gas-sensitive material layer can be prepared by using existing technologies, including sputtering, thermal evaporati...
Example Embodiment
[0021] Example 1
[0022] In this embodiment, a ceramic sheet with a thickness of 0.25 mm is used as the substrate 11, and the area of the substrate unit is 1.5×1.5 mm 2 . The microelectrode 12 is a single pair of spaced-back line structure with a line width of 0.1 mm and a line spacing of 50 μm. The production method includes the following steps:
[0023] a. The substrate 11 is subjected to a pre-bake heat treatment on a hot plate for 30 minutes, and the pre-bake temperature is 120°C.
[0024] b. Use a Karl Suss R8 glue applicator to evenly spin-coat a layer of red (RZJ-390PG) positive photoresist on the surface of the substrate 11 at a rotation speed of 3000 rpm and a time of 60 seconds.
[0025] c. After the glue is applied, the substrate 11 is placed on a hot plate for baking, the temperature of the hot plate is 120° C., and the baking time is 120 seconds.
[0026] d. After baking, use the Karl Suss MA45 lithography machine to expose the sample to UV exposure for 15 seconds....
Example Embodiment
[0035] Example 2
[0036] The steps of this embodiment are basically the same as those of embodiment 1, except for step j. Preparation of gas-sensitive material layer 13: In this embodiment, a layer of nanowires whose main component is tungsten oxide is grown on the substrate electrode by the method of thermal evaporation to form Film structure.
[0037] The gas sensing characteristics of this embodiment are shown in Fig. 4. The gas sensor grown with nanostructured tungsten oxide material is resistant to 1% H under the condition of 2V DC power supply. 2 The response current varies with time. Where I represents the current flowing through the metal electrode, and t represents the time. When the device is in the air, the current value of the device is about 89mA. When hydrogen appears, the current value of the device starts to increase and reaches a stable value of about 120mA within 1 minute. When the hydrogen is discharged, the current of the device begins to decrease, and finally...
PUM
Property | Measurement | Unit |
---|---|---|
Area | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Line width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap