Preparation of nano-cerium oxide composite abrasive grain polishing solution

A technology of nano-cerium oxide and composite abrasive grains, which is applied in the direction of polishing compositions containing abrasives, etc., can solve the problems of fast polishing speed, polishing scratches, and many scratches, so as to improve surface quality, improve surface quality, reduce The effect of surface damage

Inactive Publication Date: 2008-11-12
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, commercial abrasives are mostly single inorganic particles such as alumina, silicon oxide, cerium oxide, zirconia, titanium oxide, diamond, silicon nitride, silicon carbide, etc., but single inorganic abrasives often have unsatisfactory polishing. performance, such as high alumina hardness and fast polishing

Method used

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  • Preparation of nano-cerium oxide composite abrasive grain polishing solution
  • Preparation of nano-cerium oxide composite abrasive grain polishing solution
  • Preparation of nano-cerium oxide composite abrasive grain polishing solution

Examples

Experimental program
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Effect test

Embodiment 1

[0013] Embodiment one: the polishing liquid preparation process and steps in this embodiment are as follows:

[0014] (1) Preparation of cerium oxide composite abrasive grains: prepared by homogeneous precipitation method, weighing 5 grams of SiO with a particle size of 30nm 2 Inorganic abrasive particles are dispersed into 100ml of water, followed by adding 10ml of CO(NH 2 ) 2 solution and 10ml concentration of 0.3mol / L (NH 4 )2Ce(NO 3 ) 6 Solution: Pour the prepared mixed solution into a three-necked flask, heat to 100°C with a jacketed thermostat, stir with an electric stirrer, and heat to reflux under stirring for 7 hours. After the reaction was completed and cooled to room temperature, the obtained precipitate was separated by a centrifuge and washed three times with deionized water; then dried in a constant temperature drying oven at 80°C, and then ground to obtain a light yellow powder, namely Nano silicon oxide particles as the core, SiO with cerium oxide as the s...

Embodiment 2

[0016] Embodiment two: the polishing liquid preparation process and steps in this embodiment are as follows:

[0017] (1) Preparation of cerium oxide composite abrasive grains: the above-mentioned SiO 2 / CeO 2 Add the composite abrasive particles into water, and the weight ratio of the composite abrasive to water is 4%; then add 1% of the dispersant sodium hexametaphosphate, and stir with a mechanical mixer to make the dispersion even; further disperse the above mixed solution with a ball mill, Make a uniform dispersion liquid; then add oxidant hydrogen peroxide 2%, corrosion inhibitor benzotriazole 0.1%, lubricant phosphate 0.1%; the addition of the above substances is based on water 100% as a reference, this is nano SiO 2 / CeO 2 Composite abrasive polishing fluid.

[0018] For comparison, the commercially available CeO 2 The polishing liquid was prepared from the polishing powder as a comparative example.

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Abstract

The invention discloses a method for preparing nano cerium oxide composite abrasive particle polishing solution. The method is characterized by taking inorganic abrasive particles as the inner core and a cerium oxide coating as the shell to form the nano cerium oxide composite abrasive particle polishing solution with a core/shell structure, and belongs to the high-precision polishing material preparation technique technical field. The preparation process of the polishing solution is as follows: firstly, the nano cerium oxide composite abrasive particles are prepared by the homogeneous precipitation method; secondly, the polishing solution is prepared through the cerium oxide composite abrasive particles. During the preparation process of the polishing solution, the weight percent of the cerium oxide composite abrasive particles and water is between 2 and 10 percent, and 0.5 to 2 percent of dispersant is added; after further ultrasonic dispersion or ball milling dispersion of mixture, uniform dispersion liquid is formed; and the nano cerium oxide composite abrasive particle polishing solution is obtained after addition of 0.5 to 5 percent of oxidant, 0.05 to 0.1 percent of corrosion inhibitor and 0.05 to 0.1 percent of lubricant (the addition of various materials takes 100 percent of water as the reference basis). The polishing solution is represented by low surface roughness and scratch level, and then an ultra-smooth surface is obtained.

Description

technical field [0001] The invention relates to a method for preparing a nano-cerium oxide composite abrasive polishing liquid with an inorganic abrasive particle as the core and a cerium oxide coating layer as the outer shell to form a core / shell structure, belonging to the technical field of high-precision polishing material preparation technology. Background technique [0002] Today, with the continuous improvement of the performance of advanced electronic products such as digital discs, optical glass, integrated circuit silicon chips, computer hard disks, etc., it poses a severe challenge to the limit of mechanical manufacturing, and the requirements for processing accuracy and surface quality are getting higher and higher. [0003] Chemical-mechanical polishing (CMP) technology is almost the only global planarization technology suitable for obtaining high-precision surfaces. Nano-abrasive particles are the key and basic component of chemical mechanical polishing fluid, ...

Claims

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Application Information

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IPC IPC(8): C09G1/02
Inventor 雷红肖保其褚凤灵严琼林布乃敬刘平
Owner SHANGHAI UNIV
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