Method for preparing niobium pentaoxide membrane

Abstract

The invention discloses a method for preparing a niobium pentaoxide membrane. The method comprises the following steps: mixing niobium pentaoxide and potassium carbonate in a molar ratio of 3:1; after calcination, adding the calcinated materials into hydrochloric acid, stirring and filtering the mixed solution, adding hydrochloric acid in the same ratio into the mixed solution, stirring and filtering the mixed solution, and repeating four times; washing filter cakes by deionized water, drying the filter cakes, adding a 0.5mol / l tetrabutylammonium hydroxide solution into the filter cakes, stirring the mixture, and obtaining niobium pentaoxide nano flake sol under high-speed centrifugation; and preparing a 2.5g / l polyethyleneimine solution, immersing a clean quartz plate into the polyethyleneimine solution for soaking, taking the quartz plate out, washing the quartz plate by the deionized water, blowing the quartz plate to dryness, immersing the quartz plate into niobium pentaoxide sol for soaking, taking the quartz plate out, washing the quartz plate by the deionized water, blowing the quartz plate to dryness by pure nitrogen to obtain a layer of the niobium pentaoxide membrane, and repeating the process to prepare different layers of the niobium pentaoxide membrane. The method has the advantages of simple operation, low cost and suitability for industrial production.

Description

technical field [0001] The invention relates to the preparation of a thin film, specifically a method for preparing a niobium pentoxide thin film by using niobium pentoxide as a niobium source, tetramethylammonium hydroxide as an intercalation agent, and a quartz plate as a substrate. Background technique [0002] Niobium pentoxide thin film has excellent optical properties, and its optical waveguide loss is small, so it has been widely used in waveguide devices. It can be used as a protective film for ultraviolet sensitive materials by using its strong ultraviolet absorption ability Silicon oxide and the like can prepare thin films with different refractive indices. Niobium pentoxide thin film is also an electrochromic material with excellent performance. Some studies believe that the electrochromic performance of niobium pentoxide film is comparable to that of tungsten oxide, which has been extensively researched and applied to a certain extent; some researchers also beli...

AI Technical Summary

Problems solved by technology

However, these methods also have many defects. The film prepared by oxidation method is directly deposited on the surface of niobium metal electrode, which is only suitable for the research of related phenomena and mechanisms; the film prepared by electron beam evaporation method has obvious columnar structure. The aggregation density of the film layer is reduced, the refractive index is not high, and the optical properties of the scattered layer drift greatly after moisture absorption; when the sol-gel method is prepared, the precursor niobium alkoxide and inorganic salt suitable for the preparation of the niobium pentoxide film are very unstable. This makes the process control extremely difficult, and the prepared niobium pentoxide film not only has poor firmness, but also has a low refractive index; while the reactive sputtering method must coordinate many factors such as the gas composition and pressure in the sputtering chamber, in order to obtain the desired thin film, which requires high equipment requirements and complicated processes

Images