Preparation method of ultrathin nanometer ion liquid lubricating film
A nano-ion and liquid lubrication technology, which is applied in the direction of lubricating compositions, etc., can solve the problems of cumbersome preparation process, increased preparation cost, and increase the overall thickness of the film, and achieve the goal of simplifying the preparation process, low friction coefficient, and reducing the overall thickness Effect
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Embodiment 1
[0031] A. Cut the monocrystalline silicon wafer into small pieces of 10mm×15mm, ultrasonically wash them with double distilled water and acetone for 10-20 minutes, and then dry them with dry nitrogen to obtain a single crystal silicon wafer with a clean surface. The cleaned single crystal silicon wafers were irradiated with ultraviolet light for 2 hours.
[0032] B. Immerse the single crystal silicon wafer irradiated by ultraviolet light into the acetone solution with the mass fraction of 0.1% methyl butyl imidazolium hexafluorophosphate. Lift after staying in the solution for 2 minutes, control the pulling speed to 2mm·s -1 , to obtain samples coated with ionic liquid films.
[0033] C Treat the sample coated with the ionic liquid film at 110°C for 1 hour, and the thickness of the obtained film is about 2nm. Observation with a scanning electron microscope shows that the surface of the film is very uniform.
[0034] Tribological properties:
[0035] The results of friction...
Embodiment 2
[0038] Utilize the method with embodiment 1 step A to obtain the silicon chip of cleaning. The cleaned silicon wafers were exposed to UV light for 4 hours.
[0039] The single crystal silicon wafer irradiated by ultraviolet light was immersed in the acetone solution with a mass fraction of 0.1% methyl butylimidazolium tetrafluoroborate, and other operating steps were the same as Step B of Example 1.
[0040] The operation steps are the same as Step C of Example 1.
[0041] The results of friction and wear tests on GCr15 steel balls show that: when the load is 0.1-0.4N, the sliding speed is 10-40mm s -1 , the stable value of the friction coefficient of the ionic liquid film prepared by the method is 0.07-0.11, and the longest wear life exceeds 7000 times.
Embodiment 3
[0043] Utilize the method with embodiment 1 step A to obtain the silicon chip of cleaning. The cleaned silicon wafers were exposed to UV light for 6 hours.
[0044] The single crystal silicon wafer irradiated by ultraviolet light was immersed in the acetone solution with a mass fraction of 0.2% methylbutylimidazolium hexafluorophosphate, and other operating steps were the same as step B of Example 1.
[0045] The operation steps are the same as step C of Example 1, and the thickness of the obtained ionic liquid film is about 4nm.
[0046] The ionic liquid film prepared by this method was loaded at a load of 0.4N and a speed of 40mm s -1 , the friction coefficient against GCr15 steel balls is stable at 0.06 to 0.10, and the wear life exceeds 10,000 times.
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