Double pulse plating solution for preparing lead-free Sn-Cu alloy solder and plating process
An electroplating process and double-pulse technology, which is applied in the field of double-pulse electroplating bath and electroplating process, can solve the problems of large internal stress and porosity, expensive, time-consuming, etc., and achieve high electroplating rate, small grain size and smooth surface Effect
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[0017] A double-pulse electroplating process for preparing lead-free Sn-Cu alloy solder. The metallized Si wafer is used as the cathode as the deposition substrate of the alloy solder, while the anode uses a Pt sheet. Put the above-mentioned cathode and anode sheets into the electroplating solution after being cleaned with distilled water, alcohol and degreased with acetone, and pass forward / reverse double-pulse current to perform double-pulse electroplating. The electroplating solution is an aqueous solution, and its chemical composition is: triammonium citrate 0.45mol / L, stannous chloride dihydrate 0.22mol / L, copper chloride dihydrate 0.03mol / L, each component is prepared by adding water of analytical grade;
[0018] The essence of double pulse electroplating is pulse commutation electroplating. Here, as an electrodeposition method for depositing Sn-Cu alloy solder, its process parameters are: the frequency is 100Hz, the duty ratio of the double pulse is 20%, the forward / rev...
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