Preparation method of noble metal/submicron spherical shell arrays

A precious metal, sub-micron technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of non-dense metal shell, easy agglomeration of metal particles, complicated preparation method, etc. Simple and controllable growth process and uniform size

Inactive Publication Date: 2011-10-12
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has disadvantages such as the metal shell is not dense, the metal particles are easy to agglomerate, the preparation method is complicated, and the yield is low, which greatly limits the application of the noble metal spherical shell structure.
[0006] In general, the existing preparation technologies cannot meet the requirements of large-scale production of photonic materials with high sensitivity and high uniformity of noble metal submicron spherical shell arrays.

Method used

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  • Preparation method of noble metal/submicron spherical shell arrays
  • Preparation method of noble metal/submicron spherical shell arrays
  • Preparation method of noble metal/submicron spherical shell arrays

Examples

Experimental program
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Effect test

Embodiment 1

[0028] Disperse polystyrene microspheres with a diameter of 200nm in a mixed solution of water and alcohol with a volume ratio of 1:1 to prepare a mixed solution with a concentration of polystyrene microspheres of 1.89g / ml; take 20 μl of the above-mentioned mixed solution Drop the solution on the quartz substrate and dry it at room temperature to obtain a quartz substrate with a polystyrene microsphere array; put the quartz substrate with a polystyrene microsphere array into the reaction chamber of a DC reactive magnetron sputtering device for deposition silver layer, the reaction chamber was vacuumed to 5×10 -3 Pa, argon gas is introduced as a protective gas, the flow rate of argon gas is controlled at 30sccm, the pressure of the reaction chamber is adjusted to 10Pa, and silver with a purity of more than 99% is used as the target for sputtering deposition, and the sputtering current and power are respectively controlled at 0.2A and 60W, the sputtering time is 60s, and the gro...

Embodiment 2

[0034] Disperse polystyrene microspheres with a diameter of 200nm in a mixed solution of water and alcohol with a volume ratio of 1:1 to prepare a mixed solution with a concentration of polystyrene microspheres of 1.89g / ml; take 20 μl of the above-mentioned mixed solution Drop the solution on the quartz substrate and dry it at room temperature to obtain a quartz substrate with a polystyrene microsphere array; put the quartz substrate with a polystyrene microsphere array into the reaction chamber of a DC reactive magnetron sputtering device for deposition silver layer, the reaction chamber was vacuumed to 5×10 -3 Pa, argon gas is introduced as a protective gas, the flow rate of argon gas is controlled at 30sccm, the pressure of the reaction chamber is adjusted to 10Pa, and silver with a purity of more than 99% is used as the target for sputtering deposition, and the sputtering current and power are respectively controlled at 0.2A and 60W, the sputtering time is 45s, and the gro...

Embodiment 3

[0037]Disperse polystyrene microspheres with a diameter of 200nm in a mixed solution of water and alcohol with a volume ratio of 1:1 to prepare a mixed solution with a concentration of polystyrene microspheres of 1.89g / ml; take 20 μl of the above-mentioned mixed solution Drop the solution on the quartz substrate and dry it at room temperature to obtain a quartz substrate with a polystyrene microsphere array; put the quartz substrate with a polystyrene microsphere array into the reaction chamber of a DC reactive magnetron sputtering device for deposition silver layer, the reaction chamber was vacuumed to 5×10 -3 Pa, argon gas is introduced as a protective gas, the flow rate of argon gas is controlled at 30sccm, the pressure of the reaction chamber is adjusted to 10Pa, and silver with a purity of more than 99% is used as the target for sputtering deposition, and the sputtering current and power are respectively controlled at 0.2A and 60W, the sputtering time is 20s, and the grow...

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Abstract

The invention discloses a preparation method of noble metal / submicron spherical shell arrays, which comprises the following steps: firstly, self-assembling submicron polystyrene microsphere arrays with different diameters on quartz and other substrates; then, depositing noble metal layers on the polystyrene microsphere arrays through direct current magnetron sputtering; and finally, carrying out heat treatment in a vacuum chamber to remove the polystyrene microsphere templates. In the method, the growing process is simple and controllable, and the prepared spherical shell arrays are uniform in dimension and are regularly arranged; and by regulating the thickness of the noble metal layers, the spherical shell arrays with different surface plasmon resonance peaks can be obtained and can be used in the fields such as biosensors, photonic crystals, surface-enhanced Raman spectra, luminescent spectra and the like.

Description

technical field [0001] The invention belongs to the field of photonic material preparation, and in particular relates to a preparation method of a noble metal submicron spherical shell array. Background technique [0002] Surface plasmon resonance technology is a biomolecular detection technology developed in the 1990s. It is widely used in medical diagnosis, biological detection, drug development and food safety and other fields. Surface plasmons refer to charge density oscillations localized in the vicinity of metal nanoparticles. When the incident electromagnetic field (light) is resonantly excited with the plasma frequency, it can produce strong extinction (absorption and scattering) or enhancement of the local electromagnetic field. Since Liedberg first used plasmon resonance technology for antigen-antibody interaction analysis in 1983, this biosensor technology has been widely used in proteomics, cell signal transduction, receptor / ligand, antibody / antigen molecular fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/58C23C14/20
Inventor 李东升程培红杨德仁
Owner ZHEJIANG UNIV
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