Ultraviolet curing degradable cross-linking monomer and preparation method thereof

A technology of crosslinking monomers and ultraviolet rays, which is applied in chemical instruments and methods, preparation of organic compounds, preparation of carboxylic acid esters, etc., can solve the problems of embossing adhesives that have not been publicly reported, and achieve good application prospects, convenient preparation, The effect of simple structure

Inactive Publication Date: 2012-04-11
WUXI IMPRINT NANO TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

So far, there have been no published reports of embossing adhesives that degrade under mild conditions

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Add 11.6 grams of hydroxyethyl acrylate, 4.9 grams of cyclohexanone, 50 milliliters of toluene, hydroquinone and p-toluenesulfonic acid in a four-necked flask, heat up to 90 degrees and reflux to remove the water generated by the reaction. After reacting for 2 hours, use Wash with 10% sodium bicarbonate, extract with petroleum ether, and combine the oil layers. The oil layer was washed three times with saturated brine, dried over anhydrous sodium sulfate, filtered, and distilled under reduced pressure to obtain a crude product. The crude product was subjected to column chromatography to obtain an oily liquid.

Embodiment 2

[0022] Add 8.6 grams of 2-methyl-3-buten-2-ol, 4.9 grams of cyclohexanone, 50 ml of toluene, hydroquinone and p-toluenesulfonic acid into a four-necked flask, and heat up to 90 degrees to reflux to separate the reaction After reacting the generated water for 3 hours, it was washed with 10% sodium bicarbonate, extracted with petroleum ether, and the oil layers were combined. The oil layer was washed three times with saturated brine, dried over anhydrous sodium sulfate, filtered, and distilled under reduced pressure to obtain a crude product. The crude product was subjected to column chromatography to obtain an oily liquid.

Embodiment 3

[0024] Add 13.0 grams of hydroxyethyl methacrylate, 4.9 grams of cyclohexanone, 50 milliliters of toluene and bismuth trifluoromethanesulfonate in a four-necked bottle, and after reflux reaction at 80 degrees for 5 hours, wash with 10% sodium bicarbonate, and then Extract with petroleum ether, and combine the oil layers. The oil layer was washed three times with saturated brine, dried over anhydrous sodium sulfate, filtered, and distilled under reduced pressure to obtain a crude product. The crude product was subjected to column chromatography to obtain an oily liquid.

[0025] Use the cross-linking monomer prepared by the present invention to prepare embossing glue in the following proportions:

[0026] Acrylic resin CN996 Acryloxypropyl-tris(trimethylsilane) Embodiment 1 gained cross-linking monomer Benzophenone tert-butyl acrylate 33% 30% 15% 2% 20%

[0027] The above-mentioned embossing glue is spin-coated on a silicon wafer, and after being ...

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PUM

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Abstract

The invention discloses an ultraviolet cured degradable cross-linking monomer which is used for ultraviolet light curing nanoimprint lithography. The cross-linking agent is formed through a reaction between a hydroxyl compound containing vinyl or (methyl) acrylate and ketone under the existence of a catalyst or a polymerization inhibitor, and nanoimprint resist can be cured through ultraviolet light into a three-dimensional net structure under the action of a photo initiating agent. The cross-linking bond of the cured substance can be opened under the existence of an acid and water to form a linear structure to be dissolved in a solvent. The ultraviolet cured degradable cross-linking monomer provided by the invention is convenient to prepare, has simple structure and is degradable. During the nanoimprint process, the ultraviolet cured degradable cross-linking monomer can be easily removed by using the solvent without damaging the structure of a template and has good application prospect in the ultraviolet light curing nanoimprint lithography.

Description

technical field [0001] The invention relates to a degradable cross-linking agent used in nano-imprinting glue and photolithography technology for ultraviolet curing glue and a preparation method thereof. Background technique [0002] Since the 1960s, integrated circuits have been constantly updated according to Moore's Law, which states that the number of transistors integrated into a single chip doubles every 18 months. As the dimensions of devices in circuits continue to shrink, optical lithography approaches its physical limits. The wavelength of ultraviolet light used in the current popular photolithography process is about 250nm. If you want to manufacture a pattern structure much smaller than half of this scale, the diffraction effect will make the characteristics of various parts of the pattern mixed together and blurred. After the researchers made a series of difficult improvements to optical lithography, complex microelectronic structures with line widths as small ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C69/54C07C67/293C07D317/72C07D493/10G03F7/027G03F7/033
Inventor 胡昕葛海雄袁长胜陈延峰
Owner WUXI IMPRINT NANO TECH
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