Method for indirect synthesis of quartz glass, special equipment used therein and quartz glass

A technology for synthesizing quartz and quartz glass, applied in glass manufacturing equipment, glass molding, glass production, etc., can solve the problems of high manufacturing cost, high chlorine content, low deposition efficiency and deposition rate, etc., and achieve low manufacturing cost, chlorine Low content, energy and resource saving effect

Active Publication Date: 2012-07-18
CHINA BUILDING MATERIALS ACAD
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Problems solved by technology

[0005] In order to overcome the problems of low deposition efficiency and deposition rate, high chlorine content and high manufacturing cost in the current direct synthesis method of fused sili

Method used

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  • Method for indirect synthesis of quartz glass, special equipment used therein and quartz glass
  • Method for indirect synthesis of quartz glass, special equipment used therein and quartz glass
  • Method for indirect synthesis of quartz glass, special equipment used therein and quartz glass

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Example Embodiment

[0055] Example: Preparation of quartz glass by indirect method

[0056] The invention uses a vapor deposition synthesis furnace to synthesize silica loose bodies and vitrify them in a vacuum resistance furnace to prepare quartz glass.

[0057] 1) Obtaining silicon tetrachloride raw material gas: First, press feed gas (at least one of high-purity nitrogen, high-purity helium, and high-purity argon). The press-feed gas in this embodiment is high-purity nitrogen with purity Up to 99.999%) The high-purity silicon tetrachloride raw material liquid (purity above 99.9999%) in the silicon tetrachloride raw material tank is introduced into the silicon tetrachloride bubbling bottle, because the boiling point of the silicon tetrachloride raw material liquid is 57.6 ℃, adjust the temperature of the bubbling bottle to 48℃ (40-50℃ can be used), the carrier gas flows through the purification dryer (concentrated sulfuric acid dehydration and drying) to remove water vapor and impurities, and the pu...

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Abstract

The invention provides a method for indirect synthesis of quartz glass, a special equipment used therein and a quartz glass, which belongs to the field of fabrication of glass. The method comprises the following steps: 1) allowing the feed gas of silicon tetrachloride to react in oxyhydrogen flame with a temperature of 600 to 1200 DEG C, enabling silicon tetrachloride to undergo hydrolysis or oxidation so as to produce nanometer silica particles and depositing the nanometer silica particles so as to obtain a silica loose body; and 2) carrying out dehydration, degassing and vitrification on the silica loose body at a temperature of 100 to 1600 DEG C under a vacuum degree of 0.01 to 500 Pa so as to obtain the quartz glass. According to the invention, a deposition rate in the method can reach 500 to 2000 g/h, and the obtained quartz glass has the following excellent characteristics: high transmittance is obtained at 200 to 3200 nm full spectrum (ultraviolet-visible-infrared bands), the content of metal impurities is less than 5 ppm, the content of hydroxyl groups is controlled to be within 20 ppm, a diameter is up to 50 to 200 mm, and the quartz glass can be used in the field of high and new technologies like precision optics, semiconductor photolithography and laser technology and has a wide application prospect.

Description

technical field [0001] The invention relates to a method for indirectly synthesizing quartz glass and special equipment thereof. Background technique [0002] Quartz glass has superior physical and chemical properties, and is known as the "King of Glass". It is an irreplaceable basic raw material in the development of national strategic industries and pillar industries. It is widely used in optical fiber manufacturing, microelectronics, optoelectronics, aerospace, High-tech fields such as nuclear technology, laser technology, precision optics and electric light source. [0003] At present, the "direct method" is mainly used at home and abroad to manufacture quartz glass, which uses natural crystal or high-purity silicon tetrachloride as raw materials, and undergoes physical and chemical reactions in high-temperature vacuum resistance furnaces, high-temperature hydrogen-oxygen flames or high-temperature plasma flames. Melted directly into a quartz glass body. The techniques...

Claims

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Application Information

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IPC IPC(8): C03B20/00C01B33/12
CPCY02P40/57
Inventor 聂兰舰宋学富向在奎隋梅王玉芬
Owner CHINA BUILDING MATERIALS ACAD
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