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Method for manufacturing silicone micro-nano optical structure by using imprinting technology

An optical structure, micro-nano technology, applied in the manufacture of microstructure devices, microstructure devices, optics, etc., can solve problems such as high pressure, and achieve the effects of low transmission loss, excellent optical properties, and improved environmental resistance

Inactive Publication Date: 2012-10-03
SOUTH CHINA NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This technology mainly prepares a high-resolution master plate through electron beam direct writing and other devices, and then uses the imprinting method to replicate a stamper that can be reused many times, and then uses this template to imprint and etch to obtain the required nanometer. pattern, but this process requires pressure to make the stamp contact with the imprinting glue, and then release the mold after heating and curing, which requires a lot of pressure

Method used

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  • Method for manufacturing silicone micro-nano optical structure by using imprinting technology
  • Method for manufacturing silicone micro-nano optical structure by using imprinting technology
  • Method for manufacturing silicone micro-nano optical structure by using imprinting technology

Examples

Experimental program
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Effect test

Embodiment 1

[0033] The silicone micro-nano optical structure is prepared by hot embossing method, and the specific steps include:

[0034] 1. Use photonic device simulation software to design and optimize optical waveguide devices, then use computer-aided design tools to draw the mask layout according to the design results, and transfer the designed pattern files to professional photolithography mask manufacturers for customization;

[0035] 2. Expose the photoresist, and then perform ICP etching to obtain a stamp made of silicon or other materials for imprinting; if the minimum line width of the device is relatively high, electron beam exposure or other advanced lithography equipment can be used to customize.

[0036] 3. Hydroxylation treatment is carried out on the surface of silicon stamp or other hard template surface, and then it is placed in a petri dish in an anhydrous environment, and an appropriate amount of perfluorotetrahydrooctylsilane is injected with a microliter syringe, ...

Embodiment 2

[0042] 1. Use photonic device simulation software to design and optimize optical waveguide devices, then use computer-aided design tools to draw the mask layout according to the design results, and transfer the designed pattern files to professional photolithography mask manufacturers for customization;

[0043] 2. Expose the photoresist, and then perform ICP etching to obtain a stamp made of silicon or other materials for imprinting; if the minimum line width of the device is relatively high, electron beam exposure or other advanced lithography equipment can be used to customize.

[0044] 3. Hydroxylation treatment is carried out on the surface of silicon stamp or other hard template surface, and then it is placed in a petri dish in an anhydrous environment, and an appropriate amount of perfluorotetrahydrooctylsilane is injected with a microliter syringe, and heated from room temperature to 250°C , keep the temperature for 2 hours after the temperature stabilizes, and wash of...

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Abstract

The invention discloses a method for manufacturing a silicone micro-nano optical structure by using an imprinting technology. Firstly, a template serving as a seal during the imprinting is designed and processed according to the requirements of the structure of a device; secondly, an appropriate substrate material is selected and used according to the requirements of the micro-nano optical structure of the device, and then covered with imprinting glue; afterwards, structural patterns on the template are transferred to the imprinting glue by adopting an imprinting process, the imprinting glue is solidified and molded, the template is released after the template and the substrate are both cooled, and then a micro-nano optical structure with embossed figures is obtained; and finally, a polymeric optical bounding layer covers above imprinted lines according to the design of the device, and then the whole micro-nano optical structure is formed. By adopting the method, optical devices whichhave good weatherability and strong thermal stability and cause low loss can be prepared; and besides, the process is simple, so that the method has a cost advantage.

Description

technical field [0001] The invention relates to the fields of embossing technology and optical technology, in particular to a method for making a silicone micro-nano optical structure by applying the embossing technology. Background technique [0002] Optical waveguides are important fundamental components of integrated optics. Optical waveguide devices can be divided into four basic types according to their composition materials: lithium niobate-plated titanium optical waveguide, silicon-based silica optical waveguide, InGaAsP / InP optical waveguide and polymer optical waveguide. Among them, the polymer optical waveguide has become a focus of attention and research due to its advantages such as low coupling loss, good optical performance, and small size. The search for a low-cost polymer optical waveguide preparation method has naturally become a subject of concern. [0003] Traditional optical waveguide devices are made on inorganic materials, such as lithium niobate and s...

Claims

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Application Information

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IPC IPC(8): G02B6/13G03F7/00B81C1/00
Inventor 梅霆万磊王洪朝郭克芹杜康朱凝
Owner SOUTH CHINA NORMAL UNIVERSITY
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