Laser direct writing type nanometer periodic structure pattern manufacturing equipment

A periodic structure and laser direct writing technology, applied in microlithography exposure equipment, optics, optical components, etc., can solve the problems of accumulating considerable processing errors, low process reliability, and slow processing speed, etc. High height, good feedback effect, miniaturized heating effect
CN102841507BInactive Publication Date: 2014-06-25NAT FORMOSA UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
NAT FORMOSA UNIV
Publication Date
2014-06-25
Estimated Expiration
Not applicable · inactive patent

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Abstract

The present invention relates to laser direct writing type nanometer periodic structure pattern manufacturing equipment, which is provided with a platform group, a measurement feedback group and a laser direct writing head group, wherein the platform group is provided with a base and a hybrid movement platform, the measurement feedback group and the platform group are combined, the measurement feedback group is provided with a laser interferometer, a reflection device and a signal receiving device, the laser direct writing head group is provided with a laser direct writing head, a laser direct writing head control interface device and a position comparison interface device, and the position comparison interface device forms phase electrical connections with the measurement feedback group and the laser direct writing head control interface device. According to the present invention, the structure pattern manufacturing equipment is provided, wherein the structure pattern manufacturing equipment has the following advantages that: nanometer holes with random graphics and lattice alignments can be generated, optical diffraction limitation can be broken so as to decrease a record point, a processing speed, processing accuracy and a processing range can be improved, and cost is low.
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Description

technical field

[0001] The invention relates to a nano-structure pattern manufacturing device, in particular to a laser direct-writing nano-periodic structure pattern manufacturing equipment. Background technique

[0002] At present, the existing lithography processing technologies related to nanostructure patterns include yellow light lithography, electron beam lithography, atomic force microscopy, X-ray lithography, near-field beam lithography, laser interference lithography, and traditional laser direct writing exposure lithography. However, the processing speed of the aforementioned existing technologies is slow and most of them require huge and expensive equipment or devices. Therefore, it is not easy to popularize and apply, and the working range is small, so it cannot be mass-produced or processed or is limited by the mask...etc., and the existing The processing technology for forming nanostructure patterns cannot produce non-repeating patterns. Furthermore, no matter...

Claims

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