Laser direct writing type nanometer periodic structure pattern manufacturing equipment

Abstract

The present invention relates to laser direct writing type nanometer periodic structure pattern manufacturing equipment, which is provided with a platform group, a measurement feedback group and a laser direct writing head group, wherein the platform group is provided with a base and a hybrid movement platform, the measurement feedback group and the platform group are combined, the measurement feedback group is provided with a laser interferometer, a reflection device and a signal receiving device, the laser direct writing head group is provided with a laser direct writing head, a laser direct writing head control interface device and a position comparison interface device, and the position comparison interface device forms phase electrical connections with the measurement feedback group and the laser direct writing head control interface device. According to the present invention, the structure pattern manufacturing equipment is provided, wherein the structure pattern manufacturing equipment has the following advantages that: nanometer holes with random graphics and lattice alignments can be generated, optical diffraction limitation can be broken so as to decrease a record point, a processing speed, processing accuracy and a processing range can be improved, and cost is low.

Description

technical field [0001] The invention relates to a nano-structure pattern manufacturing device, in particular to a laser direct-writing nano-periodic structure pattern manufacturing equipment. Background technique [0002] At present, the existing lithography processing technologies related to nanostructure patterns include yellow light lithography, electron beam lithography, atomic force microscopy, X-ray lithography, near-field beam lithography, laser interference lithography, and traditional laser direct writing exposure lithography. However, the processing speed of the aforementioned existing technologies is slow and most of them require huge and expensive equipment or devices. Therefore, it is not easy to popularize and apply, and the working range is small, so it cannot be mass-produced or processed or is limited by the mask...etc., and the existing The processing technology for forming nanostructure patterns cannot produce non-repeating patterns. Furthermore, no matter...

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Problems solved by technology

[0002] At present, the existing lithography processing technologies related to nanostructure patterns include yellow light lithography, electron beam lithography, atomic force microscopy, X-ray lithography, near-field beam lithography, laser interference lithography, and traditional laser direct writing exposure lithography. However, the processing speed of the aforementioned existing technologies is slow and most of them require huge and expensive equipment or devices. Therefore, it is not easy to popularize and apply, and the working range is small, so it cannot be mass-produced or processed or is limited by the mask...etc., and the existing The processing technology for forming nanostructure patterns cannot produce non-repeating patterns. Furthermore, no matter what kind of process is used, there are factors that affect the processing accuracy, such as: platform design, precision positioning, optical positioning system, alignment system technology Related technologies such as construction and temperature control, among which, the exposure laser beam of the laser direct writing photomechanical system of the above-mentioned traditional laser direct writing exposure lithography machine uses high-cost, large-scale deep ultraviolet light (DUV) or ultra-deep ultraviolet light ( EUV) gas or solid-state laser as the light source can have the opportunity to achieve nanoscale pattern processing. In addition, the optical components of traditional laser direct writing equipment have not been effectively modularized, resulting in frequent maintenance of the laser optical path, difficult operation and adjustment, and reliable process. The degree is low, and the overall equipment is huge and expensive due to the above-mentioned traditional design, which is also its disadvantage;

[0003] Most of the existing laser direct writing equipment and current lithography equipment need to be installed on a good precision positioning platform in order to process precise finished products during the manufacturing process. Therefore, the technological evolution of precision positioning platforms also represents A milestone in the process technology. At present, the existing precision positioning platforms can be divided into long-stroke positioning platforms and multi-axis short-stroke positioning platforms. The driving device of the long-stroke positioning platform mainly uses servo motors with ball screws, linear motors and Voice coil motors are the mainstream, and their guide rails are mostly linear slide rails and air guide rails. Most of the feedback measurement systems used in existing long-travel positioning platforms use optical rulers and optical read heads for measurement. When the optical ruler exceeds 1 meter (m) will accumulate considerable processing errors, and will cause good repeatability but inaccurate measurement results. Therefore, the accuracy of today's long-travel positioning platforms is difficult to reach the nanometer level (below 100nm), and multi-axis In terms of short-stroke positioning platforms, flexible structures are mostly used to construct the required platforms. The actuators are most commonly used with piezoelectric materials. If multi-axis short-stroke positioning platforms need to achieve high precision, they can be equipped with capacitive probes. Its accuracy can reach several nanometers. However, the displacement of most multi-axis short-stroke positioning platforms is mostly hundreds of microns. The displacement is small enough for precision machining. Therefore, it is necessary to process nano-periodic structures and increase processing speed. , precision and processing range, the processing of arbitrary graphic structures and nanoholes arranged in lattice are problems that the industry is eager to solve at present.

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