Low dielectric constant glass plate and preparation method thereof
A low dielectric constant, glass plate technology, applied in the field of glass manufacturing, can solve the problems of increasing the material process, not meeting the electronics industry, increasing manufacturing costs, etc. Effect
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[0027] Example one
[0028] (1) In this embodiment, the aluminosilicate glass is melted by a furnace. The basic composition design used in the embodiment is shown in Table 1. The analytical pure is used as the raw material. After the configuration is completed, the glass batch is put into the silicon In the molybdenum furnace, the temperature is raised to 1650°C at a rate of 3~5°C / min, and the temperature is kept for two hours. Then the molten glass is poured into a mold to form, and then sent to the annealing furnace for annealing. Annealing at a cooling rate, the annealing temperature is 500°C, until it is cooled to room temperature, the sample is taken out for cutting, polishing, and testing.
[0029] Table 1 Example 1 basic glass composition (500g glass batch)
[0030] SiO 2 Al 2 O 3 MgOK 2 O Na 2 O CaOB 2 O 3 ZrO 2 CeO 2 Sn0 2 3293611.57.5262355012
[0031] (2) Test the glass samples prepared in this embodiment, and the test results are as follows
[0032] Table 2 Test resu...
Example Embodiment
[0035] Example two
[0036] (1) In this embodiment, the aluminosilicate glass is melted by a furnace. The basic composition design used in the embodiment is shown in Table 3. The analytical pure is used as the raw material. After the configuration is completed, the glass batch is put into the silicon In the molybdenum furnace, the temperature is increased to 1670°C at a rate of 3~5°C / min, and the temperature is kept for three hours. Then the molten glass is poured into a mold to form, and then sent to the annealing furnace to anneal at a temperature of 2°C / min. Annealing at a cooling rate, the annealing temperature is 600°C, until it is cooled to room temperature, the sample is taken out for cutting, polishing, and testing.
[0037] Table 3 Example 2 Basic glass composition (500g glass batch)
[0038] SiO 2 Al 2 O 3 MgOK 2 O Na 2 O CaOB 2 O 3 ZrO 2 CeO 2 Sn0 2 38027.507.52510153014
[0039] (2) Test the glass samples prepared in this embodiment, and the test results are as foll...
Example Embodiment
[0043] Example three
[0044] (1) In this example, the aluminosilicate glass is melted by a furnace. The basic composition design used in the example is shown in Table 5. The analytical pure is used as the raw material. After the configuration is completed, the glass batch is put into the silicon In the molybdenum furnace, the temperature is raised to 1700°C at a rate of 3~5°C / min, and the temperature is kept for three hours. Then the molten glass is poured into the mold to form, and then sent to the annealing furnace to anneal at a temperature of 2°C / min. Annealing at a cooling rate, the annealing temperature is 300°C, until it is cooled to room temperature, the sample is taken out for cutting, polishing, and testing.
[0045] Table 5 Example 3 Basic glass composition (500g glass batch)
[0046] SiO 2 Al 2 O 3 MgOK 2 O Na 2 O CaOB 2 O ZrO 2 CeO 2 Sn0 2 27570552051510028
[0047] (2) Test the glass samples prepared in this embodiment, and the test results are as follows
[0048]...
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