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Titanium diboride-nickel coating or film and preparation method thereof

A titanium diboride and nickel coating technology, which is applied in the coating, metal material coating process, ion implantation plating, etc., to achieve the effect of convenient operation, low cost and good electrical conductivity

Active Publication Date: 2013-06-19
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

(Xinghong Zhang, Changqing Hong, Jiecai Hana and Hexin Zhang, Microstructure and mechanical properties of TiB 2 / (Cu, Ni) interpenetrating phase composites, Scripta Materialia, 55, 2006, 565-568) and in-situ vapor phase synthesized metal Ni toughened TiB 2 Coatings or films have not been reported

Method used

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  • Titanium diboride-nickel coating or film and preparation method thereof
  • Titanium diboride-nickel coating or film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] 1) Select commercially available TiB with a purity of 99.9% 2 A ceramic target and a commercially available metal Ni target with a purity of 99.99% are used as raw materials; a (100)-oriented single crystal silicon substrate is selected as a substrate.

[0027] 2) Firstly, the substrate is cleaned, and the substrate is ultrasonically cleaned with absolute ethanol, acetone, and absolute ethanol for 20 minutes in sequence, and then dried at 80° C. for 2 hours by blasting, and then set aside.

[0028] 3) Using the magnetron sputtering system independently designed and produced by our research group, first open the cavity and install the substrate and target correctly, first check that the gas, electricity, and water circuits are normal, then turn on the main power supply and start the mechanical pump, when the deposition chamber and the sample After the air pressure in the chamber is below 10Pa, close the valve between the mechanical pump and the chamber, open the baffle v...

Embodiment 2

[0035] 1) Select commercially available TiB with a purity of 99.9% 2 A ceramic target and a commercially available metal Ni target with a purity of 99.99% are used as raw materials; a common flat glass substrate is used as a substrate.

[0036] 2) Firstly, the substrate is cleaned, and the substrate is ultrasonically cleaned with absolute ethanol, acetone, and absolute ethanol for 20 minutes in sequence, and then dried at 80° C. for 2 hours by blasting, and then set aside.

[0037] 3) Using the magnetron sputtering system independently designed and produced by our research group, first open the cavity and install the substrate and target correctly, first check that the gas, electricity, and water circuits are normal, then turn on the main power supply and start the mechanical pump, when the deposition chamber and the sample After the air pressure in the chamber is below 10Pa, close the valve between the mechanical pump and the chamber, open the baffle valve, start the molecula...

Embodiment 3

[0043] 1) Select commercially available TiB with a purity of 99.9% 2 A ceramic target and a commercially available metal Ni target with a purity of 99.99% are used as raw materials; the substrate is a high-speed steel substrate.

[0044] 2) Firstly, the substrate is cleaned, and the substrate is ultrasonically cleaned with absolute ethanol, acetone, and absolute ethanol for 20 minutes in sequence, and then dried at 80° C. for 2 hours by blasting, and then set aside.

[0045] 3) Using the magnetron sputtering system independently designed and produced by our research group, first open the cavity and install the substrate and target correctly, first check that the gas, electricity, and water circuits are normal, then turn on the main power supply and start the mechanical pump, when the deposition chamber and the sample After the air pressure in the chamber is below 10Pa, close the valve between the mechanical pump and the chamber, open the baffle valve, start the molecular pump,...

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Abstract

The invention relates to a preparation method of a titanium diboride-nickel coating or film. By using the method, a metal Ni toughened TiB2 coating or film is prepared through in-situ synthesis; and the coating has hardness up to higher than 25GPa, good conductive properties, good toughness, corrosion resistance and erosion resistance, and excellent friction and wear performance, and can be widely applied to the fields of cutting tool, mold, electric contact and protection. The preparation process has advantages of simpleness, short production cycle and low cost, and is convenient for industrialized mass production.

Description

technical field [0001] The invention belongs to the field of new materials and relates to a TiB 2 -Ni material, specifically related to an in situ synthesized metallic Ni toughened TiB 2 Coating or film and method for its preparation. Background technique [0002] TiB 2 With the advantages of high hardness, high melting point, low density, high Young's modulus, good thermal conductivity, electrical conductivity, wear resistance and chemical stability, it is an advanced ceramic material with excellent structure and functional properties, so it It is widely used in a variety of fields, especially as coating materials for hard, protective, and electrical contacts. However TiB 2 The brittleness of ceramic materials limits its single application to a certain extent. Therefore, referring to the research ideas of material composites, based on TiB 2 High hardness of the material, TiB 2 Particle-reinforced metal matrix composites have been extensively studied recently. For exa...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/35
Inventor 黄峰葛芳芳王博王怀勇
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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