High-temperature resistant antistatic artificial synthetic stone and manufacturing process thereof

An artificial synthetic stone, anti-static technology, applied in the direction of synthetic resin layered products, lamination, layered products, etc., can solve the anti-static synthetic stone high-density tool wear, anti-static synthetic stone thermal deformation, high temperature resistance. To the requirements and other issues, to achieve the effect of reducing the friction coefficient, improving heat resistance, excellent high temperature resistance and moisture resistance

Active Publication Date: 2014-05-14
ANHUI RUIFA COMPOSITES MFG
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to fundamentally solve: 1. the problem of high temperature resistance of antistatic synthetic stone; 2. the problem of high density of antistatic synthetic stone and the problem of tool wear during machining; 3. the problem of uniform electrostatic conduction of antistatic synthetic stone ;4 The problem of thermal deformation of antistatic synthetic stone; 5 A small amount of toxic smoke generated during the use of antistatic synthetic stone due to the failure of high temperature resistance to meet the requirements, which will affect the health of users and operators

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-temperature resistant antistatic artificial synthetic stone and manufacturing process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A production method for making full use of new materials and combinations of new materials to produce new antistatic artificial synthetic stones, especially related to antistatic graphite fiberglass cloth, graphite fiberglass felt, inorganic nanomaterials, polyimide resin, Novolak The first application of type epoxy resin and hollow glass microspheres in the field of antistatic artificial synthetic stone. The amount of the inorganic nano material silicon dioxide is 3%, the amount of hollow glass microspheres is 5%, the amount of conductive carbon black is 1.5%, the amount of polyimide resin (solid content) is 24%, Novolak type epoxy The amount of resin (solid content) is 22%, bisphenol A type epoxy resin (solid content) is 35%, to form a glue solution. The amount of antistatic graphite fiberglass cloth and graphite fiberglass felt is 52% of the above glue (solid content). (Others can be filled with silica powder)

[0024] Put inorganic nanomaterials silica, hollow gla...

Embodiment 2

[0031] A production method for making full use of new materials and combinations of new materials to produce new antistatic artificial synthetic stones, especially related to antistatic graphite fiberglass cloth, graphite fiberglass felt, inorganic nanomaterials, polyimide resin, Novolak The first application of type epoxy resin and hollow glass microspheres in the field of antistatic artificial synthetic stone. The amount of the inorganic nanomaterial silicon dioxide is 2%, the amount of hollow glass microspheres is 4%, the amount of conductive carbon black is 1%, the amount of polyimide resin (solid content) is 23%, and the amount of Novolak type epoxy The amount of resin (solid content) is 20%, bisphenol A epoxy resin (solid content) is 40%, and the glue is formed. The amount of antistatic graphite fiberglass cloth and graphite fiberglass felt is 50% of the above glue (solid content). (Others can be filled with silica powder)

[0032] Put inorganic nanomaterials silica, h...

Embodiment 3

[0039] A production method for making full use of new materials and combinations of new materials to produce new antistatic artificial synthetic stones, especially related to antistatic graphite fiberglass cloth, graphite fiberglass felt, inorganic nanomaterials, polyimide resin, Novolak The first application of type epoxy resin and hollow glass microspheres in the field of antistatic artificial synthetic stone. The amount of the inorganic nanomaterial silicon dioxide is 3%, the amount of hollow glass microspheres is 8%, the amount of conductive carbon black is 3%, the amount of polyimide resin (solid content) is 25%, and the amount of Novolak type epoxy The amount of resin (solid content) is 20%, bisphenol A type epoxy resin (solid content) is 50%, and the glue is formed. The amount of antistatic graphite fiberglass cloth and graphite fiberglass felt is 40% of the above glue (solid content). (Others can be filled with silica powder)

[0040] Put inorganic nanomaterials sili...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a composite composition of antistatic artificial synthetic stone. The materials of the glue solution include polybismaleimide, bisphenol A novolac epoxy resin, bisphenol A epoxy resin, nanoscale silicon dioxide, high-strength hollow glass beads and conductive carbon ink; the solvent is dimethyl formamide and/or acetone/butanone; the reinforcing material is antistatic graphite glass fiber cloth and/or graphite glass fiber felt, wherein any one or two are used. The antistatic artificial synthetic stone disclosed by the invention solves the problems in high-temperature resistance of antistatic synthetic stone, high density of antistatic synthetic stone, uniform static conduction action of antistatic synthetic stone, thermal deformation of antistatic synthetic stone and influence on the health of users and operators caused by a little toxic smoke generated in the using process of the antistatic synthetic stone since the high-temperature resistance does not meet the requirements; moreover, the product density is reduced, and the problem of serious abrasion of the post-processing tool of the user is solved.

Description

technical field [0001] The invention relates to a production method for making full use of new materials and combining new materials to produce new antistatic artificial synthetic stones, in particular to antistatic graphite glass fiber cloth, graphite glass fiber felt, inorganic nanomaterials, polyimide resin, The first application of Novolak-type epoxy resin and hollow glass microspheres in the field of antistatic artificial synthetic stone has improved the heat resistance level, thermal conductivity, thermal stability, and mechanical properties of antistatic artificial synthetic stone, and improved post-processing Quality of products. Background technique [0002] With the implementation of the lead-free ban on electronic and electrical products, fixtures such as insulation test fixtures, wave soldering, reflow soldering, vapor phase reflow soldering, laser reflow soldering, SMT surface mount, furnace trays, and tin furnaces requirements are becoming more and more string...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08L63/02C08L63/00C08L79/08C08K13/04C08K3/36C08K7/28C08K3/04C08K7/00C08K7/14B32B27/04B32B37/06B32B37/10
Inventor 李长峰吴纪华
Owner ANHUI RUIFA COMPOSITES MFG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products