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Bulk amorphous and nanocrystalline alloy surface chemical polishing technology and polishing solution

A nanocrystalline alloy and chemical polishing technology, which is applied in the field of surface chemical polishing and polishing liquid, can solve the problems of large amount of chemical drugs, surface finish is not as good as electropolishing, and power is inferior, and achieves short process flow, remarkable polishing effect, and prevents The effect of etching and corrosion passivation film

Active Publication Date: 2014-05-14
DONGGUAN EONTEC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Chemical polishing can save the power supply and current distribution equipment required by electropolishing, and save the electricity required to complete the polishing, so the investment is relatively economical, but the amount of chemicals consumed by chemical polishing is relatively large, and the power is inferior to electropolishing. Therefore, both the efficiency of polishing and the surface finish after polishing are not as good as electropolishing.
Chemical polishing is more affected by the surface structure of metal materials, so not every material can get good results by chemical polishing, especially for large amorphous and nanocrystalline materials obtained by metal die casting or powder metallurgy. Due to the large edge burrs and defects such as surface flow lines and pits, chemical polishing technology cannot completely replace mechanical polishing and electrochemical polishing for processing

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] The object material for polishing is a product made of vit1 bulk amorphous with a primary surface (required for high gloss) and the rest of the surface is a secondary surface (required to be free of burrs), with a total surface area of ​​400mm 2 . The primary surface of the product is polished by a disc abrasive belt machine, Ra=2~4μm, the secondary surface is in the original state, and then it has been activated, cleaned and dried.

[0037] This embodiment uses the following polishing agent formula to prepare 1L of polishing agent:

[0038] 120ml / L phosphoric acid+30ml / L nitric acid+120ml / L hydrochloric acid+3g / L Pingpingjia+3g / L sodium perchlorate+15ml / L glacial acetic acid+4ml / L hydrofluoric acid+1g / L hexamethylene tetra Amine + 20ml / L composite brightener, the balance is deionized water.

[0039] Operating conditions: heat the polishing solution to 60°C, hang the product with a titanium wire and immerse it in the polishing solution for polishing. You can see an ob...

Embodiment 2

[0042] Object material is with embodiment 1.

[0043] This embodiment uses the following polishing agent formula to prepare 1L of polishing agent:

[0044] 120ml / L phosphoric acid+30ml / L nitric acid+120ml / L hydrochloric acid+3g / L Pingpingjia+10ml / L perchloric acid+15ml / L glacial acetic acid+6ml / L hydrofluoric acid+1g / L hexamethylenetetramine +20ml / L compound brightener, the balance is deionized water.

[0045] Operating conditions: heat the polishing liquid to 80°C, hang the product with a titanium wire and immerse it in the polishing liquid for polishing, you can see obvious corrosion reaction, take it out after 20 seconds, quickly wash it with water, passivate for 15 seconds, and neutralize for 15 seconds , hot water wash for 10 seconds, hot water temperature 80 ℃, drying temperature 110 ℃.

[0046] Results: Ra=0.68μm on the primary surface of the product, the glossiness of the incident light at 20° angle=17, Ra=6~8μm on the secondary surface, no obvious burrs on the seconda...

Embodiment 3

[0048] The material of the object is Zr55 bulk amorphous material, and the others are the same as in Embodiment 1.

[0049] This embodiment uses the following polishing agent formula to prepare 1L of polishing agent:

[0050] 120ml / L phosphoric acid+30ml / L nitric acid+120ml / L hydrochloric acid+3g / L Pingpingjia+6ml / L perchloric acid+15ml / L glacial acetic acid+4ml / L hydrofluoric acid+1g / L hexamethylenetetramine +20ml / L compound brightener, the balance is deionized water.

[0051] Operating conditions: heat the polishing solution to 80°C, hang the product with a titanium wire and immerse it in the polishing solution for polishing, you can see obvious corrosion reaction, take it out after 25 seconds, quickly enter the water wash, passivate for 15 seconds, and neutralize for 15 seconds , hot water wash for 10 seconds, hot water temperature 80 ℃, drying temperature 110 ℃.

[0052] Results: Ra=0.8μm on the primary surface of the product, the glossiness of the incident light at 20° ...

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PUM

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Abstract

The invention provides a bulk amorphous and nanocrystalline alloy surface chemical polishing technology, comprising conventional processes of chemical polishing treatment: mechanical pretreatment, alkaline washing for oil removal, hot water washing, dilute nitric acid treatment, water washing and baking, and the processes after a baking procedure of the conventional processes: chemical polishing, water washing, passivating, neutralizing, hot water washing and baking. The invention also provides a chemical polishing solution which is prepared from a polishing agent main body, an adjuvant, a surface active agent, a stabilizer and a brightener and is used by the bulk amorphous and nanocrystalline alloy surface chemical polishing technology, and material ingredients thereof. The bulk amorphous and nanocrystalline product with the defects such as large edge burr, surface flow liner and pit, and the like is obtained by adopting a metal mould casting method or a powder metallurgic method. By adopting the chemical polishing treatment carried out by adopting the bulk amorphous and nanocrystalline alloy surface chemical polishing technology, the treatment effect is obviously superior to that of mechanical polishing, and can be comparable with that of electrochemical polishing. The chemical polishing treatment disclosed by the invention is small in investment, low in processing cost, short in technological flow, and reasonable and simple in control element.

Description

technical field [0001] The invention belongs to the technical field of material processing, and relates to a surface chemical polishing technology, in particular to a chemical polishing technology and a polishing solution for the surface of bulk amorphous and nanocrystalline alloys. Background technique [0002] At present, the preparation technology of bulk amorphous and nanocrystalline alloys is becoming more and more perfect, and bulk amorphous and nanocrystalline alloys exhibit better mechanical properties, better corrosion resistance and friction resistance, and excellent softness than crystalline alloys. Magnetic and hard magnetic properties, so bulk amorphous and nanocrystalline materials have gradually become a widely used engineering material. Bulk amorphous and nanocrystalline alloys have been widely used in mechanical structural parts, optical precision components, surface decoration products, sporting goods, soft magnetic materials, military industry and other fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/00
Inventor 汤铁装
Owner DONGGUAN EONTEC CO LTD
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