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A kind of solar cell based on the principle of surface plasmon enhancement and its preparation method

A surface plasmon, solar cell technology, applied in circuits, capacitors, photosensitive devices, etc., can solve problems such as poor thermal stability, and achieve the effect of increasing effective separation, rich selection, and achieving photoelectric conversion efficiency

Active Publication Date: 2016-07-13
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the material of light-transmitting conductive electrodes used in solar cells is metal oxide, commonly known as conductive glass (such as indium tin oxide, fluorine tin oxide), but metal ions in conductive glass are easy to diffuse spontaneously, and have strong absorption for infrared spectrum property, and its thermal stability is poor (Adv.Mater.,2011,23(13):1514–1518); people urgently need a low-cost material that can replace conductive glass to further promote the industrialization process of solar cells ( Nanotechnology, 2012, 23(8): 085201–1–6)

Method used

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  • A kind of solar cell based on the principle of surface plasmon enhancement and its preparation method
  • A kind of solar cell based on the principle of surface plasmon enhancement and its preparation method
  • A kind of solar cell based on the principle of surface plasmon enhancement and its preparation method

Examples

Experimental program
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Effect test

Embodiment 1

[0068] Embodiment 1. A solar cell device using single crystal zinc oxide as a wide bandgap semiconductor and K-19 dye as a photoexcitable dye; gold and silver are used as targets to vapor-deposit on graphene sheets.

[0069] The specific device preparation method is as follows:

[0070] 1. Preparation of ultra-flat zinc oxide wafers: prepare ultra-flat zinc oxide semiconductors (thickness 500nm) by magnetron sputtering, and then perform single-sided mechanical polishing on the zinc oxide wafers; Or ultrasonic cleaning in absolute ethanol for 30 minutes; then rinse with ultrapure water for 5 minutes, then rinse with deionized water for about 10 minutes, and finally blow dry with high-purity nitrogen.

[0071] 2. Evaporate low work function metals such as indium and silver on the non-mechanically polished side of the zinc oxide wafer as the back electrode; clamp the zinc oxide wafer to the top metal plate of the vacuum coating machine, so that the vacuum degree is pumped to 4.5×...

Embodiment 2

[0079] Example 2. A solar cell device using single-crystal titanium dioxide as a wide-bandgap semiconductor and N719 dye as a light-excited dye; and using gold as a target to vapor-deposit on a graphene sheet.

[0080] The specific device preparation method is as follows:

[0081] 1. Preparation of ultra-flat titanium dioxide wafers: preparation of ultra-flat titanium dioxide semiconductors (thickness of 300 nm) by magnetron sputtering, and then single-sided mechanical polishing of the titanium dioxide wafers; then etching with a 35% HF aqueous solution for 8 minutes, Then it was etched in 20W oxygen plasma for 80s.

[0082] 2. Evaporate the low work function metal of indium and silver on the unpolished side of the titanium dioxide wafer as the back electrode; clamp the titanium dioxide wafer to the top metal plate of the vacuum coating machine, so that the vacuum degree is pumped to 4.5×10 -4 Pa, which was vapor-deposited on the back surface of the titania wafer at a molar r...

Embodiment 3

[0089] Example 3. A solar cell device using single crystal titanium dioxide as a wide-bandgap semiconductor and Z907 dye as a light-excited dye; using pure silver as a target material for vapor deposition on a graphene sheet.

[0090] The specific device preparation method is as follows:

[0091] 1. Preparation of ultra-flat titanium dioxide wafers: ultra-flat titanium dioxide semiconductors (800 nm in thickness) were prepared by magnetron sputtering, and then the titanium dioxide wafers were mechanically polished on one side; then etched with 35% HF aqueous solution for 8 minutes , followed by etching in 20W oxygen plasma for 80s.

[0092] 2. Evaporate the low work function metal of indium and silver on the unpolished side of the titanium dioxide wafer as the back electrode; clamp the titanium dioxide wafer to the top metal plate of the vacuum coating machine, so that the vacuum degree is pumped to 4.5×10 -4 Pa, according to the molar ratio of indium:silver is 1:1, which is ...

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Abstract

The invention discloses a solar cell based on a surface plasma reinforcing principle and a preparing method of the solar cell. The solar cell comprises a wide band gap semiconductor layer, a photosensitization dye layer, a graphene layer and a metal nanoparticle layer, wherein the wide band gap semiconductor layer, the photosensitization dye layer, the graphene layer and the metal nanoparticle layer are arranged on a back electrode in sequence in a stacked mode. According to the solar cell, a local electromagnetic field around particles is greatly improved through local surface plasmons of the metal nanoparticles, and incident optical field energy is stored around the surfaces of the nanometer particles, so that effective excitation is conducted on optical excitation dye, and the efficiency of light absorption of the solar cell is improved. Meanwhile, single-layer graphene is used for replacing an electrolyte solution and a counter electrode in a traditional cell, the cell structure is simplified, the safety performance of the cell is effectively improved, and the solar cell has huge potential in industrial production and application.

Description

technical field [0001] The invention relates to a solar cell based on the principle of surface plasmon enhancement and a preparation method thereof. Background technique [0002] In the ranks of new energy, solar energy accounts for more than 99% of the total energy of the earth, with cleanness and large reserves, and is gradually becoming the main force of the new energy industry (Chem. Rev. 2010, 110, 6595). The solar cell is an important carrier to convert solar energy into electrical energy. It mainly uses the photovoltaic effect of photovoltaic semiconductor materials for photoelectric conversion; the main research semiconductor materials are: monocrystalline silicon, polycrystalline silicon, multi-component compounds, organic semiconductors, dyes Sensitization et al. (Chem. Rev, 2007, 107:1324-1338). [0003] Compared with traditional silicon solar cells, organic dye-sensitized solar cells have become an emerging force due to their low cost, and are also an important ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01G9/20H01G9/042H01G9/032H01G9/004H01G9/14
CPCY02E10/542
Inventor 郭雪峰李新喜贾传成张国庆
Owner PEKING UNIV
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