Manufacturing method for PERL crystalline silicon solar cell capable of being massively produced
A technology of solar cells and manufacturing methods, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve problems such as undetermined process methods, achieve the effects of reducing equipment investment, increasing manufacturing costs, and saving costs
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[0039] Example 1:
[0040] A manufacturing method of mass-produced PERL crystalline silicon solar cell includes the following steps:
[0041] (1) De-damage, texturing and cleaning of silicon wafer:
[0042] Choose 156mm P-type monocrystalline silicon wafer as the base material, its resistivity is 1 ohm·cm, after de-damaging the selected p-type silicon wafer, use 0.5% sodium hydroxide or potassium hydroxide solution at 75℃ Chemically etch the surface of the P-type silicon wafer to prepare a pyramid-shaped suede, and then wash it with 1% hydrofluoric acid to remove impurities;
[0043] (2) Phosphorus diffusion: the tube-type phosphorus diffusion method is used, specifically in the diffusion furnace at a temperature of 600 ℃, using POCl 3 Phosphorus diffusion is performed on the front surface of the silicon wafer to form an n-type layer, so that the P-type crystalline silicon square resistance is 25 ohm / sq. The phosphosilicate glass naturally formed after diffusion is used as a mask for ...
Example Embodiment
[0055] Example 2:
[0056] A manufacturing method of mass-produced PERL crystalline silicon solar cell includes the following steps:
[0057] (1) De-damage, texturing and cleaning of silicon wafer:
[0058] Select 156mm P-type monocrystalline silicon wafer as the base material, and its resistivity is 2 ohm·cm. After de-damaging the selected p-type silicon wafer, use 1% sodium hydroxide or potassium hydroxide solution at 80℃ Chemically etch the surface of the P-type silicon wafer to prepare a pyramid-shaped suede, and then clean it with 5% hydrofluoric acid to remove impurities;
[0059] (2) Phosphorus diffusion: the tube-type phosphorus diffusion method is used, specifically in the diffusion furnace at a temperature of 750 ℃, using POCl 3 Phosphorus diffusion is performed on the front surface of the silicon wafer to form an n-type layer, so that the P-type crystalline silicon square resistance is 100 ohm / sq. The phosphosilicate glass naturally formed after diffusion is used as a mask ...
Example Embodiment
[0071] Example 3:
[0072] A manufacturing method of mass-produced PERL crystalline silicon solar cell includes the following steps:
[0073] (1) De-damage, texturing and cleaning of silicon wafer:
[0074] Select 156mm P-type monocrystalline silicon wafer as the base material, its resistivity is 3 ohm·cm, after de-damaging the selected p-type silicon wafer, use 2% sodium hydroxide or potassium hydroxide solution at 85℃ Chemically etch the surface of the P-type silicon wafer to prepare a pyramid-shaped suede, which is then cleaned with 15% hydrofluoric acid to remove impurities;
[0075] (2) Phosphorus diffusion: the tube-type phosphorus diffusion method is used, specifically in the diffusion furnace at a temperature of 800 ℃, using POCl 3 Phosphorus diffusion is performed on the front surface of the silicon wafer to form an n-type layer, so that the P-type crystalline silicon square resistance is 150 ohm / sq, and the phosphosilicate glass naturally formed after diffusion is used as a ...
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