Method for casting high efficiency polycrystalline silicon ingots

A polycrystalline silicon ingot, a high-efficiency technology, applied in the growth of polycrystalline materials, chemical instruments and methods, crystal growth, etc., can solve the problem of unsatisfactory improvement of grain morphology, unstable control of residual seed crystals, and inability to achieve shape core center and other issues, to achieve the effect of easy mass and rapid promotion, good economic benefits, and reduction of crystal defect density

Inactive Publication Date: 2014-12-10
ALTUSVIA ENERGY TAICANG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after the silicon nitride coating is sprayed on the roughened crucible, the silicon nitride coating is in direct contact with the silicon liquid. Since the silicon nitride coating has no wettability with the silicon liquid, it cannot play the role of a nucleation center. Therefore, This method is not ideal for improving the grain morphology
[0005] Patent CN102776557A proposes a method of casting polysilicon ingots using broken silicon chips as seed crystals. The broken silicon material is spread on the bottom of the crucible as the seed crystal to promote nucleation. After the silicon material is melted, the process is adjusted to keep the broken silicon material partially melted. The crystal grows upward with the unmelted silicon material as the seed crystal to obtain high-quality silicon ingots. However, due to the unmelted silicon material at the bottom of this method, the impurity rate of the silicon ingot is high, and the yield of the ingot is low, and this method requires Precisely control the remaining amount of seed crystals. At present, automatic control cannot be realized. It can only be detected manually with quartz rods. The control of the remaining amount of seed crystals is unstable, and it is difficult to achieve comprehensive promotion.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Experimental samples were prepared by the following steps:

[0028] 1. Use germanium powder with a purity of 99.999% and a particle size of 1200 mesh, mix it with silicon nitride at a weight ratio of 3:2, wherein the weight of germanium powder is 300 grams, and the weight of silicon nitride is 200 grams. Dissolve in 1300 mL of pure water and 50 mL of The mixed solution of alcohol, prepare nucleating agent, the ingot charging amount in the present embodiment is 800KG;

[0029] 2. Take the quartz ceramic crucible whose bottom has been roughened, and spray the silicon nitride coating on the inner wall of the crucible according to the conventional process. After the coating is dry, spray the prepared nucleating agent suspension onto the bottom of the crucible;

[0030] 3. Keep the temperature of the crucible at 80°C, the nucleating agent is completely dry, and the thickness of the nucleating agent after drying is 0.2mm;

[0031] 4. Adjust the ingot casting process, open th...

Embodiment 2

[0041] Experimental samples were prepared by the following steps:

[0042] 1. Use germanium powder with a purity of 99.999% and a particle size of 1200 mesh, mix it with silicon nitride at a weight ratio of 4:1, wherein the weight of germanium powder is 400 grams, and the weight of silicon nitride is 100 grams, dissolved in 1200 mL of pure water and 50 mL of In the mixed solution of alcohol, prepare nucleating agent, the ingot charging amount in the present embodiment is 800KG;

[0043] 2. Take the quartz ceramic crucible whose bottom has been roughened, and spray the silicon nitride coating on the inner wall of the crucible according to the conventional process. After the coating is dry, spray the prepared nucleating agent suspension onto the bottom of the crucible;

[0044] 3. Keep the temperature of the crucible at 80°C until the nucleating agent is completely dry, and the thickness of the nucleating agent after drying is 0.2mm;

[0045] 4. Adjust the ingot casting process...

Embodiment 3

[0054] Experimental samples were prepared by the following steps:

[0055] 1. Use germanium powder with a purity of 99.999% and a particle size of 1200 mesh, mix it with silicon nitride at a weight ratio of 1:4, wherein the weight of germanium powder is 100 grams, and the weight of silicon nitride is 400 grams. Dissolve in 1300 mL of pure water and 30 mL of In the mixed solution of alcohol, prepare nucleating agent, the ingot charging amount in the present embodiment is 800KG;

[0056] 2. Take the quartz ceramic crucible whose bottom has been roughened, and spray the silicon nitride coating on the inner wall of the crucible according to the conventional process. After the coating is dry, spray the prepared nucleating agent suspension onto the bottom of the crucible;

[0057] 3. Keep the temperature of the crucible at 80°C until the nucleating agent is completely dry, and the thickness of the nucleating agent after drying is 0.2mm;

[0058] 4. Adjust the ingot casting process,...

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Abstract

The invention discloses a method for casting high efficiency polycrystalline silicon ingots. The method comprises the following steps: (1) preparing a nucleating agent, namely mixing germanium powder with silicon nitride powder, adding pure water and an organic solvent, uniformly stirring to obtain a nucleating agent suspension liquid and spraying the nucleating agent onto the bottom of a quartz crucible, wherein the mass percentage of the germanium powder is 20%-80% and the mass percentage of the silicon nitride powder is 80%-20%; (2) preserving heat of the quartz crucible at 20-100 DEG C till the nucleating agent in the step (1) is completely dried; and (3) increasing the temperature difference between the top and the bottom of the quartz crucible to ensure that the whole furnace of silicon materials are molten starting from the upper part till totally molten, and carrying out crystal growth and cooling on the molten silicon materials to complete the ingot casting. The ingot casting method disclosed by the invention has the advantages that the crystal grain structure is optimized, so that the crystal defect density in polycrystalline silicon is reduced, the silicon wafer crystal defect is less and the minority carrier lifetime is longer; and compared with conventional polycrystalline silicon wafers, the polycrystalline silicon ingots have the advantage that the efficiency of polycrystalline silicon batteries adopting the polycrystalline silicon ingots is increased by 0.3-0.5%.

Description

technical field [0001] The invention belongs to the technical field of photovoltaics, and in particular relates to an ingot casting method for improving the photoelectric conversion efficiency of a polycrystalline silicon solar cell. Background technique [0002] Today, with the gradual depletion of fossil energy and the deteriorating environment, solar power generation has become the hope of human beings to replace energy in the future. Crystalline silicon solar cells have become the most advantageous solar power generation device due to their high efficiency and high stability. Among them, polycrystalline silicon solar cells have a high cost performance and occupy more than 80% of the current market share. However, the current solar cell technology is not yet Mature, low photoelectric conversion efficiency, high power generation costs and other short boards restrict the large-scale promotion and application of solar cells. Therefore, improving the photoelectric conversion...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B28/06C30B29/06
Inventor 郭宽新孙海知潘欢欢张斌邢国强
Owner ALTUSVIA ENERGY TAICANG
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