An optical fiber f-p strain gauge based on mems technology and its forming method
A technology of F-P and strain gauge, which is applied in the process of producing decorative surface effect, metal material coating process, photoplate making process of patterned surface, etc. Further improve the measurement resolution and other issues to achieve the effects of avoiding interference spectrum degradation, wide operating temperature range, and ensuring batch consistency
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[0054] A structural schematic diagram of an optical fiber F-P strain gauge based on MEMS technology is shown in figure 1 As shown, the optical fiber F-P strain gauge mainly includes a F-P strain-sensitive MEMS chip 1 and a collimated beam expanding optical fiber 2;
[0055] Wherein, the structure schematic diagram of F-P strain-sensitive MEMS chip 1 is shown in Figure 2, and described F-P strain-sensitive MEMS chip 1 is made up of SOI strain beam, glass fixed pole 3 and silicon casing 4;
[0056] The SOI strain beam includes a top layer of silicon 5, an intermediate oxide layer 6, and a bottom layer of silicon 7; wherein, a patterned anti-reflection film 8 and a passivation layer 10 are deposited on one side of the bottom layer of silicon 7, and a highly reflective coating is deposited on the other side. Membrane 9; both the middle oxide layer 6 and the top layer of silicon 5 are processed with central holes, the central holes are coaxial and have the same diameter;
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