A kind of method for preparing flexible thermal film material

A heat-sensitive thin film and flexible technology, applied in metal material coating process, resistors with negative temperature coefficient, ion implantation plating, etc., can solve the problems of low resistivity, achieve low resistivity, easy process compatibility, The effect of low energy consumption

Active Publication Date: 2018-06-29
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Although there are many methods for preparing MCNO thin film materials, such as pulsed laser deposition, chemical solution method, screen printing method, etc., these methods usually require high-temperature heat treatment at 600-1200°C to achieve a material with a high negative temperature resistivity. while maintaining a low resistivity

Method used

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  • A kind of method for preparing flexible thermal film material
  • A kind of method for preparing flexible thermal film material
  • A kind of method for preparing flexible thermal film material

Examples

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Effect test

Embodiment 1

[0022] MnCO with a purity higher than 99.5% is Mn:Co:Ni=13:8:4 according to the atomic ratio of the three metals 3 、Co 2 o 3 、Ni 2 o 3 The powder was fully stirred and mixed, ball milled for 8 hours, sieved, put into an alumina crucible for synthesis, and synthesized at 900°C for 2 hours. Add agate balls and water to the synthesized material, finely grind it for 24 hours, and dry it. The dried powder is added with a binder, and then pre-pressed. Put the embryo body into a high-temperature furnace for sintering at 1170°C for 8 hours. During this period, the furnace maintains an oxygen-rich atmosphere with an oxygen partial pressure of 0.06 MPa, mechanically grinding, cleaning, and drying. Put the prepared target into the magnetron sputtering deposition equipment, vacuum the background to 2E-7Torr, and the gas pressure composition Argon oxygen ratio Ar:O during sputtering 2 =50:1, sputtering pressure 3.7mTorr. An organic flexible substrate sheet of polyethylene terephthal...

Embodiment 2

[0024] MnCO with a purity higher than 99.5% is Mn:Co:Ni=13:8:4 according to the atomic ratio of the three metals 3 、Co 2 o 3 、Ni 2 o 3 The powder was fully stirred and mixed, ball milled for 8 hours, sieved, put into an alumina crucible for synthesis, and synthesized at 900°C for 2 hours. Add agate balls and water to the synthesized material, finely grind it for 24 hours, and dry it. The dried powder is added with a binder, and then pre-pressed. Put the embryo body into a high-temperature furnace for sintering at 1170°C for 8 hours. During this period, the furnace maintains an oxygen-rich atmosphere with an oxygen partial pressure of 0.06 MPa, mechanically grinding, cleaning, and drying. Put the prepared target into the magnetron sputtering deposition equipment, vacuum the background to 2E-7Torr, and the gas pressure composition Argon oxygen ratio Ar:O during sputtering 2 =50:1, sputtering pressure 3.7mTorr. An organic flexible substrate sheet of polyethylene terephthal...

Embodiment 3

[0026] MnCO with a purity higher than 99.5% is Mn:Co:Ni=13:8:4 according to the atomic ratio of the three metals 3 、Co 2 o 3 、Ni 2 o 3 The powder was fully stirred and mixed, ball milled for 8 hours, sieved, put into an alumina crucible for synthesis, and synthesized at 900°C for 2 hours. Add agate balls and water to the synthesized material, finely grind it for 24 hours, and dry it. The dried powder is added with a binder, and then pre-pressed. Put the embryo body into a high-temperature furnace for sintering at 1170°C for 8 hours. During this period, the furnace maintains an oxygen-rich atmosphere with an oxygen partial pressure of 0.06 MPa, mechanically grinding, cleaning, and drying. Put the prepared target into the magnetron sputtering deposition equipment, vacuum the background to 2E-7Torr, and the gas pressure composition Argon oxygen ratio Ar:O during sputtering 2 =50:1, sputtering pressure 10mTorr. An organic flexible substrate sheet of polyethylene terephthala...

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Abstract

The invention discloses a method for preparing a flexible thermosensitive film material. According to the method, MnCO3 powder, Co2O3 powder, Ni2O3 powder are used as raw materials and subjected to grinding, screening, synthesizing, fine grinding, pre-molding forming and sintering under the oxygen-enriched atmosphere to be made into a ceramic target, a polyethylene glycol terephthalate sheet and a polyimide sheet are used as substrates, and an MCNO film is deposited at the room temperature in a sputtered mode through a radio frequency magnetron sputtering method. The method has the advantages that firstly, sputter deposition is completed at the room temperature, and the purpose of depositing the MCNO thermosensitive film on the polyethylene glycol terephthalate substrate, the polyimide substrate and other organic flexible substrates is achieved; secondly, the MCNO film prepared through the method is low in specific resistance, and the negative temperature resistance coefficient is high, so that responsivity of elements is better increased, and noise of the elements is better lowered; thirdly, preparation is conducted at the normal temperature, high-temperature heat treatment is not needed, energy consumption is low, energy is saved, and the environment is protected; and fourthly, the sputter deposition temperature is low, the method is easily compatible with a Si-based semiconductor process, and the thermosensitive elements can be directly prepared on Si-based reading circuit chips, so that the cost for preparing thermosensitive type uncooled infrared focal plane arrays is greatly lowered.

Description

technical field [0001] The invention belongs to the field of preparation methods of heat-sensitive infrared detection thin film materials, and specifically relates to the technology of reducing the deposition temperature of thin films and realizing low resistivity and high negative temperature resistivity of heat-sensitive materials at the same time, so as to meet the deposition conditions on flexible substrates and realize Fabrication of flexible thermosensitive film materials. Background technique [0002] Manganese-cobalt-nickel-oxygen (MCNO) is a negative temperature resistivity (NTC) thermosensitive material with a spinel structure. It is widely used because of its high negative temperature resistivity, good chemical stability and wide temperature range. In thermistors and microbolometers, its application fields include temperature sensing, uncooled infrared detection, night vision, horizon, and earth radiation budget detection. The device prepared by using it has the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/08C23C14/28H01C7/04
CPCC23C14/08C23C14/28H01C7/041H01C7/043
Inventor 吴敬黄志明周炜江林欧阳程高艳卿张飞褚君浩
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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