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Photosensitive resin composition, optical filter, manufacturing method thereof, and liquid crystal display device

A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve the problems of poor contrast, low fine pattern linearity and the like

Active Publication Date: 2020-03-13
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] In view of this, the present invention provides a photosensitive resin composition for a color filter of a liquid crystal display assembly, a color filter and a manufacturing method thereof, and a liquid crystal display device, which are obtained by using the photosensitive resin composition The advanced color filter can improve the linearity and poor contrast of low-definition patterns

Method used

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  • Photosensitive resin composition, optical filter, manufacturing method thereof, and liquid crystal display device
  • Photosensitive resin composition, optical filter, manufacturing method thereof, and liquid crystal display device
  • Photosensitive resin composition, optical filter, manufacturing method thereof, and liquid crystal display device

Examples

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Effect test

preparation example Construction

[0643] Preparation method of photosensitive resin composition

[0644] The method that can be used for preparing photosensitive resin composition is for example: Alkali-soluble resin (A), compound (B) containing ethylenically unsaturated group, photoinitiator (C), solvent (D), pigment (E) and dyestuff (F) Place in a stirrer and stir to make it uniformly mixed into a solution state. Additive (G) may also be added if necessary. After uniform mixing, a photosensitive resin composition in a solution state can be obtained. It can be used in the production of color filters described later.

[0645] The preparation method of the photosensitive resin composition is not particularly limited. The preparation method of the photosensitive resin composition is, for example, first dispersing a part of the alkali-soluble resin (A) and the compound (B) containing an ethylenically unsaturated group in a part of the solvent (D) to form a dispersion solution; and then mixing The remaining alka...

Embodiment

[0663] Synthesis example of the second unsaturated monomer (a-1-2)

[0664] Synthesis examples (a-1-2a) to synthesis examples (a-1-2h) of the second unsaturated monomer (a-1-2) are described below:

[0665] Synthesis example (a-1-2a)

[0666] Add 170 mass parts of anhydrous chloroform, 1.0 mass parts of camphorsulfonic acid, 1.4 mass parts of 4-(N,N-dimethylamino)pyridine and 18 parts by mass of 2-hydroxyethyl methacrylate, and stirred for about 30 minutes. Thereafter, slowly add the 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide hydrochloride of 10.5 mass parts and add the anhydrous chloroform of 47 mass parts and dissolve in advance and form After the solution was stirred at room temperature for about 2 hours. The organic layer was washed twice with 150 parts by mass of 10% saline solution after performing liquid separation operation twice with 150 parts by mass of 1N hydrochloric acid aqueous solution. Next, after adding 43 parts by mass of anhydrous magnesium sulfate a...

Synthetic example A-1-1

[0688] A four-neck conical flask with a capacity of 1000 milliliters is provided with a nitrogen inlet, a stirrer, a heater, a condenser tube and a thermometer. Then, 100 parts by weight of EEP was added, and the temperature of the oil bath was raised to 100°C. Then, 20 parts by weight of HOMS, 30 parts by weight of AA, 50 parts by weight of a-1-2a and 5 parts by weight of AMBN were dissolved in 100 parts by weight of EEP, and the mixed solution was dropped within 2 hours. Drop into a four-necked Erlenmeyer flask. The reaction temperature of the whole polymerization process is maintained at 100°C, and the polymerization time lasts for 6 hours. After the polymerization is completed, the polymerization product is taken out from the four-necked conical flask, and the solvent is removed to obtain the first alkali-soluble resin A-1- 1.

[0689] Synthesis Examples A-1-2 to A-1-8

[0690] Synthesis Examples A-1-2 to A-1-8 are the same steps as Synthesis Example A-1-1 to prepare th...

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Abstract

The invention provides a photosensitive resin composition for preparation of color filters with high precision pattern linearity and comparity, a color filter and a making method thereof, and a liquid crystal display device. The photosensitive resin composition comprises an alkali soluble resin (A), a compound (B) containing ethylenically non-saturated base, a photoiniator (C), a solvent (D), pigment (E), and dye (F), wherein the alkali soluble resin (A) includes a first alkali soluble resin (A-1); and the monomer mixture (a1) includes a first unsaturated monomer (a-1-1) with carborxylic acid group and a second unsaturated monomer (a-1-2) with a formula (A1-I) structure. The color filter prepared through the photosensitive resin composition can solve the problem of low comparison and low fineness pattern linearity.

Description

technical field [0001] The present invention relates to a photosensitive resin composition, a color filter and its manufacturing method, and a liquid crystal display device, in particular to a photosensitive resin composition capable of producing a color filter with high-precision pattern linearity and excellent contrast , a color filter made of the photosensitive resin composition, a manufacturing method thereof, and a liquid crystal display device comprising the color filter. Background technique [0002] At present, color filters have been widely used in the fields of office equipment such as color liquid crystal displays, color facsimile machines, and color cameras. With the increasing market demand, the manufacturing technology of color filters is also tending to diversify. At present, manufacturing methods such as dyeing method, printing method, electroplating method and dispersion method have been developed, among which the dispersion method is the mainstream process....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/033G03F7/004G02B5/20
CPCG02B5/20G03F7/004G03F7/027G03F7/033
Inventor 谢栢源许荣宾
Owner CHI MEI CORP
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