Continuous preparation method of foamed nickel chrome alloy
A foamed nickel and chromium alloy technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of excessive carbon deposition, affecting the performance of nickel-chromium alloy, etc., and achieve short production time and distribution of chromium plating. Uniform, low energy consumption
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Embodiment 1
[0019] The selected aperture is 20PPI, the thickness is 0.9mm, the length is 150m, the width is 1000mm, and the surface density is 100g / m 2 The foamed nickel plate is used as the base material, and the base material is installed on the magnetron sputtering equipment, the vacuum chamber is turned off to evacuate, and the heating tube is turned on for heating. The maximum temperature of the vacuum chamber is set to 220°C. -3 Fill the vacuum chamber with argon gas at Pa, turn on the ion source for 2 minutes, stop heating, turn off the ion source, turn on the bias power supply, and turn on the sputtering target power supply for sputtering. The speed is 0.6m / min, the working vacuum is 0.2Pa, and the sputtering time is 2h. After the whole sputtering process is over, first turn off the sputtering target power supply, close the bias valve, then stop vacuuming, and finally fill with argon for 300s. , to get the semi-finished product of foamed nickel chromium, wrap the semi-finished pro...
Embodiment 2
[0021] The selected aperture is 50PPI, the thickness is 1.4mm, the length is 100m, the width is 850mm, and the surface density is 200g / m 2 The foamed nickel plate is used as the base material, and the base material is installed on the magnetron sputtering equipment, the vacuum chamber is turned off to evacuate, and the heating tube is turned on for heating. The maximum temperature of the vacuum chamber is set to 250°C. -3 Fill the vacuum chamber with argon gas at Pa, turn on the ion source for 10 minutes, stop heating, turn off the ion source, turn on the bias power supply, turn on the sputtering target power supply for sputtering, the sputtering target is a cylindrical tube-shaped chromium target, and the tape speed 0.6m / min, the working vacuum is 0.2Pa, and the sputtering time is 3.5h. After the entire sputtering process is over, turn off the sputtering target power, close the bias valve, then stop vacuuming, and finally fill with argon for 300s. Get the foamed nickel-chromi...
Embodiment 3
[0023] The selected aperture is 80PPI, the thickness is 1.9mm, the length is 50m, the width is 600mm, and the surface density is 300g / m 2 The foamed nickel plate is used as the base material, and the base material is installed on the magnetron sputtering equipment, the vacuum chamber is turned off to evacuate, and the heating tube is turned on for heating. The maximum temperature of the vacuum chamber is set to 280°C. -3 Fill the vacuum chamber with argon gas at Pa, turn on the ion source for 15 minutes, stop heating, turn off the ion source, turn on the bias power supply, turn on the sputtering target power supply for sputtering, the sputtering target is a flat chromium target, and the tape speed is 0.5m / min, the working vacuum is 0.3Pa, the sputtering time is 4h, the whole sputtering process is over, turn off the sputtering target power, close the bias valve, then stop vacuuming, and finally continue to fill with argon for 300s to obtain foamed nickel Chrome semi-finished p...
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