Continuous preparation method of foamed nickel chrome alloy
A foamed nickel and chromium alloy technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of excessive carbon deposition, affecting the performance of nickel-chromium alloy, etc., and achieve short production time and distribution of chromium plating. Uniform, low energy consumption
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[0018] Example 1
[0019] The aperture is 20PPI, the thickness is 0.9mm, the length is 150m, the width is 1000mm, and the surface density is 100g / m 2 The foamed nickel board is the base material, the base material is installed on the magnetron sputtering equipment, the vacuum chamber is closed to vacuum, and the heating tube is turned on for heating. The maximum temperature of the vacuum chamber is set to 220 ℃, when the vacuum degree is 1×10 -3 Fill the vacuum chamber with argon at Pa, turn on the ion source for 2 minutes, stop heating, turn off the ion source, turn on the bias power, turn on the sputtering target power supply for sputtering, the sputtering target is a cylindrical tube-shaped nickel-chromium target, and the tape is transported. The speed is 0.6m / min, the working vacuum is 0.2Pa, the sputtering time is 2h, the whole sputtering process is over, first turn off the sputtering target power, turn off the bias valve, then stop vacuuming, and finally fill in argon for 300...
Example Embodiment
[0020] Example 2
[0021] The aperture is 50PPI, the thickness is 1.4mm, the length is 100m, the width is 850mm, and the surface density is 200g / m. 2 The foamed nickel plate is the base material, the base material is installed on the magnetron sputtering equipment, the vacuum chamber is closed to vacuum, the heating tube is turned on for heating, the maximum temperature of the vacuum chamber is set to 250 ℃, when the vacuum degree is 4×10 -3 Fill the vacuum chamber with argon at Pa, turn on the ion source for 10 minutes, stop heating, turn off the ion source, turn on the bias power, turn on the sputtering target power for sputtering, the sputtering target is a cylindrical chromium target, and the tape travel speed 0.6m / min, working vacuum degree is 0.2Pa, sputtering time is 3.5h, the whole sputtering process is over, turn off the sputtering target power supply, close the bias valve, then stop vacuuming, and finally fill in argon for 300s. Obtain the foamed nickel-chromium semi-fin...
Example Embodiment
[0022] Example 3
[0023] The aperture is 80PPI, the thickness is 1.9mm, the length is 50m, the width is 600mm, and the areal density is 300g / m 2 The foamed nickel board is the base material, the base material is installed on the magnetron sputtering equipment, the vacuum chamber is closed to vacuum, the heating tube is turned on for heating, the maximum temperature of the vacuum chamber is set to 280℃, when the vacuum degree is 6×10 -3 Fill the vacuum chamber with argon at Pa, turn on the ion source for 15 minutes, stop heating, turn off the ion source, turn on the bias power, turn on the sputtering target power for sputtering, the sputtering target is a flat chromium target, and the tape travel speed is 0.5m / min, the working vacuum is 0.3Pa, the sputtering time is 4h, the whole sputtering process is over, turn off the sputtering target power, turn off the bias valve, then stop vacuuming, and finally continue to fill in argon for 300s to obtain foamed nickel Chromium semi-finish...
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