All-solid-state electrochromic window and solid-state electrochromic mirror and preparation method thereof
An electrochromic and electrochromic layer technology, applied in instruments, nonlinear optics, optics, etc., can solve the problems of poor cycle stability, affecting the discoloration rate, low lithium ion conductivity, etc., and achieve the best stability and electron conduction. The effect of low rate and high lithium ion conductivity
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Embodiment 1
[0049] The structure is [glass substrate / indium tin oxide conductive layer / lithium-intercalated vanadium pentoxide ion storage layer / Li 2.4 Si 0.6 Y 0.4 S 2.4 o 0.8 Electrolyte layer / tungsten trioxide electrochromic layer / indium tin oxide conductive layer] electrochromic window
[0050] Preparation method: from 10wt% SnO 2 and 90wt% In 2 o 3 The sintered ceramics are used as the target, and a conductive layer of indium tin oxide with a thickness of 150nm is plated on the glass substrate by radio frequency magnetron sputtering; metal vanadium is used as the target, and the mixed gas of argon and oxygen (flow rate Ratio of 1:9), a layer of vanadium pentoxide with a thickness of 200nm is plated on the conductive layer of indium tin oxide by radio frequency magnetron sputtering, and then made of vanadium pentoxide by thermal evaporation of metal lithium under vacuum Lithium intercalation vanadium pentoxide ion storage layer; with Li 2.4 Si 0.6 Y 0.4 S 2.4 o 0.8 As the ...
Embodiment 2
[0053] The structure is [glass substrate / aluminum-doped zinc oxide conductive layer / lithium intercalated tungsten trioxide ion storage layer / Li 2.4 Si 0.6 SM 0.6 S 3.1 o 0.4 Electrochromic window with electrolyte layer / nickel oxide electrochromic layer / aluminum-doped zinc oxide conductive layer]
[0054] Preparation method: from (1-x)ZnO+xAl 2 o 3 (x=2wt%) The sintered ceramics are the target material, and the aluminum-doped zinc oxide conductive layer with a thickness of 150nm is plated on the glass substrate by the radio frequency magnetron sputtering method; with the tungsten trioxide ceramic as the target material, the A layer of tungsten trioxide with a thickness of 200nm was plated on the aluminum-doped zinc oxide conductive layer by radio frequency magnetron sputtering, and then the lithium-intercalated tungsten trioxide ion storage layer was prepared by thermal evaporation of metal lithium under vacuum; 2.4 Si 0.6 SM 0.6 S 3.1 o 0.4 As the target material, an...
Embodiment 3
[0057] The structure is [glass substrate / reflective silver layer / indium tin oxide conductive layer / lithium-intercalated vanadium pentoxide ion storage layer / Li 2 Si Y 0.3 S 3.1 o 0.2 electrochromic mirror with electrolyte layer / tungsten trioxide electrochromic layer / indium tin oxide conductive layer]
[0058] Preparation method: Metal silver is used as the target material, and a silver reflective layer with a thickness of 70nm is plated on the glass substrate by radio frequency magnetron sputtering; 10wt% SnO 2 and 90wt% In 2 o 3 The sintered ceramics are used as the target, and a layer of indium tin oxide conductive layer with a thickness of 150nm is plated on the silver reflective layer by radio frequency magnetron sputtering; Ratio of 1:9), a layer of vanadium pentoxide with a thickness of 200nm is plated on the conductive layer of indium tin oxide by radio frequency magnetron sputtering, and then made of vanadium pentoxide by thermal evaporation of metal lithium under...
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Abstract
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