Method for preparing high-stability patterned photonic-crystal coloring structure on surface of textile substrate by utilizing ultraviolet-light curing technology

A technology of substrate surface and curing technology, applied in the field of photonic crystal preparation, can solve the problems of structural color durability difficult to meet the requirements of coloring, photonic crystal structure is easily damaged, poor stability, etc., to achieve easy implementation, guaranteed durability, cost low cost effect

Inactive Publication Date: 2018-07-24
ZHEJIANG SCI-TECH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the applicant of the present invention found that although the photonic crystal color-producing structure can be constructed on the surface of textiles by digital printing self-assembly, its stability is poor, and the structural color will be reduced after simple folding, bending and washing, that is The durability of structural color is difficult to meet the requirements of conventional textile coloring, and the corresponding photonic crystal structure is easily damaged or falls off from the surface of the textile substrate

Method used

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  • Method for preparing high-stability patterned photonic-crystal coloring structure on surface of textile substrate by utilizing ultraviolet-light curing technology
  • Method for preparing high-stability patterned photonic-crystal coloring structure on surface of textile substrate by utilizing ultraviolet-light curing technology
  • Method for preparing high-stability patterned photonic-crystal coloring structure on surface of textile substrate by utilizing ultraviolet-light curing technology

Examples

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Effect test

Embodiment 1

[0040] At room temperature, 15% (in terms of solid content) of silicon dioxide (SiO) with a particle size of 200 nm and a monodispersity index (PDI) of 0.02 2 ) nanospheres, 3% structural fixative hydroxyethyl acrylate (HEA), 0.09% photoinitiator phenylbis(2,4,6-trimethylbenzoyl) phosphine oxide, 0.5% coffee ring inhibitor Agent ethylene glycol, 0.1% pH regulator hydrochloric acid and 0.1% humectant glycerin were mixed, and then ultrasonically dispersed for 15 minutes to obtain a photocurable structural color-producing ink; the ink was added to the ink cartridge of the numerically controlled ink distribution system, and the Print patterns and parameters, apply ink on the black cotton fabric that has been pre-treated with water and oil repellency; place the textile with structural color ink under a UV curing lamp with a center wavelength of 365nm and a power of 250W for 480s, A blue photonic crystal chromogenic structure with good stability is obtained. The obtained photonic c...

Embodiment 2

[0042] At room temperature, 10% (in terms of solid content) of cuprous oxide (Cu) with a particle size of 250 nm and a monodispersity index (PDI) of 0.07 2 O) Nanospheres, 2% structure fixative hydroxypropyl acrylate (HPA), 0.06% photoinitiator (2,4,6-trimethylbenzoyl) diphenylphosphine oxide, 0.3% coffee ring Inhibitor formamide, 0.2% pH regulator glacial acetic acid and 0.3% humectant polyethylene glycol were mixed, and then ultrasonically dispersed for 15 minutes to obtain photocurable structural color-producing ink; the ink was added to the ink cartridge of the numerical control ink distribution system, passed Set the printing pattern and parameters, and apply ink on the black polyester-cotton fabric that has been pretreated with water and oil repellency; put the textile with structural color ink on it and cure it under a UV curing lamp with a center wavelength of 365nm and a power of 250W After treatment for 450s, an orange-yellow photonic crystal chromogenic structure wi...

Embodiment 3

[0044]At room temperature, 10% (in terms of solid content) of poly(styrene-methacrylic acid (PSt-MAA) nanospheres with a particle size of 300 nm and a monodispersity index (PDI) of 0.02, and 2% of a structure-fixing agent β-hydroxyethyl methacrylate (HEMA), 0.06% photoinitiator 2-hydroxy-2-methyl-1-[4-(2-hydroxyethoxy)phenyl]-1-propanone, 0.3 % coffee ring inhibitor ethylene glycol, 0.1% pH regulator sodium hydroxide and 0.2% humectant polyethylene glycol were mixed, and then ultrasonically dispersed for 15 minutes to obtain photocurable structural color-producing ink; the ink was added to the CNC ink distribution system In the ink cartridge, by setting the printing pattern and parameters, the ink is applied on the black silk fabric that has been pretreated with water and oil repellency; the textile with the structural color ink is placed in the ultraviolet light with a center wavelength of 365nm and a power of 250W After curing under the curing lamp for 420s, a red photonic c...

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Abstract

The invention discloses a method for preparing a high-stability patterned photonic-crystal coloring structure on the surface of a textile substrate by utilizing an ultraviolet-light curing technology.The method comprises the following steps of: (1) preparing structure coloring ink consisting of nanospheres, a structure fixing agent, a photoinitiator, a coffee-ring inhibitor and a conventional inkadditive; (2) applying the prepared ink to the surface of the textile substrate by a digital printing mode; (3) using an ultraviolet-light curing lamp to carry out curing treatment on the textile substrate printed with the ink. The method disclosed by the invention has the beneficial effects that by combination of the ultraviolet-light curing technology and the digital printing technology, not only can the patterned coloring effect be obtained by printing the surface of the textile substrate according to the needs, but also the property between the nanospheres in a self-assembled structure and the cohesive property between the self-assembled structure and the textile substrate are enhanced by the structure fixing agent; the obtained photonic-crystal coloring structure has excellent stability and durable structure-color effect. The method has the characteristics of easy implementation, low cost and good universality and the like.

Description

technical field [0001] The invention belongs to the technical field of photonic crystal preparation, and relates to a method for preparing a highly stable patterned photonic crystal color-producing structure on the surface of a textile substrate by using ultraviolet light curing technology. Background technique [0002] Photonic crystals, that is, photonic bandgap materials, are artificial crystals formed by two or more dielectric materials with different dielectric constants (refractive indices) arranged in a certain period in space. Photonic band gap for electromagnetic wave propagation. Due to Bragg diffraction, photonic crystals can selectively reflect incident light of a specific wavelength, forming a "structural color" that is different from conventional pigment colors (colors of dyes or pigments). [0003] At present, the study of constructing photonic crystal structural color on the surface of textiles by means of digital printing with nanospheres as structural unit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D11/38C09D11/30
CPCC09D11/30C09D11/38
Inventor 刘国金周岚郭勇王成龙
Owner ZHEJIANG SCI-TECH UNIV
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