Photovoltaic infrared detector based on GaSb/InSb/InP heterogeneous PIN structure
An infrared detector and photovoltaic technology, which is applied in the field of infrared detection, can solve the problems of slow response speed of thermal infrared detectors, low detection rate of thermal infrared detectors, and difficulty in meeting application requirements, etc., and achieves weakening dark current, reducing dark current, The effect of shortening the lifespan
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[0025] Te-doped N+ Type InP polished single wafer was used as the substrate, and the net donor concentration was 1×10 18 cm -3 , the crystal orientation is (100) to (111) 2°, and the prepared structure is back electrode / heavily doped N + type InP substrate / heavily doped N + Type InP electron transport layer / undoped InSb active region / heavily doped P + Type GaSb hole transport layer / grid-shaped upper electrode infrared detector.
[0026] The growth of the multilayer material structure is carried out in a low-pressure metal-organic chemical vapor deposition (MOCVD) system. Ga, In, Sb and P sources used for growth were trimethylgallium (TMGa), trimethylindium (TMIn), triethylantimony (TESb), phosphine (PH 3 ), the metal-organic sources were placed in a high-precision temperature-controlled cold trap, and the source temperatures were: TMGa: -10°C; TMIn: 16°C; TMSb: -10°C.
[0027] N used for material doping + Type dopant source is diethyl tellurium (DETe); P + The type do...
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