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Cleaning agent for electronic material

A technology of electronic materials and cleaning agents, applied in the field of cleaning agents, can solve the problems of high corrosion of metal shells, damage of circuit board materials, poor cleaning effect, etc., and achieve the effect of low price, uniformity and safe use

Inactive Publication Date: 2018-08-28
湖州晶合化工有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The cleaners in the prior art are more corrosive to the metal shell of electronic products when scrubbing electronic materials, the cleaning effect is not good, and it is easy to cause damage to the materials on the circuit board
Sodium silicate and sodium carbonate contained in existing cleaning agents will cause certain pollution to the environment and have certain toxic and side effects
In addition, existing material cleaners are relatively expensive to produce

Method used

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  • Cleaning agent for electronic material
  • Cleaning agent for electronic material
  • Cleaning agent for electronic material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] A cleaning agent for electronic materials, made of the following raw materials in parts by weight:

[0028]

[0029] The additive is a composition prepared by mixing benzyl alcohol and ammonium dihydrogen phosphate in a mass ratio of 3:7;

[0030] The preparation method of described fluorosilicon surfactant, comprises the steps:

[0031] 1) Dissolve 120g of heptadecylfluorodecyltrimethoxysilane in 400g of isopropanol, and add 1,1,3,3-tetramethyl-1,3 bis[3-(oxiranyl methyl 100 g of oxy)propyl] disiloxane and 5 g of triethylamine were stirred and reacted under reflux at 100° C. for 6 hours to obtain a crude product;

[0032] 2) Add 50 g of sodium p-hydroxybenzenesulfonate, 25 g of triphenylphosphine, and 30 g of triethylamine to 350 g of the crude product prepared in step 1), and react under reflux and stirring for 4 hours at 80° C. , adding acetic acid to adjust the pH to neutral, and washing with water three times to prepare the fluorosilicon surfactant.

Embodiment 2

[0034] The technical solution adopted in the present invention is: a cleaning agent for electronic materials, made of the following raw materials in parts by weight:

[0035]

[0036] The additive is a composition prepared by mixing cetylpyridinium chloride and lithium carbonate in a mass ratio of 2:3;

[0037] The preparation method of described fluorosilicon surfactant, comprises the steps:

[0038] 1) Dissolve 130g of heptadecylfluorodecyltrimethoxysilane in 500g of isopropanol, and add 1,1,3,3-tetramethyl-1,3 bis[3-(oxiranyl methyl 100 g of oxy)propyl] disiloxane and 6 g of tetramethylammonium hydroxide were stirred and reacted under reflux at 105° C. for 7 hours to obtain a crude product;

[0039] 2) Add 110 g of sodium p-hydroxybenzenesulfonate, 6 g of triphenylphosphine, and 7 g of triethylamine to 700 g of the crude product prepared in step 1), and react under reflux and stirring for 4.5 hours at 85° C. , adding acetic acid to adjust the pH to neutral, washing wit...

Embodiment 3

[0041] A cleaning agent for electronic materials, made of the following raw materials in parts by weight:

[0042]

[0043] The additive is a composition prepared by mixing cetyl ammonium bromide and antibacterial agent HFXZ-881 at a mass ratio of 5:7;

[0044] The preparation method of described fluorosilicon surfactant, comprises the steps:

[0045] 1) Dissolve 140g of heptadecylfluorodecyltrimethoxysilane in 550g of isopropanol, and add 1,1,3,3-tetramethyl-1,3 bis[3-(oxiranyl methyl 100 g of oxy)propyl] disiloxane and 7 g of base catalyst were refluxed and stirred at 110° C. for 8 hours to obtain a crude product;

[0046] 2) Add 110 g of sodium p-hydroxybenzenesulfonate, 7 g of triphenylphosphine, and 9 g of triethylamine to 700 g of the crude product prepared in step 1), and react under reflux and stirring for 4.7 hours at 87° C. , adding acetic acid to adjust the pH to neutral, washing with water for 5 times, and preparing the fluorosilicon surfactant;

[0047] The ...

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Abstract

The invention discloses a cleaning agent for an electronic material. The cleaning agent is prepared from the following raw materials in parts by weight: 60 to 70 parts of a fluorosilicone surfactant,10 to 15 parts of co-solvent, 3 to 5 parts of additive and 10 to 15 parts of de-ionized water, wherein the additive is selected from any one or more of an antibacterial agent and a preservative; a preparation method of the fluorosilicone surfactant comprises the following steps: dissolving heptadecafluorodecyltrimethoxysilane into isopropyl alcohol; then adding 1,1,3,3-tetramethyl-1,3-di[3-(epoxyethylmethoxy)propyl]disiloxane and an alkali catalyst; refluxing, stirring and reacting at 100 to 110 DEG C for 6 to 8h, so as to obtain a crude product; then adding sodium p-hydroxybenzenesulfonate, triphenylphosphorus and triethylamine; refluxing, stirring and reacting at 80 to 90 DEG C for 4 to 5h; after reaction is finished, carrying out rotary evaporation; adding acetic acid and regulating thepH (Potential of Hydrogen) to be neutral and washing with water for 3 to 5 times. The cleaning agent for the electronic material, disclosed by the invention, has the advantages of stronger cleaning capability, more rapid dirt removing time, higher cleaning efficiency, lower price, environment protection and safety in utilization.

Description

technical field [0001] The invention relates to the technical field of cleaning agents, in particular to a cleaning agent for electronic materials. Background technique [0002] With the advancement of science and the development of society, electronic products are gradually popularized in daily life and are closely related to people's lives. In order to ensure the safety of people and equipment, people have higher and higher cleaning requirements for electrical appliances, instruments, and distribution boxes. High-level cleaning technology is developed in this form. It is particularly important to use cleaning agents in high-level cleaning technology, and its performance directly affects the cleaning effect. [0003] The cleaning agents in the prior art are highly corrosive to metal casings of electronic products when scrubbing electronic materials, and the cleaning effect is not good, and it is easy to cause damage to the materials on the circuit board. The sodium silicat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/22C11D3/60C11D3/48C11D3/20C11D3/065C11D3/28C11D3/10C11D3/30C11D3/24
CPCC11D1/004C11D3/0073C11D3/06C11D3/10C11D3/201C11D3/2017C11D3/2034C11D3/2044C11D3/24C11D3/28C11D3/30C11D3/48
Inventor 杨俊
Owner 湖州晶合化工有限公司