Large-size high-density non-binding-phase tungsten carbide target material and preparing method thereof

A high-density, non-bonding technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of limited sample size, high sintering temperature, low density, etc., to reduce sintering cost, increase sintered density, increase the effect of density

Active Publication Date: 2019-08-27
株洲万融新材科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to provide a method for preparing a large-size, high-density tungsten carbide target without a binder phase, aiming to solve the problems of coarse grains, low density, and high sintering temperature in the sintering process of tungsten carbide targets in the prior art. High, limited sample size, poor stability technical problems

Method used

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  • Large-size high-density non-binding-phase tungsten carbide target material and preparing method thereof
  • Large-size high-density non-binding-phase tungsten carbide target material and preparing method thereof
  • Large-size high-density non-binding-phase tungsten carbide target material and preparing method thereof

Examples

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Embodiment 1

[0046] This embodiment provides a method for preparing a large-size, high-density tungsten carbide target without a binder phase, including the following steps:

[0047] S1. Ingredients: weigh the raw materials according to a certain mass fraction ratio, and set aside; wherein, the raw materials are composed of the following components in the mass fraction ratio: tungsten carbide powder 99.6%, graphite 0.4%, the purity of tungsten carbide powder > 99.9%, The particle size is 0.4~4μm;

[0048] S2. Ball milling and sieving treatment: place the raw materials weighed in step S1 in a vacuum polyurethane mixing tank, add grinding media absolute ethanol and tungsten carbide balls, and carry out vacuum ball milling treatment at a speed of 600r / min for 20h. Then the uniformly mixed slurry is rotated and dried, and finally sieved through an 80-mesh sieve to obtain a mixed powder with uniform particle size;

[0049] S3. Sintering treatment: Weigh 40kg of the mixed powder in step S2 and ...

Embodiment 2

[0056] This example provides a method for preparing a large-size, high-density binder-free tungsten carbide target, referring to the operation steps in Example 1, the difference from Example 1 is that in step S2, the sintering temperature is 1750 ℃.

Embodiment 3

[0058] This example provides a method for preparing a large-size, high-density binder-free tungsten carbide target, referring to the operation steps in Example 1, the difference from Example 1 is that in step S2, the sintering temperature is 1800 ℃.

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Abstract

The invention provides a preparing method of a large-size high-density non-binding-phase tungsten carbide target material. The method includes the following steps of S1, preparing materials; S2, conducting ball-milling and screening treatment; S3, conducting sintering treatment; S4, conducting after-treatment. The raw materials include tungsten carbide powder and free carbon. The dynamic vibrationpressure is exerted in the sintering treatment process. By introducing the free carbon into the pure tungsten carbide powder, traditional medical binding phases are abandoned, the purity of the target material is ensured, and the quality of a magnetron sputtering coating can be easily improved. The dynamic vibration pressure is introduced in the sintering process, particle rearrangement is promoted in the early sintering stage of the tungsten carbide powder, the removal of residual pores is promoted in the later sintering stage, and the grain is refined when the sintering density is improved;by means of the high-pressure vibration assisted sintering, the sintering temperature is lowered by 50-200 DEG C on the basis of a traditional hot pressing process, the tungsten carbide target material with high density and fine grain is prepared, and the film coating quality is improved.

Description

technical field [0001] The invention belongs to the technical field of ceramic and cemented carbide sintering, and in particular relates to a large-size, high-density tungsten carbide target without a binder phase and a preparation method thereof. Background technique [0002] The tungsten carbide coating prepared by the magnetron sputtering process has good comprehensive properties, such as high hardness, high elastic modulus, corrosion resistance, high temperature resistance and low friction coefficient, and is widely used in industrial molds and key parts of equipment. The surface is wear-resistant and anti-friction. However, the magnetron sputtering process has strict requirements on the performance of the tungsten carbide target used. The biggest problem is how to ensure the uniformity of the microstructure and structure of the large-size sputtering target and avoid defects. This is because when the microstructure and grain size distribution of the tungsten carbide tar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/56C23C14/35
CPCC04B35/5626C04B2235/422C04B2235/425C04B2235/77C04B2235/785C04B2235/95C23C14/3414C23C14/35
Inventor 盛利文谢志鹏盛建华安迪戴金宁
Owner 株洲万融新材科技有限公司
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