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Chromium, aluminum, silicon and nickel quarternary alloy target material and preparation method thereof

A quaternary alloy target, silicon-nickel technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problem that the uniformity of composition and structure in the alloy is difficult to guarantee, and it is difficult to obtain high-quality and high-density targets. It is suitable for large-scale industrial production and application, with many specifications and small grains.

Inactive Publication Date: 2019-09-20
河北宏靶科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the chromium-aluminum-silicon-nickel alloy target is manufactured by vacuum melting and casting, shrinkage cavities, porosity and macro-segregation are prone to occur during the casting process, and it is difficult to ensure the uniformity of the composition and structure of the alloy
When the chromium aluminum silicon nickel target is manufactured by the hot pressing method, it is difficult to achieve large-scale target production. At the same time, the internal density distribution of the hot pressing target is uneven, and the difference between the center and the edge density can reach 5%. It is difficult to obtain a high-quality and high-density target. material

Method used

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  • Chromium, aluminum, silicon and nickel quarternary alloy target material and preparation method thereof

Examples

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preparation example Construction

[0028] see figure 1 , a method for preparing a chromium-aluminum-silicon-nickel quaternary alloy target provided by an embodiment of the present invention includes the following steps:

[0029] Step 100: In atomic percentage, mix 30-95at% chromium powder, 3-80at% aluminum powder, 1-20at% silicon powder, and 1-20at% nickel powder;

[0030] Step 200: Cold isostatic pre-pressing the mixed metal powder in a cold isostatic pressing mold;

[0031] Step 300: breaking the pre-pressed metal block into 1-5mm metal particles;

[0032] Step 400: pre-alloying the broken metal particles in a vacuum sintering furnace to obtain an alloy block;

[0033] Step 500: breaking the alloy block obtained by pre-alloying into alloy powder;

[0034] Step 600: Put the alloy powder into a bag, and place it in a degassing furnace for degassing;

[0035] Step 700: sealing and welding the degassed sheath and putting it into a hot isostatic pressing device for pressing and sintering to obtain the chromium...

example 1

[0047] The chromium-aluminum-silicon-nickel alloy target of the present invention is made of the following atomic percentages of raw materials: 91% chromium, 3% aluminum, 3% silicon, and 3% nickel; the preparation method of the chromium-aluminum-silicon-nickel target in this example includes the following steps :

[0048] (1) Weigh chromium powder and nickel powder with a purity of 99.5%, an average particle size of 75 μm, an average particle size of 63 um aluminum powder, and an average particle size of 45 um, and mix them in a three-dimensional mixer for 3 hours. The medium is filled with high-purity argon for protection;

[0049] (2) Pack the mixed powder into the cold isostatic pressing forming mold and carry out cold isostatic pressing pre-compression, the cold isostatic pressing pressure is 100MPa, and the holding pressure is 10 minutes;

[0050] (3) Use jaw crushing equipment to crush the cold isostatic pre-pressed compact, and the particle size of the crushed particle...

example 2

[0058] The chromium-aluminum-silicon-nickel alloy target of the present invention is made of the raw materials with the following atomic percentages: 60% chromium, 22% aluminum, 10% silicon, and 8% nickel; the preparation method of the chromium-aluminum-silicon-nickel target in this example comprises the following steps :

[0059] (1) Take by weighing 99.5% purity, chromium powder and nickel powder with an average particle size of 100 μm, aluminum powder with an average particle size of 70 μm, and silicon powder with an average particle size of 45 μm, and mix them in a three-dimensional mixer for 3 hours. The medium is filled with high-purity argon for protection;

[0060] (2) Pack the mixed powder into the cold isostatic pressing forming mold and carry out cold isostatic pressing pre-compression, the cold isostatic pressing pressure is 80MPa, and the holding pressure is 10 minutes;

[0061] (3) The cold isostatic pre-pressed compact is crushed with jaw crushing equipment, an...

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Abstract

The invention provides a chromium, aluminum, silicon and nickel quarternary alloy target material which is prepared from the following components in percent by atom: 30-95at% of chromium, 3-80at% of aluminum, 1-20at% of silicon and 1+20at% of nickel. A preparation method of the chromium, aluminum, silicon and nickel quarternary alloy target material provided by the invention comprises the following steps: first uniformly mixing chromium powder, aluminum powder, silicon powder and nickel powder in proportion; pre-pressing the mixture by isostatic cool pressing; then crushing a press cake and pre-alloying the press cake in a vacuum state; carrying out encapsulating, degassing and hot isostatic pressure sintering; and finally, machining the prepared blank to obtain the chromium, aluminum, silicon and nickel quarternary alloy target material. The chromium, aluminum, silicon and nickel quarternary alloy target material provided by the invention has the advantages of being high in compactness, free of pores, looseness and segregation, small in grain size, uniform in tissue and the like, and can be suitable for sputtering hard coatings needed by various tools and molds.

Description

technical field [0001] The invention relates to the technical field of alloy targets, in particular to a chromium-aluminum-silicon-nickel quaternary alloy target and a preparation method thereof. Background technique [0002] Hard coating technology is an important means of surface modification of materials. The coating technology uses some physical or chemical means to coat a layer on the surface of the substrate without changing the composition of the substrate material or weakening the mechanical properties of the substrate Thin films with specific performance requirements can greatly improve the heat resistance, corrosion resistance, oxidation resistance, wear resistance and other properties of the base material, while the base material still maintains its original good mechanical properties. [0003] In recent years, coating technology has developed rapidly. From the earliest TiN coating, a series of new coatings such as CrN, TiAlN, and CrAlN have been developed. The ha...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/06C22C27/06C22C21/00C22C1/04
CPCC22C1/04C22C1/0416C22C1/045C22C21/00C22C27/06C23C14/0641C23C14/3407C23C14/3414
Inventor 姜海唐培新吕晓明姜慧王瑞刚许凤志
Owner 河北宏靶科技有限公司
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